@article{pomerantz_anderson_dugan_hoffman_barton_lee_oldham_peterson_parsons_2019, title={Air, Water Vapor, and Aerosol Transport through Textiles with Surface Functional Coatings of Metal Oxides and Metal-Organic Frameworks}, volume={11}, ISSN={["1944-8252"]}, url={https://doi.org/10.1021/acsami.9b04091}, DOI={10.1021/acsami.9b04091}, abstractNote={Currently, air permeable chemical/biological (CB) protective garments are based on activated carbon technology, which reduces moisture vapor transport needed for evaporative cooling and has potential to absorb and concentrate toxic materials. Researchers are exploring classes of sorbent materials that can selectively accumulate and decompose target compounds for potential to enhance protective suits and allow for novel filtration devices. Here, the metal-organic frameworks (MOFs) UiO-66-NH2 and HKUST-1 have been identified as such materials. To better understand how MOFs can perform in future CB protective systems, atomic layer deposition (ALD) and solution deposition were used to modify nonwoven polypropylene and flame-resistant fabrics with HKUST-1 and UiO-66-NH2. Air permeation, water vapor transport, filtration efficiency, and chemical reactivity against chemical agent simulants were assessed in relation to ALD thickness and MOF crystal size. MOF deposition on substrates decreased both air and chemical permeation while increasing filtration efficiency and chemical sorption. Moisture vapor transport was not affected by MOF growth on substrates, which is promising when considering thermal properties of protective garments. Future work should continue to explore how MOF deposition onto fiber and textile substrates impacts transport properties and chemical absorbance.}, number={27}, journal={ACS APPLIED MATERIALS & INTERFACES}, publisher={American Chemical Society (ACS)}, author={Pomerantz, Natalie L. and Anderson, Erin E. and Dugan, Nicholas P. and Hoffman, Nicole F. and Barton, Heather F. and Lee, Dennis T. and Oldham, Christopher J. and Peterson, Gregory W. and Parsons, Gregory N.}, year={2019}, month={Jul}, pages={24683–24690} }
 @article{hill_lee_williams_needham_dandley_oldham_parsons_2019, title={Insight on the Sequential Vapor Infiltration Mechanisms of Trimethylaluminum with Poly(methyl methacrylate), Poly(vinylpyrrolidone), and Poly(acrylic acid)}, volume={123}, ISSN={["1932-7447"]}, url={https://doi.org/10.1021/acs.jpcc.9b02153}, DOI={10.1021/acs.jpcc.9b02153}, abstractNote={The sequential vapor infiltration (SVI) method, based on atomic layer deposition chemistry, allows the creation of a polymer–inorganic hybrid material through the diffusion of metal–organic vapor reagents into a polymer substrate. This study investigates the reactivity of the ester, amide, and carboxylic acid functional groups of poly(methyl methacrylate) (PMMA), poly(vinylpyrrolidone) (PVP), and poly(acrylic acid) (PAA), respectively, in the presence of trimethylaluminum (TMA) vapor. This work explores the possible reaction mechanisms of these functional groups through in situ Fourier transform infrared spectroscopy and ab initio quantum chemical analysis. At temperatures of ≤100 °C, TMA physisorbs to the carbonyl groups of PMMA. As the temperature is increased, TMA forms a covalent bond with PMMA. TMA physisorbs to PVP and then partially desorbs in the presence of water for all studied temperatures of ≤150 °C. PAA readily reacts with TMA to form a covalent bond with the carbonyl group at 60 °C. This inc...}, number={26}, journal={JOURNAL OF PHYSICAL CHEMISTRY C}, publisher={American Chemical Society (ACS)}, author={Hill, Grant T. and Lee, Dennis T. and Williams, Philip S. and Needham, Craig D. and Dandley, Erinn C. and Oldham, Christopher J. and Parsons, Gregory N.}, year={2019}, month={Jul}, pages={16146–16152} }
