@article{losego_guske_efremenko_maria_franzen_2011, title={Characterizing the Molecular Order of Phosphonic Acid Self-Assembled Monolayers on Indium Tin Oxide Surfaces}, volume={27}, ISSN={["0743-7463"]}, DOI={10.1021/la201161q}, abstractNote={Self-assembled monolayers (SAMs) of alkanephosphonic acids with chain lengths between 8 and 18 carbon units were formed on thin films of indium tin oxide (ITO) sputter-deposited on silicon substrates with 400 nm thermally grown SiO(2). The silicon substrates, while not intended for use in near-IR or visible optics applications, do provide smooth surfaces that permit systematic engineering of grain size and surface roughness as a function of the sputter pressure. Argon sputter pressures from 4 to 20 mTorr show systematic changes in surface morphology ranging from smooth, micrometer-sized grain structures to <50 nm grains with 3× higher surface roughness. Near-edge X-ray absorption fine structure (NEXAFS) spectroscopy experiments are conducted for alkanephosphonic acids deposited on these wide range of ITO surfaces to evaluate the effects of these morphological features on monolayer ordering. Results indicate that long-chain SAMs are more highly ordered, and have a smaller tilt angle, than short-chain SAMs. Surprisingly, the 1-octadecyl phosphonic acids maintain their order as the lateral grain dimensions of the ITO surface shrink to ∼50 nm. It is only when the ITO surface roughness becomes greater than the SAM chain length (∼15 Å) that SAMs are observed to become relatively disordered.}, number={19}, journal={LANGMUIR}, author={Losego, Mark D. and Guske, Joshua T. and Efremenko, Alina and Maria, Jon-Paul and Franzen, Stefan}, year={2011}, month={Oct}, pages={11883–11888} }
 @article{losego_efremenko_rhodes_cerruti_franzen_maria_2009, title={Conductive oxide thin films: Model systems for understanding and controlling surface plasmon resonance}, volume={106}, number={2}, journal={Journal of Applied Physics}, author={Losego, M. D. and Efremenko, A. Y. and Rhodes, C. L. and Cerruti, M. G. and Franzen, S. and Maria, J. P.}, year={2009} }
 @article{rhodes_cerruti_efremenko_losego_aspnes_maria_franzen_2008, title={Dependence of plasmon polaritons on the thickness of indium tin oxide thin films}, volume={103}, number={9}, journal={Journal of Applied Physics}, author={Rhodes, C. and Cerruti, M. and Efremenko, A. and Losego, M. and Aspnes, D. E. and Maria, J. P. and Franzen, S.}, year={2008} }
 @article{cerruti_rhodes_losego_efremenko_maria_fischer_franzen_genzer_2007, title={Influence of indium-tin oxide surface structure on the ordering and coverage of carboxylic acid and thiol monolayers}, volume={40}, ISSN={["1361-6463"]}, DOI={10.1088/0022-3727/40/14/016}, abstractNote={This paper analyses the variability of self-assembled monolayers (SAMs) formation on ITO depending on the substrate surface features. In particular, we report on the formation of carboxylic acid- and thiol-based SAMs on two lots of commercially prepared indium–tin oxide (ITO) thin films. Contact angle measurements, electrochemical experiments, and near-edge x-ray absorption fine structure (NEXAFS) spectroscopy showed that the quality of monolayers formed differed substantially between the two ITO batches. Only one of the two ITO substrates was capable of forming well-organized thiol- and carboxylic acid-based SAMs. In order to rationalize these observations, atomic force microscopy and x-ray diffraction analyses were carried out, and SAMs were prepared on ITO substrates fabricated by sputtering in our laboratories. An attempt was made to influence the film microstructure and surface morphology by varying substrate temperatures during ITO deposition. Good-quality thiol and carboxylic acid SAMs were obtained on one of the ITO substrates prepared in-house. While our characterization could not single out conclusively one specific parameter in ITO surface structure that could be responsible for good SAMs formation, we could point out homogeneous surface morphology as a relevant factor for the quality of the SAMs. Evidence was also found for ITO crystallographic orientation to be a parameter influencing SAMs organization.}, number={14}, journal={JOURNAL OF PHYSICS D-APPLIED PHYSICS}, author={Cerruti, Marta and Rhodes, Crissy and Losego, Mark and Efremenko, Alina and Maria, Jon-Paul and Fischer, Daniel and Franzen, Stefan and Genzer, Jan}, year={2007}, month={Jul}, pages={4212–4221} }