Application of Nomarski interference contrast microscopy as a thickness monitor in the preparation of transparent, SiG-based, cross-sectional TEM samples
ULTRAMICROSCOPY, 92(3-4), 265–271.
author keywords: Nomarski; transmission electron microscopy; silicon carbide; transparent samples
topics (OpenAlex): Integrated Circuits and Semiconductor Failure Analysis; Advanced Electron Microscopy Techniques and Applications; Electron and X-Ray Spectroscopy Techniques
TL;DR:
Reflected light optical microscopy using a Nomarski prism and a differential interference contrast filter have been employed in concert to achieve a technique that provides an accurate color reference for thickness during the dimpling and ion milling of transparent transmission electron microscopy samples of 6H-SiC(000 1) wafers.
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