 @article{fusco_oldham_parsons_2019, title={Investigation of the Corrosion Behavior of Atomic Layer Deposited Al2O3/TiO2 Nanolaminate Thin Films on Copper in 0.1 M NaCl}, volume={12}, ISSN={["1996-1944"]}, url={https://www.mdpi.com/1996-1944/12/4/672}, DOI={10.3390/ma12040672}, abstractNote={Fifty nanometers of Al2O3 and TiO2 nanolaminate thin films deposited by atomic layer deposition (ALD) were investigated for protection of copper in 0.1 M NaCl using electrochemical techniques. Coated samples showed increases in polarization resistance over uncoated copper, up to 12 MΩ-cm2, as measured by impedance spectroscopy. Over a 72-h immersion period, impedance of the titania-heavy films was found to be the most stable, as the alumina films experienced degradation after less than 24 h, regardless of the presence of dissolved oxygen. A film comprised of alternating Al2O3 and TiO2 layers of 5 nm each (referenced as ATx5), was determined to be the best corrosion barrier of the films tested based on impedance spectroscopy measurements over 72 h and equivalent circuit modeling. Dissolved oxygen had a minimal effect on ALD film stability, and increasing the deposition temperature from 150 °C to 250 °C, although useful for increasing film quality, was found to be counterproductive for long-term corrosion protection. Implications of ALD film aging and copper-based surface film formation during immersion and testing are also discussed briefly. The results presented here demonstrate the potential for ultra-thin corrosion barrier coatings, especially for high aspect ratios and component interiors, for which ALD is uniquely suited.}, number={4}, journal={MATERIALS}, author={Fusco, Michael A. and Oldham, Christopher J. and Parsons, Gregory N.}, year={2019}, month={Feb} }
 @article{mousa_ovental_brozena_oldham_parsons_2018, title={Modeling and experimental demonstration of high-throughput flow-through spatial atomic layer deposition of Al2O3 coatings on textiles at atmospheric pressure}, volume={36}, ISSN={["1520-8559"]}, DOI={10.1116/1.5022077}, abstractNote={Atomic layer deposition (ALD) shows promise for forming thin films on temperature-sensitive materials, such as polymers, for applications in filtration, sensing, etc. However, traditional batch ALD generally proceeds slowly and requires controlled, low-pressure equipment. One approach to combat this limitation is spatial ALD, which uses moving substrates through zones of reactant exposure. To date, studies of spatial ALD have primarily explored growth on planar and nonporous substrates. Here, the authors demonstrate a proof-of-concept atmospheric pressure flow-through spatial ALD reactor specifically designed for through-porous substrates, such as fiber webs. This paper describes detailed gas flow modeling and experimental analysis of their prototype reactor. Model results identify precursor gas flow rates, channel spacing, and the distance between the substrate and reactor surfaces as key factors to achieve uniform deposition. Using a previously developed surface wetting protocol, the authors experimentally verify operating conditions for uniform ALD alumina on polypropylene as a model fiber substrate. Under good ALD conditions, the spatial ALD reactor can complete ∼60 cycles/min over a large substrate area, which is 60 times faster than batch ALD. The authors quantify growth saturation conditions and find that under reduced gas flow rates or slow fiber translation speeds, a transition from ALD to chemical vapor deposition-like growth can be induced. Additionally, the authors demonstrate that fiber mat properties such as mat density and air permeability play important roles in the penetration depth of the precursors and, therefore, the conditions needed to achieve ALD. Overall, this work demonstrates a proof-of-concept reactor for high throughput ALD on porous substrates, and identifies important design challenges and considerations for future high-throughput ALD.}, number={3}, journal={JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A}, author={Mousa, Moataz Bellah M. and Ovental, Jennifer S. and Brozena, Alexandra H. and Oldham, Christopher J. and Parsons, Gregory N.}, year={2018}, month={May} }
