Rachel Nye

A First-Principles Investigation of the Driving Forces Defining the Selectivity of TiO2 Atomic Layer Deposition

Kaneda, Y., Nye, R. A., Marques, E. A., Armini, S., Delabie, A., Setten, M. J., & Pourtois, G. (2023, May 22). JOURNAL OF PHYSICAL CHEMISTRY C.

Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 41(3).

Enhancing Performance and Function of Polymethacrylate Extreme Ultraviolet Resists Using Area-Selective Deposition

Nye, R. A., Van Dongen, K., De Simone, D., Oka, H., Parsons, G. N., & Delabie, A. (2023, February 23). CHEMISTRY OF MATERIALS, Vol. 2.

Quantified Uniformity and Selectivity of TiO2 Films in 45-nm Half Pitch Patterns Using Area-Selective Deposition Supercycles

Nye, R. A. A., Van Dongen, K., Marneffe, J.-F., Parsons, G. N. N., & Delabie, A. (2023, June 17). ADVANCED MATERIALS INTERFACES, Vol. 6.

Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO(2 )area-selective deposition

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, 21(4).

Improving polymethacrylate EUV resists with TiO2 area-selective deposition

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIX, Vol. 12055.

Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition

APPLIED PHYSICS LETTERS, 121(8).

In situ analysis of growth rate evolution during molecular layer deposition of ultra-thin polyurea films using aliphatic and aromatic precursors

Nye, R. A., Wang, S., Uhlenbrock, S., Smythe, J. A., III, & Parsons, G. N. (2021, December 27). DALTON TRANSACTIONS, Vol. 51.

Shock Initiation of Reactive Nanolaminates

SHOCK COMPRESSION OF CONDENSED MATTER - 2019, Vol. 2272.

Understanding Molecular Layer Deposition Growth Mechanisms in Polyurea via Picosecond Acoustics Analysis

CHEMISTRY OF MATERIALS, 32(4), 1553–1563.