Works (11)

Updated: July 5th, 2023 16:02

2001 patent

Methods of raising reflow temperature of glass alloys by thermal treatment in steam, and microelectronic structures formed thereby

Washington, DC: U.S. Patent and Trademark Office.

Source: NC State University Libraries
Added: August 6, 2018

2000 journal article

Deposition and characterization of undoped and boron and phosphorus doped (SixGe1-xO2) glass films

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 147(4), 1560–1567.

By: D. Simpson n, R. Croswell n, A. Reisman n, C. Williams n & D. Temple n

Source: Web Of Science
Added: August 6, 2018

2000 journal article

Planarization processes and applications III. As-deposited and annealed film properties

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 147(4), 1513–1524.

By: R. Croswell n, A. Reisman n, D. Simpson n, D. Temple* & C. Williams*

UN Sustainable Development Goal Categories
6. Clean Water and Sanitation (OpenAlex)
Source: Web Of Science
Added: August 6, 2018

2000 journal article

Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: A thermodynamic analysis I. The system Si-Ge-Cl-H

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 147(11), 4333–4341.

By: R. Soman n, A. Reisman n & D. Temple n

Source: Web Of Science
Added: August 6, 2018

2000 journal article

Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: A thermodynamic analysis II. The system Si-Ge-Cl-H-Ar

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 147(11), 4342–4344.

By: R. Soman n, A. Reisman n & D. Temple n

Source: Web Of Science
Added: August 6, 2018

2000 journal article

Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: Experimental data I. Deposition parameters

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 147(5), 1847–1853.

By: R. Soman n, A. Reisman n, D. Temple n & R. Alberti

Source: Web Of Science
Added: August 6, 2018

2000 journal article

Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: Experimental data II. Morphology and composition as a function of deposition parameters

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 147(5), 1854–1858.

By: R. Soman n, A. Reisman n, D. Temple n, R. Alberti & C. Pace*

Source: Web Of Science
Added: August 6, 2018

1999 journal article

An alternative derivation for the equilibrium constant of binary solid solution-vapor systems

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 146(10), 3817–3818.

By: R. Soman n, A. Reisman n & D. Temple n

Source: Web Of Science
Added: August 6, 2018

1999 journal article

Differential thermal analysis of glass mixtures containing SiO2, GeO2, B2O3, and P2O5

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 146(12), 4569–4579.

By: R. Croswell n, A. Reisman n, D. Simpson n, D. Temple* & C. Williams*

UN Sustainable Development Goal Categories
Source: Web Of Science
Added: August 6, 2018

1999 journal article

Planarization processes and applications - I. Undoped GeO2-SiO2 glasses

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 146(10), 3860–3871.

By: D. Simpson n, R. Croswell n, A. Reisman n, D. Temple n & C. Williams n

UN Sustainable Development Goal Categories
7. Affordable and Clean Energy (OpenAlex)
Source: Web Of Science
Added: August 6, 2018

1999 journal article

Planarization processes and applications - II. B2O3/P2O5 doped GeO2-SiO2 classes

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 146(10), 3872–3885.

By: D. Simpson n, R. Croswell n, A. Reisman n, D. Temple n & C. Williams n

Source: Web Of Science
Added: August 6, 2018

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