 @article{daubert_hill_gotsch_gremaud_ovental_williams_oldham_parsons_2017, title={Corrosion Protection of Copper Using Al2O3, TiO2, ZnO, HfO2, and ZrO2 Atomic Layer Deposition}, volume={9}, ISSN={["1944-8244"]}, DOI={10.1021/acsami.6b13571}, abstractNote={Atomic layer deposition (ALD) is a viable means to add corrosion protection to copper metal. Ultrathin films of Al2O3, TiO2, ZnO, HfO2, and ZrO2 were deposited on copper metal using ALD, and their corrosion protection properties were measured using electrochemical impedance spectroscopy (EIS) and linear sweep voltammetry (LSV). Analysis of ∼50 nm thick films of each metal oxide demonstrated low electrochemical porosity and provided enhanced corrosion protection from aqueous NaCl solution. The surface pretreatment and roughness was found to affect the extent of the corrosion protection. Films of Al2O3 or HfO2 provided the highest level of initial corrosion protection, but films of HfO2 exhibited the best coating quality after extended exposure. This is the first reported instance of using ultrathin films of HfO2 or ZrO2 produced with ALD for corrosion protection, and both are promising materials for corrosion protection.}, number={4}, journal={ACS APPLIED MATERIALS & INTERFACES}, author={Daubert, James S. and Hill, Grant T. and Gotsch, Hannah N. and Gremaud, Antoine P. and Ovental, Jennifer S. and Williams, Philip S. and Oldham, Christopher J. and Parsons, Gregory N.}, year={2017}, month={Feb}, pages={4192–4201} }
 @inproceedings{ives_collins_marsden_bui_oldham_daubert_gremaud_parsons_2017, title={Corrosion mitigation coatings for RF sources and components}, DOI={10.1109/ivec.2017.8289559}, abstractNote={Research is continuing to develop nanometer-scale, ceramic coatings to reduce or eliminate corrosion in cooling channels of RF sources and components. The coatings separate the metal substrate from the coolant, preventing corrosion and erosion. This is addressing issues in remote or mobile environments where high quality coolant fluids are not available. Previous research demonstrated the effectiveness of alumina and hafnia nanoscale coatings. The current research is investigating additional materials and the optimum thickness and application processes. A prototype application system is being assembled to test with deliverable products. The presentation will describe the latest test results, describe the applications system, and provide the schedule for the program.}, booktitle={2017 eighteenth international vacuum electronics conference (ivec)}, author={Ives, R. L. and Collins, G. and Marsden, D. and Bui, T. and Oldham, C. J. and Daubert, J. S. and Gremaud, A. P. and Parsons, G. N.}, year={2017} }
 @article{lee_zhao_oldham_peterson_parsons_2017, title={UiO-66-NH2 Metal Organic Framework (MOF) Nucleation on TiO2, ZnO, and Al2O3 Atomic Layer Deposition-Treated Polymer Fibers: Role of Metal Oxide on MOF Growth and Catalytic Hydrolysis of Chemical Warfare Agent Simulants}, volume={9}, ISSN={["1944-8244"]}, url={https://doi.org/10.1021/acsami.7b15397}, DOI={10.1021/acsami.7b15397}, abstractNote={Metal-organic frameworks (MOFs) chemically bound to polymeric microfibrous textiles show promising performance for many future applications. In particular, Zr-based UiO-66-family MOF-textiles have been shown to catalytically degrade highly toxic chemical warfare agents (CWAs), where favorable MOF/polymer bonding and adhesion are attained by placing a nanoscale metal-oxide layer on the polymer fiber preceding MOF growth. To date, however, the nucleation mechanism of Zr-based MOFs on different metal oxides and how product performance is affected are not well understood. Herein, we provide new insight into how different inorganic nucleation films (i.e., Al2O3, ZnO, or TiO2) conformally coated on polypropylene (PP) nonwoven textiles via atomic layer deposition (ALD) influence the quality, overall surface area, and the fractional yield of UiO-66-NH2 MOF crystals solvothermally grown on fiber substrates. Of the materials explored, we find that TiO2 ALD layers lead to the most effective overall MOF/fiber adhesion, uniformity, and a rapid catalytic degradation rate for a CWA simulant, dimethyl p-nitrophenyl phosphate (DMNP) with t1/2 = 15 min, 580-fold faster than the catalytic performance of untreated PP textiles. Interestingly, compared to ALD TiO2 and Al2O3, ALD ZnO induces a larger MOF yield in solution and mass loading on PP fibrous mats. However, this larger MOF yield is ascribed to chemical instability of the ZnO layer under MOF formation condition, leading to Zn2+ ions that promote further homogeneous MOF growth. Insights presented here improve understanding of compatibility between active MOF materials and substrate surfaces, which we believe will help advanced MOF composite materials for a variety of useful functions.}, number={51}, journal={ACS APPLIED MATERIALS & INTERFACES}, publisher={American Chemical Society (ACS)}, author={Lee, Dennis T. and Zhao, Junjie and Oldham, Christopher J. and Peterson, Gregory W. and Parsons, Gregory N.}, year={2017}, month={Dec}, pages={44847–44855} }
