@article{kim_novick_desimone_carbonell_2006, title={Ultrathin film deposition by liquid CO2 free meniscus coating-uniformity and morphology}, volume={22}, ISSN={["0743-7463"]}, DOI={10.1021/la0521600}, abstractNote={Ultrathin organic films of sucrose octaacetate (SOA) were deposited on 12.5 cm diameter silicon wafer substrates using high-pressure free meniscus coating (hFMC) with liquid CO2 (l-CO2) as a coating solvent. The dry film thickness across the wafer and the morphology of deposited films were characterized as a function of coating conditions-withdrawal velocity, solution concentration, and evaporation driving force (deltaP). When no evaporation driving force was applied (deltaP = 0), highly uniform films were deposited with thickness in the range of 8-105 angstroms over the entire concentration range (3-11 wt%). Uniform films were also obtained at low concentrations (3-5 wt%) with a low evaporation driving force (deltaP = 0.0138 MPa). However, films deposited at medium to high concentrations (7-11 wt%) were thicker (110-570 angstroms) and less uniform, with larger nonuniformities at higher applied evaporation driving forces. Optical microscopy and atomic force microscopy (AFM) were used to characterize film morphology including drying defects and film roughness. Films deposited without evaporation had no apparent drying defects and very low root-mean-square (RMS) roughness (1.4-3.8 angstroms). Spinodal-like dewetting morphologies including holes with diameters in the range of 100-300 nm, and surface undulations were observed in films deposited at medium concentration (7 wt%) and low deltaP (0.0138-0.0276 MPa). At higher concentrations and higher evaporative driving forces, spinodal-like dewetting morphologies disappeared but concentric ring defect structures were observed with diameters in the range 20-125 microm. The film thickness and morphology of SOA films deposited from 1-CO2 hFMC were compared to those deposited from toluene and acetone under normal dip coating. Films deposited from l-CO2 hFMC were much thinner, more uniform, and exhibited much fewer drying defects and lower RMS roughness.}, number={2}, journal={LANGMUIR}, author={Kim, J and Novick, BJ and DeSimone, JM and Carbonell, RG}, year={2006}, month={Jan}, pages={642–657} }
 @article{novick_desimone_carbonell_2004, title={Deposition of Thin Polymeric Films from Liquid Carbon Dioxide Using a High-Pressure Free-Meniscus Coating Process}, volume={43}, ISSN={0888-5885 1520-5045}, url={http://dx.doi.org/10.1021/ie030688z}, DOI={10.1021/ie030688z}, abstractNote={Free-meniscus coating processes can be used to deposit a wide variety of coatings. However, the physical properties of the coating solutions often lead to the deposition of nonuniform films. Recently, it has been recognized that compressed carbon dioxide can be used as an environmentally benign solvent for industrial processes. We investigate the use of liquid carbon dioxide as the solvent in free-meniscus coating processes because its physical properties are much different from standard coating solvents. The surface tension and viscosity of liquid carbon dioxide are an order of magnitude smaller than those of typical solvents. Additionally, the density of liquid carbon dioxide is strongly dependent on temperature and pressure. The Tallmadge four-force inertial theory is used to demonstrate that these unique physical properties will result in the formation of thinner films at the same withdrawal velocities as those used with conventional solvents. We then demonstrate experimentally that process variables ...}, number={2}, journal={Industrial & Engineering Chemistry Research}, publisher={American Chemical Society (ACS)}, author={Novick, Brian J. and DeSimone, Joseph M. and Carbonell, Ruben G.}, year={2004}, month={Jan}, pages={515–524} }
 @misc{carbonell_desimone_novick_2003, title={Apparatus for meniscus coating with liquid carbon dioxide}, volume={6,517,633}, number={2003 Feb 11}, publisher={Washington, DC: U.S. Patent and Trademark Office}, author={Carbonell, R. G. and DeSimone, J. M. and Novick, B. J.}, year={2003}, month={Feb} }
 @article{shah_novick_hwang_lim_carbonell_johnston_korgel_2003, title={Kinetics of nonequilibrium nanocrystal monolayer formation: Deposition from liquid carbon dioxide}, volume={3}, ISSN={["1530-6984"]}, DOI={10.1021/nl034793+}, abstractNote={We observe the time-dependent structural reorganization of monolayers of gold nanocrystals deposited from liquid carbon dioxide. Compressed carbon dioxide does not exhibit dewetting instabilities, allowing deposition of spatially continuous monolayers at fast evaporation rates. Comparison of the translational and orientational correlation functions and a translational order parameter with a computer simulated equilibrium state indicates that the nanocrystal organization kinetics are slower than single particle diffusion limited assembly and are likely dominated by ensemble reorganization.}, number={12}, journal={NANO LETTERS}, author={Shah, PS and Novick, BJ and Hwang, HS and Lim, KT and Carbonell, RG and Johnston, KP and Korgel, BA}, year={2003}, month={Dec}, pages={1671–1675} }
 @misc{carbonell_desimone_novick_2003, title={Method for meniscuscoating a substrate with a polymeric precurso}, volume={6,652,920}, number={2003 Nov. 25}, publisher={Washington, DC: U.S. Patent and Trademark Office}, author={Carbonell, R. G. and DeSimone, J. M. and Novick, B. J.}, year={2003}, month={Nov} }
 @article{efimenko_novick_carbonell_desimone_genzer_2002, title={Formation of self-assembled monolayers of semifluorinated and hydrocarbon chlorosilane precursors on silica surfaces from liquid carbon dioxide}, volume={18}, ISSN={["0743-7463"]}, DOI={10.1021/la011813j}, abstractNote={We report on the formation and properties of self-assembled monolayers (SAMs) prepared by depositing semifluorinated and hydrocarbon trichlorosilane precursors, F(CF2)8(CH2)2SiCl3 (F8H2) and H(CH2)18SiCl3 (H18), respectively, from vapor, organic solvent, and liquid CO2 (l-CO2). Contact angle measurements of the SAM deposition kinetics reveal that regardless of the molecule type, the deposition rates from l-CO2 exceed those from vapor or organic solvents by several orders of magnitude. We derive two different transport models describing the formation of SAMs. We show that while the diffusion-limited model is not capable of describing the experimental data, the adsorption-limited model captures the major features of the adsorption kinetics quite well. We apply the results of the adsorption-limited model to conclude that the observed behavior is a consequence of (i) a relatively high bulk concentration (l-CO2 vs vapor) and (ii) higher solution diffusivity (l-CO2 vs organic solvent) of the silanes in l-CO2. N...}, number={16}, journal={LANGMUIR}, author={Efimenko, K and Novick, B and Carbonell, RG and DeSimone, JM and Genzer, J}, year={2002}, month={Aug}, pages={6170–6179} }
 @misc{carbonell_desimone_novick_2000, title={Method for meniscus coating with liquid carbon}, volume={6,497,921}, number={2002 Dec. 24}, publisher={Washington, DC: U.S. Patent and Trademark Office}, author={Carbonell, R. G. and DeSimone, J. M. and Novick, B. J.}, year={2000}, month={Jun} }
 @misc{carbonell_desimone_novick_2000, title={Method for meniscus coating with liquid carbon dioxide}, volume={6,083,565}, number={2000 July 4}, publisher={Washington, DC: U.S. Patent and Trademark Office}, author={Carbonell, R. G. and DeSimone, J. M. and Novick, B. J.}, year={2000}, month={Jul} }