Works (3)

Updated: July 5th, 2023 16:03

2001 journal article

Time-dependent Si etch behavior and its effect on oxide/Si selectivity in CF4+D-2 electron cyclotron resonance plasma etching

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 19(3), 695–700.

By: K. Min n, H. Lamb n & . Hauser n

Source: Web Of Science
Added: August 6, 2018

1998 journal article

Endpoint uniformity sensing and analysis in silicon dioxide plasma etching using in situ mass spectrometry

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 16(6), 2996–3002.

By: J. Chambers*, K. Min & G. Parsons

Sources: Web Of Science, ORCID
Added: August 6, 2018

1998 journal article

Repair-unit location models for power failures

IEEE TRANSACTIONS ON ENGINEERING MANAGEMENT, 45(1), 57–65.

By: M. Yao n & K. Min*

author keywords: goal programming; power failure; unit location model
Source: Web Of Science
Added: August 6, 2018