 @misc{brozena_oldham_parsons_2016, title={Atomic layer deposition on polymer fibers and fabrics for multifunctional and electronic textiles}, volume={34}, ISSN={["1520-8559"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000375115800001&KeyUID=WOS:000375115800001}, DOI={10.1116/1.4938104}, abstractNote={Textile materials, including woven cotton, polymer knit fabrics, and synthetic nonwoven fiber mats, are being explored as low-cost, flexible, and light-weight platforms for wearable electronic sensing, communication, energy generation, and storage. The natural porosity and high surface area in textiles is also useful for new applications in environmental protection, chemical decontamination, pharmaceutical and chemical manufacturing, catalytic support, tissue regeneration, and others. These applications raise opportunities for new chemistries, chemical processes, biological coupling, and nanodevice systems that can readily combine with textile manufacturing to create new “multifunctional” fabrics. Atomic layer deposition (ALD) has a unique ability to form highly uniform and conformal thin films at low processing temperature on nonuniform high aspect ratio surfaces. Recent research shows how ALD can coat, modify, and otherwise improve polymer fibers and textiles by incorporating new materials for viable electronic and other multifunctional capabilities. This article provides a current overview of the understanding of ALD coating and modification of textiles, including current capabilities and outstanding problems, with the goal of providing a starting point for further research and advances in this field. After a brief introduction to textile materials and current textile treatment methods, the authors discuss unique properties of ALD-coated textiles, followed by a review of recent electronic and multifunctional textiles that use ALD coatings either as direct functional components or as critical nucleation layers for active materials integration. The article concludes with possible future directions for ALD on textiles, including the challenges in materials, manufacturing, and manufacturing integration that must be overcome for ALD to reach its full potential in electronic and other emerging multifunctional textile systems.}, number={1}, journal={JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A}, author={Brozena, Alexandra H. and Oldham, Christopher J. and Parsons, Gregory N.}, year={2016}, month={Jan} }
 @inproceedings{ives_collins_oldham_stevens_williams_mantini_parsons_2016, title={Corrosion mitigation coatings for RF sources and components}, DOI={10.1109/ivec.2016.7561851}, abstractNote={Most all high power RF sources and components require liquid cooling, usually high purity water. Copper and associated braze alloys are susceptible to corrosion if the water contains impurities or modest levels of oxygen. Unfortunately, high purity water is not readily available in many locations, including developing countries, remote sites, and naval vessels. The U.S. Navy is funding development of protective coatings to reduce or eliminate corrosion in copper coolant channels in RF sources and solenoids. This presentation will describe procedures for applying corrosion mitigation coatings in RF sources and associated components and equipment.}, booktitle={2016 ieee international vacuum electronics conference (ivec)}, author={Ives, R. L. and Collins, G. and Oldham, C. J. and Stevens, E. C. and Williams, P. S. and Mantini, M. J. and Parsons, G. N.}, year={2016} }
