2001 journal article

Time-dependent Si etch behavior and its effect on oxide/Si selectivity in CF4+D-2 electron cyclotron resonance plasma etching

Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 19(3), 695–700.

By: K. Min, H. Lamb & J. Hauser

Source: NC State University Libraries
Added: August 6, 2018

1998 journal article

Endpoint uniformity sensing and analysis in silicon dioxide plasma etching using in situ mass spectrometry

Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 16(6), 2996–3002.

By: J. Chambers, K. Min & G. Parsons

Source: NC State University Libraries
Added: August 6, 2018

1998 journal article

Repair-unit location models for power failures

IEEE Transactions on Engineering Management, 45(1), 57–65.

By: M. Yao & K. Min

Source: NC State University Libraries
Added: August 6, 2018