Yao Du

College of Engineering

2022 journal article

Comparison of glancing-angle scatterings on different materials in a high aspect ratio plasma etching process using molecular dynamics simulation

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 40(5).

By: Y. Du, F. Kruger*, S. Nam*, H. Lee*, S. Yoo*, J. Eapen, M. Kushner*, S. Shannon

Sources: Web Of Science, ORCID
Added: September 2, 2022