Hannah Rose Marie Margavio

College of Engineering

Works (5)

Updated: April 20th, 2024 05:02

2024 article

"Dual-Tone" Area-Selective Deposition: Selectivity Inversion of Polymer on Patterned Si/SiO<sub>2</sub> Starting Surfaces

Carroll, N. M., Margavio, H. R. M., & Parsons, G. N. (2024, February 27). CHEMISTRY OF MATERIALS, Vol. 2.

By: N. Carroll  n, H. Margavio n & G. Parsons n 

Sources: Web Of Science, ORCID
Added: March 1, 2024

2024 article

Photoelectrochemical Proton-Coupled Electron Transfer of TiO<sub>2</sub> Thin Films on Silicon

Nedzbala, H. S., Westbroek, D., Margavio, H. R. M., Yang, H., Noh, H., Magpantay, S. V., … Mayer, J. M. (2024, April 2). JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, Vol. 4.

By: H. Nedzbala*, D. Westbroek*, H. Margavio n, H. Yang n, H. Noh *, S. Magpantay*, C. Donley *, A. Kumbhar *, G. Parsons n , J. Mayer *

Sources: Web Of Science, ORCID, NC State University Libraries
Added: April 8, 2024

2023 article

SRC-led materials research: 40 years ago, and now

Zhirnov, V., Chen, M. E., Malakoutian, M., Margavio, H. R. M., Pawliczak, E., Reidy, K., … Younkin, T. (2023, November 3). MRS ADVANCES.

By: V. Zhirnov *, M. Chen*, M. Malakoutian *, H. Margavio n, E. Pawliczak *, K. Reidy *, W. Yanez *, T. Younkin*

TL;DR: A selected group of distinguished SRC Scholars have been invited to present their research in the context of the potential impact that their work will drive for the future of microelectronics. (via Semantic Scholar)
Source: Web Of Science
Added: November 27, 2023

2023 journal article

Self-Aligned Nanopatterning and Controlled Lateral Growth by Dual-Material Orthogonal Area-Selective Deposition of Poly(3,4-ethylenedioxythiophene) and Tungsten

CHEMISTRY OF MATERIALS, 35(11), 4375–4384.

By: H. Oh n, J. Kim n, H. Margavio n & G. Parsons n 

Sources: Web Of Science, ORCID
Added: June 22, 2023

2021 journal article

Multimaterial Self-Aligned Nanopatterning by Simultaneous Adjacent Thin Film Deposition and Etching

ACS NANO, 15(7), 12276–12285.

By: S. Song n, J. Kim n, H. Margavio n & G. Parsons n 

author keywords: area-selective deposition; etching; patterning; orthogonal; self-aligned
TL;DR: This work introduces low-temperature chemically self-aligned film growth via simultaneous thin film deposition and etching in adjacent regions on a nanopatterned surface and shows capacity for self- aligned dielectric patterning via favorable deposition of AlF3 on Al2O3 with simultaneous atomic layer etching of sacrificial ZnO. (via Semantic Scholar)
Sources: Web Of Science, ORCID
Added: August 23, 2021

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