Holger Saare
Works (4)
2023 article
Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride
Saare, H., Xie, W., & Parsons, G. N. (2023, June 20). Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Vol. 41.
2022 article
Comparative In Situ Study of the Initial Growth Trends of Atomic Layer-Deposited Al2O3 Films
Saare, H., Dianat, G., & Parsons, G. N. (2022, April 18). The Journal of Physical Chemistry C, Vol. 4, pp. 7036–7046.
2020 article
Effect of reactant dosing on selectivity during area-selective deposition of TiO2 via integrated atomic layer deposition and atomic layer etching
Saare, H., Song, S. K., Kim, J.-S., & Parsons, G. N. (2020, September 8). Journal of Applied Physics, Vol. 128.
2019 article
Integrated Isothermal Atomic Layer Deposition/Atomic Layer Etching Supercycles for Area-Selective Deposition of TiO2
Song, S. K., Saare, H., & Parsons, G. N. (2019, June 12). Chemistry of Materials, Vol. 31, pp. 4793–4804.