Jung-Sik Kim

Self-Aligned Nanopatterning and Controlled Lateral Growth by Dual-Material Orthogonal Area-Selective Deposition of Poly(3,4-ethylenedioxythiophene) and Tungsten

CHEMISTRY OF MATERIALS, 35(11), 4375–4384.

Growth behavior and substrate selective deposition of polypyrrole, polythiophene, and polyaniline by oxidative chemical vapor deposition and molecular layer deposition

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 40(6).

Modeling of deposit formation in mesoporous substrates via atomic layer deposition: Insights from pore-scale simulation

Gu, H., Lee, D. T., Corkery, P., Miao, Y., Kim, J.-S., Yuan, Y., … Tsapatsis, M. (2022, September 7). AICHE JOURNAL, Vol. 9.

Multimaterial Self-Aligned Nanopatterning by Simultaneous Adjacent Thin Film Deposition and Etching

ACS NANO, 15(7), 12276–12285.

Nanopatterned Area-Selective Vapor Deposition of PEDOT on SiO2 vs Si-H: Improved Selectivity Using Chemical Vapor Deposition vs Molecular Layer Deposition

CHEMISTRY OF MATERIALS, 33(23), 9221–9230.

Oxidative molecular layer deposition of PEDOT using volatile antimony(V) chloride oxidant

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 39(3).

Effect of reactant dosing on selectivity during area-selective deposition of TiO2 via integrated atomic layer deposition and atomic layer etching

JOURNAL OF APPLIED PHYSICS, 128(10).