Jung-Sik Kim

College of Engineering

Works (7)

Updated: July 5th, 2023 14:33

2023 journal article

Self-Aligned Nanopatterning and Controlled Lateral Growth by Dual-Material Orthogonal Area-Selective Deposition of Poly(3,4-ethylenedioxythiophene) and Tungsten

CHEMISTRY OF MATERIALS, 35(11), 4375–4384.

By: H. Oh n, J. Kim n, H. Margavio n & G. Parsons n

Sources: Web Of Science, ORCID
Added: June 22, 2023

2022 journal article

Growth behavior and substrate selective deposition of polypyrrole, polythiophene, and polyaniline by oxidative chemical vapor deposition and molecular layer deposition

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 40(6).

By: J. Kim n, H. Oh n & G. Parsons n

Sources: Web Of Science, ORCID
Added: October 17, 2022

2022 article

Modeling of deposit formation in mesoporous substrates via atomic layer deposition: Insights from pore-scale simulation

Gu, H., Lee, D. T., Corkery, P., Miao, Y., Kim, J.-S., Yuan, Y., … Tsapatsis, M. (2022, September 7). AICHE JOURNAL, Vol. 9.

By: H. Gu*, D. Lee*, P. Corkery*, Y. Miao*, J. Kim n, Y. Yuan*, Z. Xu*, G. Dai* ...

author keywords: atomic layer deposition; membrane; mesoporous substrate; pore constriction; zeolitic imidazolate framework
Sources: Web Of Science, ORCID
Added: September 12, 2022

2021 journal article

Multimaterial Self-Aligned Nanopatterning by Simultaneous Adjacent Thin Film Deposition and Etching

ACS NANO, 15(7), 12276–12285.

By: S. Song n, J. Kim n, H. Margavio n & G. Parsons n

author keywords: area-selective deposition; etching; patterning; orthogonal; self-aligned
Sources: Web Of Science, ORCID
Added: August 23, 2021

2021 journal article

Nanopatterned Area-Selective Vapor Deposition of PEDOT on SiO2 vs Si-H: Improved Selectivity Using Chemical Vapor Deposition vs Molecular Layer Deposition

CHEMISTRY OF MATERIALS, 33(23), 9221–9230.

By: J. Kim n & G. Parsons n

Sources: Web Of Science, ORCID
Added: March 7, 2022

2021 journal article

Oxidative molecular layer deposition of PEDOT using volatile antimony(V) chloride oxidant

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 39(3).

By: A. Volk n, J. Kim n, J. Jamir n, E. Dickey n & G. Parsons n

Sources: Web Of Science, ORCID
Added: April 23, 2021

2020 journal article

Effect of reactant dosing on selectivity during area-selective deposition of TiO2 via integrated atomic layer deposition and atomic layer etching

JOURNAL OF APPLIED PHYSICS, 128(10).

By: H. Saare n, S. Song n, J. Kim n & G. Parsons n

Sources: Web Of Science, ORCID
Added: October 12, 2020