@misc{croswell_reisman_simpson_temple_williams_2001, title={Methods of raising reflow temperature of glass alloys by thermal treatment in steam, and microelectronic structures formed thereby}, volume={6,271,150}, number={2001 Aug. 7}, publisher={Washington, DC: U.S. Patent and Trademark Office}, author={Croswell, R. T. and Reisman, A. and Simpson, D. L. and Temple, D. and Williams, C. K.}, year={2001} }
 @article{simpson_croswell_reisman_williams_temple_2000, title={Deposition and characterization of undoped and boron and phosphorus doped (SixGe1-xO2) glass films}, volume={147}, DOI={10.1149/1.1393394}, number={4}, journal={Journal of the Electrochemical Society}, author={Simpson, D. L. and Croswell, R. T. and Reisman, A. and Williams, C. K. and Temple, D.}, year={2000}, pages={1560–1567} }
 @article{croswell_reisman_simpson_temple_williams_2000, title={Planarization processes and applications III. As-deposited and annealed film properties}, volume={147}, DOI={10.1149/1.1393387}, number={4}, journal={Journal of the Electrochemical Society}, author={Croswell, R. T. and Reisman, A. and Simpson, D. L. and Temple, D. and Williams, C. K.}, year={2000}, pages={1513–1524} }
 @article{soman_reisman_temple_2000, title={Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: A thermodynamic analysis I. The system Si-Ge-Cl-H}, volume={147}, DOI={10.1149/1.1394065}, number={11}, journal={Journal of the Electrochemical Society}, author={Soman, R. and Reisman, A. and Temple, D.}, year={2000}, pages={4333–4341} }
 @article{soman_reisman_temple_2000, title={Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: A thermodynamic analysis II. The system Si-Ge-Cl-H-Ar}, volume={147}, DOI={10.1149/1.1394066}, number={11}, journal={Journal of the Electrochemical Society}, author={Soman, R. and Reisman, A. and Temple, D.}, year={2000}, pages={4342–4344} }
 @article{soman_reisman_temple_alberti_2000, title={Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: Experimental data I. Deposition parameters}, volume={147}, DOI={10.1149/1.1393445}, number={5}, journal={Journal of the Electrochemical Society}, author={Soman, R. and Reisman, A. and Temple, D. and Alberti, R.}, year={2000}, pages={1847–1853} }
 @article{soman_reisman_temple_alberti_pace_2000, title={Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: Experimental data II. Morphology and composition as a function of deposition parameters}, volume={147}, DOI={10.1149/1.1393446}, number={5}, journal={Journal of the Electrochemical Society}, author={Soman, R. and Reisman, A. and Temple, D. and Alberti, R. and Pace, C.}, year={2000}, pages={1854–1858} }
 @article{soman_reisman_temple_1999, title={An alternative derivation for the equilibrium constant of binary solid solution-vapor systems}, volume={146}, DOI={10.1149/1.1392557}, number={10}, journal={Journal of the Electrochemical Society}, author={Soman, R. and Reisman, A. and Temple, D.}, year={1999}, pages={3817–3818} }
 @article{croswell_reisman_simpson_temple_williams_1999, title={Differential thermal analysis of glass mixtures containing Sio2, Geo2, B2o3, and P2o5}, volume={146}, DOI={10.1149/1.1392676}, number={12}, journal={Journal of the Electrochemical Society}, author={Croswell, R. T. and Reisman, A. and Simpson, D. L. and Temple, D. and Williams, C. K.}, year={1999}, pages={4569–4579} }
 @article{simpson_croswell_reisman_temple_williams_1999, title={Planarization processes and applications - I. Undoped GeO2-SiO2 glasses}, volume={146}, DOI={10.1149/1.1392565}, number={10}, journal={Journal of the Electrochemical Society}, author={Simpson, D. L. and Croswell, R. T. and Reisman, A. and Temple, D. and Williams, C. K.}, year={1999}, pages={3860–3871} }
 @article{simpson_croswell_reisman_temple_williams_1999, title={Planarization processes and applications - II. B2O3/P2O5 doped GeO2-SiO2 classes}, volume={146}, DOI={10.1149/1.1392566}, number={10}, journal={Journal of the Electrochemical Society}, author={Simpson, D. L. and Croswell, R. T. and Reisman, A. and Temple, D. and Williams, C. K.}, year={1999}, pages={3872–3885} }