2020 journal article

Engineering a Unified Dielectric Solution for AlGaN/GaN MOS-HFET Gate and Access Regions


author keywords: AlGaN/GaN; atomic layer deposition (ALD); current collapse; HfO2; high electron mobility transistor (HEMT); high-k; high-temperature reverse bias (HTRB); hydroxyl; interface; MOS; HFET; oxidant; reliability; traps
Source: Web Of Science
Added: April 14, 2020

Typically GaN metal-oxide-semiconductor heterojunction-field-effect transistors (MOS-HFETs) have used two separate dielectrics for the gate and access regions. However, as this article shows, with proper gate-stack engineering, a unified dielectric solution can be achieved for the transistor. HfO2 dielectrics were deposited by atomic layer deposition (ALD). Two types of oxidants were investigated, namely, water (H2O) and ozone (O3). It was found that MOS-HFETs with O3 oxidant yielded lower threshold voltage ( ${V}_{\text {TH}}$ ) shifts, higher maximum drain current ( ${I}_{\text {DS,max}}$ ) of 340 mA/mm, 20% lower ON-resistance ( ${R}_{ {\mathrm {\scriptscriptstyle {ON}}}}$ ), higher peak transconductance at 112.66 mS/mm, lower hysteresis, and lower gate leakage ( ${5.4} \times {10}^{-{6}}$ A/cm2) compared to water oxidant based MOS-HFETs with ${I}_{\text {DS},\text {max}}$ of 240 mA/mm, 81.38 mS/mm peak transconductance, and ${1.7} \times {10}^{-{4}}$ A/cm2 gate leakage. DC/RF dispersion tests showed MOS-HFETs with O3 oxidant had ~200 $\times $ better current collapse recovery. Temperature characterization and reliability test results, such as high-temperature reverse bias (HTRB), are published for the first time on ALD-HfO2/AlGaN/GaN MOS-HFETs using tetrakis(dimethylamino)hafnium (TDMAH) and O3 precursor. Using an ozone oxidant provided more stability (i.e., less variability in ${R}_{ {\mathrm {\scriptscriptstyle {ON}}}}$ and ${V}_{\text {TH}}$ ) as a function of temperature. Finally, when devices were electrically stressed in the OFF-state, the HTRB test showed minimal ${V}_{\text {TH}}$ drift ( ${V}_{\text {TH}}$ drift (2.5 V) in the case of H2O oxidant.