@article{srinivasan_parsons_1998, title={Hydrogen abstraction kinetics and crystallization in low temperature plasma deposition of silicon}, volume={72}, DOI={10.1063/1.120785}, number={4}, journal={Applied and Environmental Microbiology}, author={Srinivasan, E. and Parsons, G. N.}, year={1998}, pages={456–458} }
 @article{smith_read_yang_srinivasan_courtney_lamb_parsons_1998, title={Plasma enhanced selective area microcrystalline silicon deposition on hydrogenated amorphous silicon: Surface modification for controlled nucleation}, volume={16}, DOI={10.1116/1.581144}, number={3 pt.1}, journal={Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films}, author={Smith, L. L. and Read, W. W. and Yang, C. S. and Srinivasan, E. and Courtney, C. H. and Lamb, H. H. and Parsons, G. N.}, year={1998}, pages={1316–1320} }
 @article{yang_read_arthur_srinivasan_parsons_1998, title={Self-aligned gate and source drain contacts in inverted-staggered a-Si:H thin-film transistors fabricated using selective area silicon PECVD}, volume={19}, DOI={10.1109/55.678536}, number={6}, journal={IEEE Electron Device Letters}, author={Yang, C. S. and Read, W. W. and Arthur, C. and Srinivasan, E. and Parsons, G. N.}, year={1998}, pages={180–182} }
 @article{srinivasan_lloyd_parsons_1997, title={Dominant monohydride bonding in hydrogenated amorphous silicon thin films formed by plasma enhanced chemical vapor deposition at room temperature}, volume={15}, DOI={10.1116/1.580480}, number={1}, journal={Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films}, author={Srinivasan, E. R. and Lloyd, D. A. and Parsons, G. N.}, year={1997}, pages={77–84} }
 @article{srinivasan_parsons_1997, title={Hydrogen elimination and phase transitions in pulsed-gas plasma deposition of amorphous and microcrystalline silicon}, volume={81}, DOI={10.1063/1.364309}, number={6}, journal={Journal of Applied Physics}, author={Srinivasan, E. and Parsons, G. N.}, year={1997}, pages={2847–2855} }
 @article{smith_srinivasan_parsons_1997, title={Investigation of substrate dependent nucleation of plasma-deposited microcrystalline silicon on glass and silicon substrates using atomic force microscopy}, volume={82}, DOI={10.1063/1.366471}, number={12}, journal={Journal of Applied Physics}, author={Smith, L. L. and Srinivasan, E. and Parsons, G. N.}, year={1997}, pages={6041–6046} }