Works (4)
Updated: July 5th, 2023 16:04
1999 journal article
Process sensing and metrology in gate oxide growth by rapid thermal chemical vapor deposition from SiH4 and N2O
Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 17(4), 1417–1423.
Source: NC State University Libraries
Added: August 6, 2018
1998 journal article
Integrated dynamic simulation of rapid thermal chemical vapor deposition of polysilicon
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 11(1), 63–74.
author keywords: CVD; semiconductor process modeling; simulation
hdl.handle.net (repository)
Source: Web Of Science
Added: August 6, 2018
1997 journal article
Contamination control for gas delivery from a liquid source in semiconductor manufacturing
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 10(4), 425–432.
author keywords: CVD; environmental factors; etching; semiconductor manufacturing; simulation
Source: Web Of Science
Added: August 6, 2018
1997 journal article
Polysilicon RTCVD process optimization for environmentally-conscious manufacturing
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 10(3), 390–398.
author keywords: CVD; environmental factors; semiconductor process modeling; simulation
Source: Web Of Science
Added: August 6, 2018
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