Steven Christopher Shannon

Estimation of mean electron energy in helium surface ionization waves on dielectric substrates

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 57(39).

Science challenges and research opportunities for plasma applications in microelectronics

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 42(4).

The MOOSE electromagnetics module

SOFTWAREX, 25.

Design, Modeling, and Analysis of a Compact-External Electromagnetic Pumping System for Pool-Type Liquid Metal-Cooled Fast Reactors

ANNALS OF NUCLEAR ENERGY, 193.

Design, Modeling, and Analysis of a Compact-External Electromagnetic Pumping System for Pool-Type Liquid Metal-Cooled Fast Reactors

ANNALS OF NUCLEAR ENERGY, 193.

Effect of dielectric target properties on plasma surface ionization wave propagation

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 56(14).

Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 41(3).

Plasma surface ionization wave interactions with single channels

PLASMA SOURCES SCIENCE & TECHNOLOGY, 32(9).

Verification and validation of the open-source plasma fluid code: Zapdos*,**

COMPUTER PHYSICS COMMUNICATIONS, 291.

Verification methods for drift-diffusion reaction models for plasma simulations

PLASMA SOURCES SCIENCE & TECHNOLOGY, 32(4).

Comparison of glancing-angle scatterings on different materials in a high aspect ratio plasma etching process using molecular dynamics simulation

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 40(5).

Electron temperature measurements with a hairpin resonator probe in a pulsed low pressure capacitively coupled plasma

Plasma Sources Science and Technology, 5.

Focus ring geometry influence on wafer edge voltage distribution for plasma processes

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films.

Modulating power delivery in a pulsed ICP discharge via the incorporation of negative feedback mechanisms

JOURNAL OF APPLIED PHYSICS, 130(16).

Erratum: Power Matching to Pulsed Inductively Coupled Plasmas [J. Appl. Phys. 127, 133302 (2020)]

Journal of Applied Physics.

Power matching to pulsed inductively coupled plasmas

Journal of Applied Physics.

Radiofrequency phase resolved electron density measurements with the hairpin resonator probe

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 53(14).

Complex transients in power modulated inductively-coupled chlorine plasmas

Plasma Sources Science and Technology, 28(2), 025005.

Doppler-free, Stark broadened profiles at low plasma densities in helium

Journal of Quantitative Spectroscopy and Radiative Transfer, 230, 48–55.

Electromagnetics Simulations with Vector-valued Finite Elements in MOOSE

In Idaho National Laboratory Report (No. INL/CON-18-52320-Rev000).

Measurement of localized plasma perturbation with hairpin resonator probes

Physics of Plasmas, 26(1), 013510.

Time-Resolved Electron Density Measurement Characterization of E–H-Modes for Inductively Coupled Plasma Instabilities

IEEE Transactions on Plasma Science, 47(5), 2102–2109.

High resolution magnetic field measurements in hydrogen and helium plasmas using active laser spectroscopy

Review of Scientific Instruments, 89(10), 10D126.

Driving frequency fluctuations in pulsed capacitively coupled plasmas

The European Physical Journal D, 71(9).

Electron neutral collision frequency measurement with the hairpin resonator probe

Plasma Sources Science and Technology, 26(9), 095002.

IEDF distortion and resolution considerations for RFEA operation at high voltages

Plasma Sources Science and Technology, 26(12), 125001.

Science challenges in low-temperature plasma science and engineering: Enabling a future based on electricity through non-equalibrium plasma chemistry

[NSF Workshop Report]. National Science Foundation.

A temporally and spatially resolved electron density diagnostic method for the edge plasma based on Stark broadening

Review of Scientific Instruments, 87(11), 11E505.

All The Catalytic Active Sites of MoS2 for Hydrogen Evolution

Journal of the American Chemical Society, 138(51), 16632–16638.

Amorphization resistance of nano-engineered SiC under heavy ion irradiation

Journal of Nuclear Materials, 478, 310–314.

Dose dependence of helium bubble formation in nano-engineered SiC at 700 °C

Journal of Nuclear Materials, 472, 153–160.

Fully coupled simulation of the plasma liquid interface and interfacial coefficient effects

Journal of Physics D: Applied Physics, 49(23), 235204.

Novel Engineered Refractory Materials for Advanced Reactor Applications

Size Dependence of Nanoscale Wear of Silicon Carbide

ACS Applied Materials & Interfaces, 9(2), 1929–1940.

Atomistic structures of nano-engineered SiC and radiation-induced amorphization resistance

Journal of Nuclear Materials, 465, 433–437.

Control of ion energy distributions using phase shifting in multi-frequency capacitively coupled plasmas

Journal of Applied Physics, 117(23), 233302.

Electric field determination in the plasma-antenna boundary of a lower-hybrid wave launcher in Tore Supra through dynamic Stark-effect spectroscopy

Plasma Physics and Controlled Fusion, 57(6), 065011.

Momentum, heat, and neutral mass transport in convective atmospheric pressure plasma-liquid systems and implications for aqueous targets

Journal of Physics D: Applied Physics, 48(42), 424007.

A low temperature plasma science program: Discovery science for societal benefit

In FESAC Strategic Planning Panel [White paper].

Competing effects of electronic and nuclear energy loss on microstructural evolution in ionic-covalent materials

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 327, 33–43.

Fertilization of Radishes, Tomatoes, and Marigolds Using a Large-Volume Atmospheric Glow Discharge

Plasma Chemistry and Plasma Processing, 34(6), 1271–1290.

Ion Energy Distribution Skew Control Using Phase-Locked Harmonic RF Bias Drive

IEEE Transactions on Plasma Science, 42(7), 1880–1893.

