@article{platow_wood_tracy_burnette_nemanich_sayers_2001, title={Formation of cobalt disilicide films on (root 3 x root 3)6H-SiC(0001)}, volume={63}, ISSN={["1550-235X"]}, DOI={10.1103/physrevb.63.115312}, abstractNote={This paper presents a detailed study of thin Co films grown directly, sequentially, and by codeposition with Si on the $(\sqrt{3}\ifmmode\times\else\texttimes\fi{}\sqrt{3})\ensuremath{-}R30\ifmmode^\circ\else\textdegree\fi{}$ surface of $6H\ensuremath{-}\mathrm{SiC}(0001).$ The structure, chemistry, and morphology of the films were determined using x-ray absorption fine structure, x-ray photoelectron spectroscopy, Auger electron spectroscopy, and atomic force microscopy. For directly deposited Co films (1--8 nm) graphite layers form on top of the film surface during annealing, whereas Co stays mainly unreacted over a temperature range of 300--1000 \ifmmode^\circ\else\textdegree\fi{}C. The formation of ${\mathrm{CoSi}}_{2}$ is achieved by sequential and codeposition of Co and Si. Films annealed at 550 \ifmmode^\circ\else\textdegree\fi{}C are polycrystalline and further annealing to 650 \ifmmode^\circ\else\textdegree\fi{}C causes no C segregation, but there is islanding of the films. Attempts to improve film morphology and homogeneity including applying a template method and varying growth temperature are also reported.}, number={11}, journal={PHYSICAL REVIEW B}, author={Platow, W and Wood, DK and Tracy, KM and Burnette, JE and Nemanich, RJ and Sayers, DE}, year={2001}, month={Mar} }