Rachel Nye
College of Engineering
Works (11)
Updated: January 26th, 2024 05:00
2024 journal article
Vapor-phase zeolitic imidazolate framework-8 growth on fibrous polymer substrates
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 42(1).
pubs.aip.org (publisher PDF)
Sources: Web Of Science, ORCID, NC State University Libraries
Added: January 6, 2024
2023 article
A First-Principles Investigation of the Driving Forces Defining the Selectivity of TiO2 Atomic Layer Deposition
Kaneda, Y., Nye, R. A., Marques, E. A., Armini, S., Delabie, A., Setten, M. J., & Pourtois, G. (2023, May 22). JOURNAL OF PHYSICAL CHEMISTRY C.
Source: Web Of Science
Added: July 3, 2023
2023 journal article
Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 41(3).
Source: Web Of Science
Added: April 11, 2023
2023 article
Enhancing Performance and Function of Polymethacrylate Extreme Ultraviolet Resists Using Area-Selective Deposition
Nye, R. A., Van Dongen, K., De Simone, D., Oka, H., Parsons, G. N., & Delabie, A. (2023, February 23). CHEMISTRY OF MATERIALS, Vol. 2.
Sources: Web Of Science, ORCID, NC State University Libraries
Added: March 20, 2023
2023 article
Quantified Uniformity and Selectivity of TiO2 Films in 45-nm Half Pitch Patterns Using Area-Selective Deposition Supercycles
Nye, R. A. A., Van Dongen, K., Marneffe, J.-F., Parsons, G. N. N., & Delabie, A. (2023, June 17). ADVANCED MATERIALS INTERFACES, Vol. 6.
author keywords: area-selective deposition; nanopatterns; supercycles; TiO2; uniformity
Sources: Web Of Science, NC State University Libraries
Added: June 26, 2023
2022 journal article
Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO(2 )area-selective deposition
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, 21(4).
author keywords: extreme ultraviolet lithography; photoresist; area-selective deposition; atomic layer deposition; TiO2; polymethacrylate
Sources: Web Of Science, NC State University Libraries
Added: March 6, 2023
2022 article
Improving polymethacrylate EUV resists with TiO2 area-selective deposition
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIX, Vol. 12055.
author keywords: EUV lithography; Photoresist; Area-selective deposition; ALD; TiO2; Polymethacrylate
Sources: Web Of Science, NC State University Libraries
Added: September 12, 2022
2022 journal article
Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition
APPLIED PHYSICS LETTERS, 121(8).
Sources: Web Of Science, ORCID, NC State University Libraries
Added: November 21, 2022
2021 article
In situ analysis of growth rate evolution during molecular layer deposition of ultra-thin polyurea films using aliphatic and aromatic precursors
Nye, R. A., Wang, S., Uhlenbrock, S., Smythe, J. A., III, & Parsons, G. N. (2021, December 27). DALTON TRANSACTIONS, Vol. 51.
TL;DR:
In situ ellipsometry and quartz crystal microbalance are used to explore growth initiation and growth rate evolution during MLD of polyurea using aromatic p-phenylene diisocyanate or aliphatic 1,6-hexamethylene diisOCyanate combined with ethylenediamine or 1, 6-hexanediamine co-reactants to provide useful insight into mechanisms needed to control growth of ultra-thin organic films for advanced applications.
(via Semantic Scholar)
Sources: Web Of Science, ORCID, NC State University Libraries
Added: January 24, 2022
2020 article
Shock Initiation of Reactive Nanolaminates
SHOCK COMPRESSION OF CONDENSED MATTER - 2019, Vol. 2272.
UN Sustainable Development Goal Categories
11. Sustainable Cities and Communities
(Web of Science)
Sources: Web Of Science, NC State University Libraries
Added: March 1, 2021
2020 journal article
Understanding Molecular Layer Deposition Growth Mechanisms in Polyurea via Picosecond Acoustics Analysis
CHEMISTRY OF MATERIALS, 32(4), 1553–1563.
Sources: Web Of Science, ORCID, NC State University Libraries
Added: March 23, 2020
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