Rachel Nye
College of Engineering
Works (7)
2023 article
Enhancing Performance and Function of Polymethacrylate Extreme Ultraviolet Resists Using Area-Selective Deposition
Nye, R. A., Van Dongen, K., De Simone, D., Oka, H., Parsons, G. N., & Delabie, A. (2023, February 23). CHEMISTRY OF MATERIALS.
Source: Web Of Science
Added: March 20, 2023
2022 journal article
Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO(2 )area-selective deposition
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, 21(4).
author keywords: extreme ultraviolet lithography; photoresist; area-selective deposition; atomic layer deposition; TiO2; polymethacrylate
Source: Web Of Science
Added: March 6, 2023
2022 article
Improving polymethacrylate EUV resists with TiO2 area-selective deposition
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIX, Vol. 12055.
author keywords: EUV lithography; Photoresist; Area-selective deposition; ALD; TiO2; Polymethacrylate
Source: Web Of Science
Added: September 12, 2022
2022 journal article
Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition
APPLIED PHYSICS LETTERS, 121(8).
Source: Web Of Science
Added: November 21, 2022
2021 article
In situ analysis of growth rate evolution during molecular layer deposition of ultra-thin polyurea films using aliphatic and aromatic precursors
Nye, R. A., Wang, S., Uhlenbrock, S., Smythe, J. A., III, & Parsons, G. N. (2021, December 27). DALTON TRANSACTIONS.
Source: Web Of Science
Added: January 24, 2022
2020 article
Shock Initiation of Reactive Nanolaminates
SHOCK COMPRESSION OF CONDENSED MATTER - 2019, Vol. 2272.
aip.scitation.org (publisher PDF)
Source: Web Of Science
Added: March 1, 2021
2020 journal article
Understanding Molecular Layer Deposition Growth Mechanisms in Polyurea via Picosecond Acoustics Analysis
CHEMISTRY OF MATERIALS, 32(4), 1553–1563.
Source: Web Of Science
Added: March 23, 2020