Irradiation-induced microstructural change in helium-implanted single crystal and nano-engineered SiC

Journal of Nuclear Materials, 453(1-3), 280–286.

Probing the plasma near high power wave launchers in fusion devices for static and dynamic electric fields (invited)

Review of Scientific Instruments, 85(11), 11E301.

Temperature and irradiation species dependence of radiation response of nanocrystalline silicon carbide

Journal of Materials Research, 29(23), 2871–2880.

Experimental and ab initio study of enhanced resistance to amorphization of nanocrystalline silicon carbide under electron irradiation

Journal of Nuclear Materials, 445(1-3), 181–189.

Origin of radiation tolerance in 3C-SiC with nanolayered planar defects

Applied Physics Letters, 103(3), 033104.

Substrate Cleaning Chamber And Cleaning And Conditioning Methods

https://www.lens.org/184-581-960-252-75X

A VHF driven coaxial atmospheric air plasma: electrical and optical characterization

Journal of Physics D: Applied Physics, 45(19), 195204.

Nanoscale engineering of radiation tolerant silicon carbide

Physical Chemistry Chemical Physics, 14(38), 13429.

Plasma-Assisted Pattern Transfer at the Nanoscale

In S. Cabrini & S. Kawata (Eds.), Nanofabrication Handbook (pp. 111–126). Boca Raton FL: CRC Press Taylor and Francis Group.

The impact of Langmuir probe geometries on electron current collection and the integral relation for obtaining electron energy distribution functions

Plasma Sources Science and Technology, 21(2), 025003.

Improving Plasma Process Uniformity Across A Wafer By Apportioning Power Among Plural Vhf Sources

https://www.lens.org/035-374-849-498-503

Limitations of Regularization Methods for the Reconstruction of Electron Velocity Distribution Function

IEEE Transactions on Plasma Science, 39(4), 1034–1037.

Method Of Processing A Workpiece In A Plasma Reactor With Variable Height Ground Return Path To Control Plasma Ion Density Uniformity

https://www.lens.org/082-874-457-200-865

Plasma Process Uniformity Across A Wafer By Apportioning Ground Return Path Impedances Among Plural Vhf Sources

https://www.lens.org/004-808-299-268-13X

Plasma Process Uniformity Across A Wafer By Controlling A Variable Frequency Coupled To A Harmonic Resonator

https://www.lens.org/145-961-377-173-552

Plasma Process Uniformity Across A Wafer By Controlling Rf Phase Between Opposing Electrodes

https://www.lens.org/003-021-090-469-410

Reduction of EEDF Measurement Distortion in Regularized Solutions of the Druyvesteyn Relation

IEEE Transactions on Plasma Science, 39(1), 596–602.

Method For Testing Plasma Reactor Multi-frequency Impedance Match Networks

https://www.lens.org/078-180-755-189-413

Plasma Control Using Dual Cathode Frequency Mixing

https://www.lens.org/089-103-194-978-761

Electron Energy Distribution Function Extraction Using Integrated Step Function Response and Regularization Methods

IEEE Transactions on Plasma Science, 38(2), 156–162.

Guest Editorial Special Issue on Advances on Plasma Processing for Semiconductor Manufacturing

IEEE Transactions on Plasma Science, 37(9), 1662–1664.

Plasma Generation And Control Using Dual Frequency Rf Signals

https://www.lens.org/092-968-410-882-459

Dual Bias Frequency Plasma Reactor With Feedback Control Of E.s.c. Voltage Using Wafer Voltage Measurement At The Bias Supply Output

https://www.lens.org/062-461-753-606-236

Method Of Feedback Control Of Esc Voltage Using Wafer Voltage Measurement At The Bias Supply Output

https://www.lens.org/061-721-158-934-878

Plasma Generation And Control Using A Dual Frequency Rf Source

https://www.lens.org/073-265-216-590-516

Global Modeling of Magnetized Capacitive Discharges

IEEE Transactions on Plasma Science, 35(5), 1413–1419.

Plasma Control Using Dual Cathode Frequency Mixing

https://www.lens.org/198-151-282-809-229

Plasma Generation And Control Using A Dual Frequency Rf Source

https://www.lens.org/001-723-961-714-703

Plasma Generation And Control Using Dual Frequency Rf Signals

https://www.lens.org/093-426-771-044-119

Frequency optimization for capacitively coupled plasma source

IEEE Transactions on Plasma Science, 33(2), 382–383.

Plasma Control Using Dual Cathode Frequency Mixing

https://www.lens.org/145-542-565-144-947

Plasma Generation And Control Using A Dual Frequency Rf Source

https://www.lens.org/118-952-420-673-621

The impact of frequency mixing on sheath properties: Ion energy distribution and Vdc∕Vrf interaction

Journal of Applied Physics, 97(10), 103304.

A reconstruction algorithm for a spatially resolved plasma optical emission spectroscopy sensor

Journal of Quantitative Spectroscopy and Radiative Transfer, 68(1), 101–115.

Optical emission reference data for the GEC reference cell

IEEE Transactions on Plasma Science, 28(6), 2187–2193.

Spatially resolved fluorine actinometry

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 17(5), 2703–2708.

A spatially resolved optical emission sensor for plasma etch monitoring

Applied Physics Letters, 71(11), 1467–1468.

A Glow Discharge Tomography Sensor for Monitoring Etch Uniformity

Shannon, S. (Masters Thesis).

Spatially resolved analysis of plasma etch discharges using a novel optical emission spectroscopy sensor

Shannon, S. (Ph.D. Thesis).