@article{zweber_wagner_deyoung_carbonell_2009, title={Mechanism of Extreme Ultraviolet Photoresist Development with a Supercritical CO2 Compatible Salt}, volume={25}, ISSN={["0743-7463"]}, DOI={10.1021/la8043158}, abstractNote={The mechanism of developing an extreme ultraviolet (EUV) commercial photoresist with supercritical carbon dioxide (scCO2) and a CO2 compatible salt (CCS) solution was studied. The cloud point of CCS in CO2 and the pressure at which the photoresist dissolves in CCS/scCO2 were determined for temperatures between 35 and 50 degrees C. For this temperature range, it was found that the CCS cloud point ranges between 11.2 and 16.1 MPa, while the photoresist dissolution point ranges from 15.5 to 21.3 MPa. The kinetics of the CCS/scCO2 development was modeled using a simplified rate equation, where the rate-limiting steps were photoresist dissolution and mass transfer. The effects of temperature, mass transfer, pressure, and CCS concentration on photoresist removal rate were further explored experimentally using a high-pressure quartz crystal microbalance (QCM). Increasing temperature (35-50 degrees C) at a constant fluid density of 0.896 g/mL was found to increase the removal rate following an Arrhenius behavior with a photoresist dissolution energy of activation, Ea, equal to 79.0 kJ/mol. The removal was zero order in CCS concentration, signifying photoresist phase transfer, photoresist mass transfer, or both were rate limiting. Mass transfer studies showed that circulation enhanced the photoresist removal rate, but that the mass transfer coefficient was independent of temperature from 35 degrees C to 50 degrees C. In pressure studies, increasing pressure (27.6-34.5 MPa) at a constant temperature of 40 degrees C increased the removal rate by enhancing the fluid density, but at 50 degrees C increasing pressure had little effect on the removal rate. When the total CCS concentration was in large global excess over the number of Bronsted acid groups in the polymer (2400:1 at 5 mM CCS concentration), the mass of photoresist removed varied linearly with time. At lower CCS concentrations but still in global excess of the number of Bronsted acid groups, the photoresist removal slowed (0.5 mm CCS, approximately 240:1) or was prevented (0.03 Mm CCS, approximately 15:1) due to partitioning of the CCS between the CO(2)-rich phase and the film. The CCS partitioning into the resist was found to decrease with increasing temperature, revealing an enthalpy-driven CCS absorption.}, number={11}, journal={LANGMUIR}, author={Zweber, Amy E. and Wagner, Mark and DeYoung, James and Carbonell, Ruben G.}, year={2009}, month={Jun}, pages={6176–6190} }
 @article{zweber_wagner_carbonell_2009, title={Sorption of CO2 and a CO2 Compatible Salt into an Extreme Ultraviolet Photoresist Film on a SiO2 Substrate}, volume={113}, ISSN={["1520-6106"]}, DOI={10.1021/jp900481j}, abstractNote={The development of standard extreme ultraviolet (EUV) lithography photoresists with a CO2 compatible salt (CCS) and supercritical carbon dioxide (scCO2) solution has several advantages over typical trimethylammonium hydroxide development, including reduced image collapse and line width roughness in the resulting microchip features. The mechanism and characteristics of the CCS/scCO2 development process are currently being examined. In this paper, the sorption behavior of CO2 and the CCS onto a bare SiO2 surface and into the photoresist was studied using a quartz crystal microbalance (QCM). From the adsorption studies of CO2 and CCS/CO2 onto a bare SiO2 surface, it was found that the CCS begins to adsorb at 8.0 MPa at a temperature of 35 degrees C and at 9.4 MPa at a temperature of 50 degrees C. The adsorption of the CCS was favored and driven by entropy changes. The absorption of CO2 into the glassy photoresist resin was also measured with QCM and found comparable to CO2 absorption in glassy polystyrene for 35 and 50 degrees C up to a pressure where the photoresist is believed to dewet from the substrate. The diffusion behavior during CO2 absorption was found to be comparable to that of small fluorescent molecule diffusion in a CO2 swollen polystyrene.}, number={29}, journal={JOURNAL OF PHYSICAL CHEMISTRY B}, author={Zweber, Amy E. and Wagner, Mark and Carbonell, Ruben G.}, year={2009}, month={Jul}, pages={9687–9693} }