Works (3)
2001 journal article
Time-dependent Si etch behavior and its effect on oxide/Si selectivity in CF4+D-2 electron cyclotron resonance plasma etching
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 19(3), 695–700.
![UN Sustainable Development Goals Color Wheel](/assets/un-sdg/SDG-Wheel_WEB-small-9baffff2694056ba5d79cdadadac07d345a206e13477bd1034bd8925f38f3c4b.png)
1998 journal article
Endpoint uniformity sensing and analysis in silicon dioxide plasma etching using in situ mass spectrometry
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 16(6), 2996–3002.
Contributors: J. Chambers n, n & G. Parsons n
![UN Sustainable Development Goals Color Wheel](/assets/un-sdg/SDG-Wheel_WEB-small-9baffff2694056ba5d79cdadadac07d345a206e13477bd1034bd8925f38f3c4b.png)
1998 journal article
Repair-unit location models for power failures
IEEE TRANSACTIONS ON ENGINEERING MANAGEMENT, 45(1), 57–65.
![UN Sustainable Development Goals Color Wheel](/assets/un-sdg/SDG-Wheel_WEB-small-9baffff2694056ba5d79cdadadac07d345a206e13477bd1034bd8925f38f3c4b.png)