Conducting atomic force microscopy studies of nanoscale cobalt silicide Schottky barriers on Si(111) and Si(100)
JOURNAL OF APPLIED PHYSICS, 105(8).
author keywords: annealing; atomic force microscopy; cobalt compounds; elemental semiconductors; Fermi level; impurities; island structure; nanostructured materials; Schottky barriers; silicon; thermionic emission; thin films
Source: Web Of Science
Added: August 6, 2018