Jung-Sik Kim

College of Engineering

2020 journal article

Effect of reactant dosing on selectivity during area-selective deposition of TiO2 via integrated atomic layer deposition and atomic layer etching

JOURNAL OF APPLIED PHYSICS, 128(10).

By: H. Saare, S. Song, J. Kim & G. Parsons

Source: Web Of Science
Added: October 12, 2020