Works (3)
2013 article
Improved high-temperature device transport properties and off-state characteristics of AlGaN/GaN power devices with atomic layer deposition (ALD) HfAlO high-kdielectric
Lee, B., Choi, Y. H., Kirkpatrick, C., Huang, A. Q., & Misra, V. (2013, June 21). Semiconductor Science and Technology, Vol. 28.
2012 article
Normally‐off AlGaN/GaN MOSHFET using ALD SiO2 tunnel dielectric and ALD HfO2 charge storage layer for power device application
Lee, B., Kirkpatrick, C., Choi, Y., Yang, X., Huang, A. Q., & Misra, V. (2012, February 29). Physica Status Solidi. C, Conferences and Critical Reviews/Physica Status Solidi. C, Current Topics in Solid State Physics, Vol. 9, pp. 868–870.
2011 article
Threshold voltage stability comparison in AlGaN/GaN FLASH MOS‐HFETs utilizing charge trap or floating gate charge storage
Kirkpatrick, C., Lee, B., Choi, Y. H., Huang, A., & Misra, V. (2011, November 21). Physica Status Solidi. C, Conferences and Critical Reviews/Physica Status Solidi. C, Current Topics in Solid State Physics, Vol. 9, pp. 864–867.