Rachel Nye

College of Engineering

Works (10)

Updated: July 5th, 2023 14:48

2023 article

A First-Principles Investigation of the Driving Forces Defining the Selectivity of TiO2 Atomic Layer Deposition

Kaneda, Y., Nye, R. A., Marques, E. A., Armini, S., Delabie, A., Setten, M. J., & Pourtois, G. (2023, May 22). JOURNAL OF PHYSICAL CHEMISTRY C.

Source: Web Of Science
Added: July 3, 2023

2023 journal article

Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 41(3).

Source: Web Of Science
Added: April 11, 2023

2023 article

Enhancing Performance and Function of Polymethacrylate Extreme Ultraviolet Resists Using Area-Selective Deposition

Nye, R. A., Van Dongen, K., De Simone, D., Oka, H., Parsons, G. N., & Delabie, A. (2023, February 23). CHEMISTRY OF MATERIALS, Vol. 2.

Sources: Web Of Science, ORCID
Added: March 20, 2023

2023 article

Quantified Uniformity and Selectivity of TiO2 Films in 45-nm Half Pitch Patterns Using Area-Selective Deposition Supercycles

Nye, R. A. A., Van Dongen, K., Marneffe, J.-F., Parsons, G. N. N., & Delabie, A. (2023, June 17). ADVANCED MATERIALS INTERFACES, Vol. 6.

author keywords: area-selective deposition; nanopatterns; supercycles; TiO2; uniformity
Sources: Web Of Science, ORCID
Added: June 26, 2023

2022 journal article

Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO(2 )area-selective deposition

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, 21(4).

author keywords: extreme ultraviolet lithography; photoresist; area-selective deposition; atomic layer deposition; TiO2; polymethacrylate
Sources: Web Of Science, ORCID
Added: March 6, 2023

2022 article

Improving polymethacrylate EUV resists with TiO2 area-selective deposition

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIX, Vol. 12055.

author keywords: EUV lithography; Photoresist; Area-selective deposition; ALD; TiO2; Polymethacrylate
Sources: Web Of Science, ORCID
Added: September 12, 2022

2022 journal article

Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition

APPLIED PHYSICS LETTERS, 121(8).

Sources: Web Of Science, ORCID
Added: November 21, 2022

2021 article

In situ analysis of growth rate evolution during molecular layer deposition of ultra-thin polyurea films using aliphatic and aromatic precursors

Nye, R. A., Wang, S., Uhlenbrock, S., Smythe, J. A., III, & Parsons, G. N. (2021, December 27). DALTON TRANSACTIONS, Vol. 51.

By: R. Nye n, S. Wang n, S. Uhlenbrock*, J. Smythe* & G. Parsons n

Sources: Web Of Science, ORCID
Added: January 24, 2022

2020 article

Shock Initiation of Reactive Nanolaminates

SHOCK COMPRESSION OF CONDENSED MATTER - 2019, Vol. 2272.

By: S. Matveev, D. Dlott*, P. Hanusova*, J. Maria*, R. Nye n & G. Parsons n

Sources: Web Of Science, ORCID
Added: March 1, 2021

2020 journal article

Understanding Molecular Layer Deposition Growth Mechanisms in Polyurea via Picosecond Acoustics Analysis

CHEMISTRY OF MATERIALS, 32(4), 1553–1563.

Sources: Web Of Science, ORCID
Added: March 23, 2020