@article{luo_misra_2008, title={Fabrication of large area nano-rings for MRAM application}, volume={85}, ISSN={["0167-9317"]}, DOI={10.1016/j.mee.2008.03.004}, abstractNote={We have developed lateral etch techniques to fabricate large area high density nano-scale magnetic ring arrays by deep ultraviolet lithography. Both centered and de-centered rings have been obtained. The width of the rings are controlled by the lateral etch time, and the inner ring diameter was scaled down below the lithography resolution limit. For de-centered rings, the shift between the center of inner and outer circles was easily adjustable. The characteristics of the ring arrays were characterized by SEM, AFM and SQUID.}, number={7}, journal={MICROELECTRONIC ENGINEERING}, author={Luo, Yong and Misra, Veena}, year={2008}, month={Jul}, pages={1555–1560} }
 @article{luo_du_misra_2008, title={Large area nanorings fabricated using an atomic layer deposition Al(2)O(3) spacer for magnetic random access memory application}, volume={19}, ISSN={["0957-4484"]}, DOI={10.1088/0957-4484/19/26/265301}, abstractNote={We have designed a novel atomic layer deposition (ALD) Al2O3 spacer mask technique for fabricating large area high density nanoscale magnetic rings by photolithography for magnetic random access memory applications. A simple mask design and a low temperature ALD process were utilized to simplify the process. Dry etching of Al2O3 and cobalt was investigated for optimizing the nanostructure dimension control. A ring array with density and dimensions below the limits for photolithography tools has been achieved. The magnetic behavior of the ring array was characterized using a SQUID (superconducting quantum interference device). The switching distribution and effects of interaction among ring arrays were studied by correlating simulation with experimental results.}, number={26}, journal={NANOTECHNOLOGY}, author={Luo, Yong and Du, Yan and Misra, Veena}, year={2008}, month={Jul} }
 @article{luo_misra_2006, title={Large-area long-range ordered anisotropic magnetic nanostructure fabrication by photolithography}, volume={17}, ISSN={["0957-4484"]}, DOI={10.1088/0957-4484/17/19/021}, abstractNote={In-plane anisotropic nanostructures have been fabricated using deep ultraviolet (UV) lithography. Dimensions from over 100 nm down to 50 nm with periods of 300 nm for a diamond shape and 159 nm for a triangular shape can be obtained using one mask by the over-exposure technique. Patterns transferred to a substrate to create magnetic films containing dots and antidots have been demonstrated. Hysteresis loop measurements proved higher coercivity for patterned films compared with continuous film.}, number={19}, journal={NANOTECHNOLOGY}, author={Luo, Yong and Misra, Veena}, year={2006}, month={Oct}, pages={4909–4911} }