Works (1)

Updated: July 5th, 2023 16:02

1999 journal article

Optimal design of a high pressure organometallic chemical vapor deposition reactor

MATHEMATICAL AND COMPUTER MODELLING, 29(8), 65–80.

By: K. Bachmann n, H. Banks n, C. Hopfner*, G. Kepler n, S. LeSure n, S. McCall n, J. Scroggs n

co-author countries: United States of America 🇺🇸
Source: Web Of Science
Added: August 6, 2018

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