2022 journal article
Comparison of glancing-angle scatterings on different materials in a high aspect ratio plasma etching process using molecular dynamics simulation
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 40(5).
By: Y. Du n, F. Kruger *, S. Nam *, H. Lee*, S. Yoo *, J. Eapen n, M. Kushner *, S. Shannon n