 @article{min_bagal_mundy_oldham_wu_parsons_chang_2016, title={Fabrication and design of metal nano-accordion structures using atomic layer deposition and interference lithography}, volume={8}, ISSN={["2040-3372"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000371479000021&KeyUID=WOS:000371479000021}, DOI={10.1039/c5nr08566g}, abstractNote={Fabricated free-standing platinum nano-accordion structures with a wide variety of cross-sectional profiles using a combination of ALD and IL.}, number={9}, journal={NANOSCALE}, author={Min, J. -H. and Bagal, A. and Mundy, J. Z. and Oldham, C. J. and Wu, B. -I. and Parsons, G. N. and Chang, C. -H.}, year={2016}, pages={4984–4990} }
 @article{lemaire_oldham_parsons_2016, title={Rapid visible color change and physical swelling during water exposure in triethanolamine-metalcone films formed by molecular layer deposition}, volume={34}, ISSN={["1520-8559"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000375115800035&KeyUID=WOS:000375115800035}, DOI={10.1116/1.4937222}, abstractNote={Molecular layer deposition (MLD) of “metalcones,” including alucone, zincone, titanicone, and others, involves self-limiting half-reactions between organic and organometallic (or metal-halide) reactants. Studies have typically focused on metal precursors reacting with ethylene glycol or glycerol to form the films' polymeric O-M-O-(CHx)y-O-M-O repeat units. The authors report new MLD materials that incorporate tertiary amine groups into the organic linkage. Specifically, reacting triethanolamine (TEA) with either trimethylaluminum or titanium tetrachloride produces TEA-alucone (Al-TEA) and TEA-titanicone (Ti-TEA), respectively, and the amine group leads to unique physical and optical properties. Fourier-transform infrared (FTIR) analysis confirms that the films have prominent C-H, C-N, and M-O-C peaks, consistent with the expected bond structure. When exposed to vapors, including water, alcohol, or ammonia, the Ti-TEA films changed their visible color within minutes and increased physical thickness by >35%. The Al-TEA showed significantly less response. X-ray photoelectron spectroscopy and FTIR suggest that HCl generated during MLD coordinates to the amine forming a quaternary ammonium salt that readily binds adsorbates via hydrogen bonding. The visible color change is reversible, and ellipsometry confirms that the color change results from vapor absorption. The unique absorptive and color-changing properties of the TEA-metalcone films point to new possible applications for MLD materials in filtration, chemical absorption, and multifunctional chemical separations/sensing device systems.}, number={1}, journal={JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A}, author={Lemaire, Paul C. and Oldham, Christopher J. and Parsons, Gregory N.}, year={2016}, month={Jan} }
 @article{zhao_lee_yaga_hall_barton_woodward_oldham_walls_peterson_parsons_2016, title={Ultra-Fast Degradation of Chemical Warfare Agents Using MOF-Nanofiber Kebabs}, volume={55}, ISSN={["1521-3773"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000385799200053&KeyUID=WOS:000385799200053}, DOI={10.1002/anie.201606656}, abstractNote={Abstract}, number={42}, journal={ANGEWANDTE CHEMIE-INTERNATIONAL EDITION}, author={Zhao, Junjie and Lee, Dennis T. and Yaga, Robert W. and Hall, Morgan G. and Barton, Heather F. and Woodward, Ian R. and Oldham, Christopher J. and Walls, Howard J. and Peterson, Gregory W. and Parsons, Gregory N.}, year={2016}, month={Oct}, pages={13224–13228} }
 @article{wang_zhao_bagal_dandley_oldham_fang_parsons_chang_2016, title={Wicking Enhancement in Three-Dimensional Hierarchical Nanostructures}, volume={32}, ISSN={["0743-7463"]}, url={http://www.scopus.com/inward/record.url?eid=2-s2.0-84982307197&partnerID=MN8TOARS}, DOI={10.1021/acs.langmuir.6b01864}, abstractNote={Wicking, the absorption of liquid into narrow spaces without the assistance of external forces, has drawn much attention due to its potential applications in many engineering fields. Increasing surface roughness using micro/nanostructures can improve capillary action to enhance wicking. However, reducing the structure length scale can also result in significant viscous forces to impede wicking. In this work, we demonstrate enhanced wicking dynamics by using nanostructures with three-dimensional (3D) hierarchical features to increase the surface area while mitigating the obstruction of liquid flow. The proposed structures were engineered using a combination of interference lithography and hydrothermal synthesis of ZnO nanowires, where structures at two length scales were independently designed to control wicking behavior. The fabricated hierarchical 3D structures were tested for water and ethanol wicking properties, demonstrating improved wicking dynamics with intermediate nanowire lengths. The experimental data agree with the derived fluid model based on the balance of capillary and vicious forces. The hierarchical wicking structures can be potentially used in applications in water harvesting surfaces, microfluidics, and integrated heat exchangers.