@article{zhang_huang_chen_atcitty_ingram_2006, title={Development and experimental demonstration of a self-powered ETO (SPETO)}, volume={42}, DOI={10.1109/TIA.2006.882657}, number={6}, journal={IEEE Transactions on Industry Applications}, author={Zhang, B. and Huang, A. Q. and Chen, B. and Atcitty, S. and Ingram, M.}, year={2006}, pages={1387–1394} }
 @article{chen_biswas_misra_2006, title={Electrical and physical analysis of MoTa alloy for gate electrode applications}, volume={153}, DOI={10.1149/1.2180710}, number={5}, journal={Journal of the Electrochemical Society}, author={Chen, B. and Biswas, N. and Misra, V.}, year={2006}, pages={G417–419} }
 @article{lichtenwalner_jur_jha_inoue_chen_misra_kingon_2006, title={High-temperature stability of lanthanum silicate gate dielectric MIS devices with Ta and TaN electrodes}, volume={153}, DOI={10.1149/1.2218757}, number={9}, journal={Journal of the Electrochemical Society}, author={Lichtenwalner, D. J. and Jur, J. S. and Jha, R. and Inoue, N. and Chen, B. and Misra, V. and Kingon, A. I.}, year={2006}, pages={F210–214} }
 @article{chen_jha_lazar_biswas_lee_lee_wielunski_garfunkel_misra_2006, title={Influence of oxygen diffusion through capping layers of low work function metal gate electrodes}, volume={27}, DOI={10.1109/LED.2006.871184}, number={4}, journal={IEEE Electron Device Letters}, author={Chen, B. and Jha, R. and Lazar, H. and Biswas, N. and Lee, J. and Lee, B. and Wielunski, L. and Garfunkel, E. and Misra, V.}, year={2006}, pages={228–230} }
 @article{chen_jha_misra_2006, title={Work function tuning via interface dipole by ultrathin reaction layers using AlTa and AlTaN alloys}, volume={27}, DOI={10.1109/LED.2006.880643}, number={9}, journal={IEEE Electron Device Letters}, author={Chen, B. and Jha, R. and Misra, V.}, year={2006}, pages={731–733} }
 @article{lin_ozturk_chen_rhee_lee_misra_2005, title={Impact of Ge on integration of HfO2 and metal gate electrodes on strained Si channels}, volume={87}, DOI={10.1063/1.2009809}, number={7}, journal={Applied Physics Letters}, author={Lin, Y. X. and Ozturk, M. C. and Chen, B. and Rhee, S. J. and Lee, J. C. and Misra, V.}, year={2005} }
 @article{chen_suh_lee_gurganus_misra_cabral_2005, title={Physical and electrical analysis of RuxYy alloys for gate electrode applications}, volume={86}, DOI={10.1063/1.1857093}, number={5}, journal={Applied Physics Letters}, author={Chen, B. and Suh, Y. and Lee, J. and Gurganus, J. and Misra, V. and Cabral, C.}, year={2005} }
 @article{lee_kim_hong_zhong_chen_misra_2005, title={Properties of Ta-Mo alloy gate electrode for n-MOSFET}, volume={40}, DOI={10.1007/s10853-005-2108-3}, number={10-Sep}, journal={Journal of Materials Science}, author={Lee, C. K. and Kim, J. Y. and Hong, S. N. and Zhong, H. C. and Chen, B. and Misra, V.}, year={2005}, pages={2693–2695} }