@article{tucker_gorman_2010, title={Terminal Alkynes as an Ink or Background SAM in Replacement Lithography: Adventitious versus Directed Replacement}, volume={26}, ISSN={0743-7463 1520-5827}, url={http://dx.doi.org/10.1021/la101676h}, DOI={10.1021/la101676h}, abstractNote={Self-assembled monolayers (SAMs) comprised from n-alkanethiols and terminal alkynes were subjected to solutions containing ferrocene-terminated thiol, thioacetate, and terminal alkyne. The rate and extent of chemical exchange were monitored by scanning tunneling microscopy (STM). In several cases, a rate constant for exchange could be obtained by fitting to a model for exchange. In each case where this could be accomplished, a different rate model gave the best fit to the data, suggesting that the mechanism of exchange depended on either or both the original SAM and the incoming molecule. In scenarios where the rate of exchange was slow, directed exchange was accomplished via STM tip-induced lithographic patterning (replacement lithography). The extent of exchange was independent of the incoming molecule, suggesting that tip-induced desorption was the limiting factor in this process.}, number={18}, journal={Langmuir}, publisher={American Chemical Society (ACS)}, author={Tucker, Eric Z. and Gorman, Christopher B.}, year={2010}, month={Sep}, pages={15027–15034} } @article{tucker_gilligan_1998, title={Effects of vapor shield expansion on vapor shield effectiveness and plasma gun efficiency}, volume={33}, DOI={10.13182/FST98-A22}, abstractNote={The vapor shield outward expansion rate can be shown to affect energy transport through the vapor shield, thereby influencing the vapor shield effectiveness. To more accurately determine the divertor plate erosion depth from a tokamak fusion reactor disruption or plasma gun sources, it is then necessary to include source plasma (beam) momentum transfer and beam mass deposition to the expanding vapor shield. Other factors such as incident heat flux and target Z value are shown to influence the vapor shield expansion rate as well. Code calculations show that increasing heat fluxes can increase the fraction of vapor shield kinetic energy and lower the fraction f of incident energy transported to the solid. Low-Z materials give higher kinetic energies as well but result in a higher f due to a lower specific heat. These results can also be applied to plasma gun technology to help increase its efficiency. In an electrothermal gun, the plasma expansion rate (rate at which vaporized material travels out of the gun) can cause differing plasma residence times and differing plasma temperatures as well. Determining the mechanisms that influence the vapor shield expansion rate and showing its sensitivity on f can give us a qualitative way of determining how changing parameters can influence plasma gun efficiency. Low-energy (<200 eV) disruption plasmas add much mass as well as momentum to a vapor shield. Mass addition can cause the vapor shield temperature and f to differ for a given incident heat flux and change the vapor shield expansion rate as well. Also, we find that deuterium's shielding effectiveness differs from carbon.}, number={2}, journal={Fusion Technology}, author={Tucker, E. and Gilligan, J.}, year={1998}, pages={118–129} } @article{tucker_gilligan_1997, title={Model of turbulent mixing of species, momentum, and energy in a vapor shield plasma}, volume={32}, ISSN={["0748-1896"]}, DOI={10.13182/FST97-A19895}, abstractNote={Evidence suggests that turbulent mixing may affect the energy transport through the vapor shield (VS) formed during a tokamak disruption. The VS is first found to be very unstable according to the Rayleigh-Taylor stability criteria. Adding beam mass to the vaporized material and then mixing of the entire VS is found to cause a significant increase in energy transport through the VS for fusion reactor disruption-relevant energy beams. Mixing the VS for electrothermal gun-relevant energy beams can also affect the energy transport rate, depending on the source species used.}, number={2}, journal={FUSION TECHNOLOGY}, author={Tucker, EC and Gilligan, JG}, year={1997}, month={Sep}, pages={253–262} }