Holger Saare

Chemical & Biomolecular G&T

Works (4)

Updated: August 5th, 2023 05:00
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2023 journal article

Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 41(4).

By: H. Saare n, W. Xie n & G. Parsons n 

co-author countries: United States of America 🇺🇸
Sources: Web Of Science, ORCID
Added: June 22, 2023

2022 journal article

Comparative In Situ Study of the Initial Growth Trends of Atomic Layer-Deposited Al(2)O(3 )Films br

JOURNAL OF PHYSICAL CHEMISTRY C, 126(16), 7036–7046.

By: H. Saare n, G. Dianat n & G. Parsons n 

co-author countries: United States of America 🇺🇸
Sources: Web Of Science, ORCID
Added: June 6, 2022

2020 journal article

Effect of reactant dosing on selectivity during area-selective deposition of TiO2 via integrated atomic layer deposition and atomic layer etching

JOURNAL OF APPLIED PHYSICS, 128(10).

By: H. Saare n, S. Song n, J. Kim n & G. Parsons n 

co-author countries: United States of America 🇺🇸
Sources: Web Of Science, ORCID
Added: October 12, 2020

2019 journal article

Integrated Isothermal Atomic Layer Deposition/Atomic Layer Etching Supercycles for Area-Selective Deposition of TiO2

CHEMISTRY OF MATERIALS, 31(13), 4793–4804.

By: S. Song n, H. Saare n & G. Parsons n 

co-author countries: United States of America 🇺🇸
Sources: Web Of Science, ORCID
Added: July 29, 2019