@article{fu_chen_shin_mehta_chen_barange_zhu_amoah_chang_so_2020, title={Recovering cavity effects in corrugated organic light emitting diodes}, volume={28}, ISSN={["1094-4087"]}, DOI={10.1364/OE.404412}, abstractNote={Cavity effects play an important role in determining the out-coupling efficiency of an OLED. By fabricating OLEDs on corrugated substrates, the waveguide and SPP modes can be extracted by diffraction. However, corrugation does not always lead to an enhancement in out-coupling efficiency due to the reduction of the electrode reflectance and hence the cavity effects. Based on the results of our rigorous couple-wave analysis (RCWA) simulation, we found that the cavity effects can be partially recovered using a low index Teflon layer inserted between the ITO anode and the substrate due to the enhancement of the reflectance of the corrugated electrodes. To verify the simulation results, we fabricated corrugated OLEDs having a low-index Teflon interlayer with an EQE of 36%, which is 29% higher than an optimized planar OLED. By experimentally measuring the OLED air mode dispersion, we confirm the cavity emission of a corrugated OLED is enhanced by the low index layer.}, number={21}, journal={OPTICS EXPRESS}, author={Fu, Xiangyu and Chen, Yi-An and Shin, Dong-Hun and Mehta, Yash and Chen, I-Te and Barange, Nilesh and Zhu, Liping and Amoah, Stephen and Chang, Chih-Hao and So, Franky}, year={2020}, month={Oct}, pages={32214–32225} }
 @article{chen_chen_chang_2019, title={Increasing etching depth of sapphire nanostructures using multilayer etching mask}, volume={37}, ISSN={["2166-2754"]}, DOI={10.1116/1.5119388}, abstractNote={In this study, the etching of sapphire nanostructures in inductively coupled plasma reactive ion etching using a multilayer etch mask is studied. The goals are to increase the etching depth and enable the fabrication of higher aspect ratio nanostructures in sapphire, which is traditionally difficult to micromachine. The etching rates and chemistry of different masking materials are examined for better understanding of the etching process. The etching of sapphire nanostructures is then studied using single and multilayer masks with Cl2-based chemistry. The fabrication results show that using the multilayer mask is an effective method for sapphire nanostructure fabrication, increasing the maximum etching depth from 25 to 230 nm for a ninefold improvement. To further validate the optical properties of fabricated sapphire nanostructures, the antireflection effects have been characterized. This work indicates that applying the multilayer mask can increase the etching depth of sapphire nanostructures, which can find applications in thin-film optics, optoelectronic devices, and composite windows.In this study, the etching of sapphire nanostructures in inductively coupled plasma reactive ion etching using a multilayer etch mask is studied. The goals are to increase the etching depth and enable the fabrication of higher aspect ratio nanostructures in sapphire, which is traditionally difficult to micromachine. The etching rates and chemistry of different masking materials are examined for better understanding of the etching process. The etching of sapphire nanostructures is then studied using single and multilayer masks with Cl2-based chemistry. The fabrication results show that using the multilayer mask is an effective method for sapphire nanostructure fabrication, increasing the maximum etching depth from 25 to 230 nm for a ninefold improvement. To further validate the optical properties of fabricated sapphire nanostructures, the antireflection effects have been characterized. This work indicates that applying the multilayer mask can increase the etching depth of sapphire nanostructures, which can...}, number={6}, journal={JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B}, author={Chen, Yi-An and Chen, I-Te and Chang, Chih-Hao}, year={2019}, month={Nov} }
 @misc{zhang_chen_chang_2019, title={Recent progress in near-field nanolithography using light interactions with colloidal particles: from nanospheres to three-dimensional nanostructures}, volume={30}, ISSN={["1361-6528"]}, DOI={10.1088/1361-6528/ab2282}, abstractNote={The advance of nanotechnology is firmly rooted in the development of cost-effective, versatile, and easily accessible nanofabrication techniques. The ability to pattern complex two-dimensional and three-dimensional nanostructured materials are particularly desirable, since they can have novel physical properties that are not found in bulk materials. This review article will report recent progress in utilizing self-assembly of colloidal particles for nanolithography. In these techniques, the near-field interactions of light and colloids are the sole mechanisms employed to generate the intensity distributions for patterning. Based on both ‘bottom-up’ self-assembly and ‘top-down’ lithography approaches, these processes are highly versatile and can take advantage of a number of optical effects, allowing the complex 3D nanostructures to be patterned using single exposures. There are several key advantages including low equipment cost, facile structure design, and patterning scalability, which will be discussed in detail. We will outline the underlying optical effects, review the geometries that can be fabricated, discuss key limitations, and highlight potential applications in nanophotonics, optoelectronic devices, and nanoarchitectured materials.}, number={35}, journal={NANOTECHNOLOGY}, author={Zhang, Xu A. and Chen, I-Te and Chang, Chih-Hao}, year={2019}, month={Aug} }