Patricia A. O'Neil

Fang, H., Ozturk, M. C., PA O'Neil, & Seebauer, E. G. (2001). Arsenic redistribution during rapid thermal chemical vapor deposition of TiSi2 on Si. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 148(2), G43–G49. https://doi.org/10.1149/1.1339236

PA O'Neil, Ozturk, M. C., Batchelor, A. D., Xu, M. M., & Maher, D. M. (1999). Effects of oxygen during selective silicon epitaxial growth using disilane and chlorine. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 146(6), 2344–2352. https://doi.org/10.1149/1.1391938

PA O'Neil, Ozturk, M. C., Batchelor, A. D., & Maher, D. M. (1999). Effects of oxygen on selective silicon deposition using disilane. MATERIALS LETTERS, 38(6), 418–422. https://doi.org/10.1016/S0167-577X(98)00200-6

PA O'Neil, Ozturk, M. C., Batchelor, A. D., Venables, D., Xu, M. M., & Maher, D. M. (1999). Growth of selective silicon epitaxy using disilane and chlorine on heavily implanted substrates - I. Role of implanted BF2. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 146(8), 3070–3078. https://doi.org/10.1149/1.1392052

PA O'Neil, Ozturk, M. C., Batchelor, A. D., Venables, D., & Maher, D. M. (1999). Growth of selective silicon epitaxy using disilane and chlorine on heavily implanted substrates - II. Role of implanted arsenic. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 146(8), 3079–3086. https://doi.org/10.1149/1.1392053

PA O'Neil, Ozturk, M. C., Batchelor, A. D., Xu, M. M., & Maher, D. M. (1999). Quality of selective silicon epitaxial films deposited using disilane and chlorine. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 146(6), 2337–2343. https://doi.org/10.1149/1.1391937

Srivastava, A., Sun, J., Bellur, K., Bartholomew, R. F., O'Neil, P., Celik, S. M., … Fowler, B. (1997). A 0.18 ?m CMOS technology for elevated source/drain MOSFETs using selective silicon epitaxy. ULSI science and technology/1997: Proceedings of the Sixth International Symposium on UltraLarge Scale Integration Science and Technology (Proceedings (Electrochemical Society); v. 97-3), 571–585. Pennington, NJ: Electrochemical Society.

ONeil, P. A., Ozturk, M. C., Violette, K. E., Batchelor, D., Christensen, K., & Maher, D. M. (1997). Optimization of process conditions for selective silicon epitaxy using disilane, hydrogen, and chlorine. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 144(9), 3309–3315. https://doi.org/10.1149/1.1838003

Sun, J., Bartholomew, R. F., Bellur, K., ONeil, P. A., Srivastava, A., Violette, K. E., … Masnari, N. A. (1996). Sub-half micron elevated source/drain NMOSFETs by low temperature selective epitaxial deposition. RAPID THERMAL AND INTEGRATED PROCESSING V, Vol. 429, pp. 343–347. https://doi.org/10.1557/proc-429-343