Works (2)
Updated: July 5th, 2023 15:50
2009 journal article
Mechanism of Extreme Ultraviolet Photoresist Development with a Supercritical CO2 Compatible Salt
LANGMUIR, 25(11), 6176–6190.
TL;DR:
The mechanism of developing an extreme ultraviolet (EUV) commercial photoresist with supercritical carbon dioxide (scCO2) and a CO2 compatible salt (CCS) solution was studied and the CCS partitioning into the resist was found to decrease with increasing temperature, revealing an enthalpy-driven CCS absorption.
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UN Sustainable Development Goal Categories
9. Industry, Innovation and Infrastructure
(Web of Science)
Source: Web Of Science
Added: August 6, 2018
2009 journal article
Sorption of CO2 and a CO2 Compatible Salt into an Extreme Ultraviolet Photoresist Film on a SiO2 Substrate
JOURNAL OF PHYSICAL CHEMISTRY B, 113(29), 9687–9693.
MeSH headings : Adsorption; Carbon Dioxide / chemistry; Diffusion; Membranes, Artificial; Pressure; Salts / chemistry; Silicon Dioxide / chemistry; Solutions; Surface Properties; Temperature; Ultraviolet Rays
TL;DR:
The sorption behavior of CO2 and the CCS onto a bare SiO2 surface and into the photoresist was studied using a quartz crystal microbalance (QCM) and the adsorption of the C CS was favored and driven by entropy changes.
(via Semantic Scholar)
Source: Web Of Science
Added: August 6, 2018
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