Works (4)
2000 article
Design and integration considerations for end-of-the roadmap ultrashallow junctions
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, Vol. 18, pp. 338–345.
2000 journal article
Impact of gate workfunction on device performance at the 50 nm technology node
SOLID-STATE ELECTRONICS, 44(6), 1077–1080.
2000 journal article
Limitations of the modified shift-and-ratio technique for extraction of the bias dependence of L-eff and R-sd of LDD MOSFET's
IEEE TRANSACTIONS ON ELECTRON DEVICES, 47(4), 891–895.
1999 journal article
Impact of super-steep-retrograde channel doping profiles on the performance of scaled devices
IEEE TRANSACTIONS ON ELECTRON DEVICES, 46(8), 1711–1717.