2023 journal article
Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 41(4).
2022 journal article
Comparative In Situ Study of the Initial Growth Trends of Atomic Layer-Deposited Al(2)O(3 )Films br
JOURNAL OF PHYSICAL CHEMISTRY C, 126(16), 7036–7046.
2020 journal article
Effect of reactant dosing on selectivity during area-selective deposition of TiO2 via integrated atomic layer deposition and atomic layer etching
JOURNAL OF APPLIED PHYSICS, 128(10).
2019 journal article
Integrated Isothermal Atomic Layer Deposition/Atomic Layer Etching Supercycles for Area-Selective Deposition of TiO2
CHEMISTRY OF MATERIALS, 31(13), 4793–4804.
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