@article{king_davis_carter_schneider_nemanich_2015, title={Hydrogen desorption kinetics for aqueous hydrogen fluoride and remote hydrogen plasma processed silicon (001) surfaces}, volume={33}, DOI={10.1116/1.4926733}, number={5}, journal={Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films}, author={King, S. W. and Davis, R. F. and Carter, R. J. and Schneider, T. P. and Nemanich, R. J.}, year={2015} }
 @article{carter_hauser_nemanich_2000, title={Surface residue island nucleation in anhydrous HF/alcohol vapor processing of Si surfaces}, volume={147}, DOI={10.1149/1.1393929}, number={9}, journal={Journal of the Electrochemical Society}, author={Carter, R. J. and Hauser, J. R. and Nemanich, R. J.}, year={2000}, pages={3512–3518} }