2001 journal article
Time-dependent Si etch behavior and its effect on oxide/Si selectivity in CF4+D-2 electron cyclotron resonance plasma etching
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 19(3), 695–700.
1998 journal article
Endpoint uniformity sensing and analysis in silicon dioxide plasma etching using in situ mass spectrometry
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 16(6), 2996–3002.
1998 journal article
Repair-unit location models for power failures
IEEE TRANSACTIONS ON ENGINEERING MANAGEMENT, 45(1), 57–65.