}, number={32}, journal={LANGMUIR}, author={Wang, Zhiting and Zhao, Junjie and Bagal, Abhijeet and Dandley, Erinn C. and Oldham, Christopher J. and Fang, Tiegang and Parsons, Gregory N. and Chang, Chih-Hao}, year={2016}, month={Aug}, pages={8029–8033} }
 @article{sweet_oldham_parsons_2015, title={Conductivity and touch-sensor application for atomic layer deposition ZnO and Al:ZnO on nylon nonwoven fiber mats}, volume={33}, ISSN={["1520-8559"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000355735400017&KeyUID=WOS:000355735400017}, DOI={10.1116/1.4900718}, abstractNote={Flexible electronics and wearable technology represent a novel and growing market for next generation devices. In this work, the authors deposit conductive zinc oxide films by atomic layer deposition onto nylon-6 nonwoven fiber mats and spun-cast films, and quantify the impact that deposition temperature, coating thickness, and aluminum doping have on the conductivity of the coated substrates. The authors produce aluminum doped zinc oxide (AZO) coated fibers with conductivity of 230 S/cm, which is ∼6× more conductive than ZnO coated fibers. Furthermore, the authors demonstrate AZO coated fibers maintain 62% of their conductivity after being bent around a 3 mm radius cylinder. As an example application, the authors fabricate an “all-fiber” pressure sensor using AZO coated nylon-6 electrodes. The sensor signal scales exponentially under small applied force (<50 g/cm2), yielding a ∼106× current change under 200 g/cm2. This lightweight, flexible, and breathable touch/force sensor could function, for example, as an electronically active nonwoven for personal or engineered system analysis and diagnostics.}, number={1}, journal={JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A}, author={Sweet, William J., III and Oldham, Christopher J. and Parsons, Gregory N.}, year={2015}, month={Jan} }
 @article{zhao_gong_nunn_lemaire_stevens_sidi_williams_oldham_walls_shepherd_et al._2015, title={Conformal and highly adsorptive metal-organic framework thin films via layer-by-layer growth on ALD-coated fiber mats}, volume={3}, ISSN={["2050-7496"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000346906100014&KeyUID=WOS:000346906100014}, DOI={10.1039/c4ta05501b}, abstractNote={Fiber@ALD@MOF structures fabricated via ALD and layer-by-layer MOF synthesis show good conformality and high adsorption capacity.}, number={4}, journal={JOURNAL OF MATERIALS CHEMISTRY A}, author={Zhao, Junjie and Gong, Bo and Nunn, William T. and Lemaire, Paul C. and Stevens, Eric C. and Sidi, Fahim I. and Williams, Philip S. and Oldham, Christopher J. and Walls, Howard J. and Shepherd, Sarah D. and et al.}, year={2015}, pages={1458–1464} }
 @article{mcclure_oldham_parsons_2015, title={Effect of Al2O3 ALD coating and vapor infusion on the bulk mechanical response of elastic and viscoelastic polymers}, volume={261}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000348255500055&KeyUID=WOS:000348255500055}, DOI={10.1016/j.surfcoat.2014.10.029}, abstractNote={Polymer films and fibers are often coated with thin films by techniques including sputtering, chemical vapor deposition (CVD) and atomic layer deposition (ALD), to add resilience, impede water transport and provide chemical functionalization. Vapor processing also allows chemical precursors to diffuse and react in the near surface and bulk regions of the polymer. In this work we investigate how low temperature ALD Al2O3 coatings formed at < 100 °C modify bulk mechanical properties of nylon 6, polypropylene, and Pellethane, a commercial polymer elastomer. Transmission electron microscopy shows evidence for subsurface reactant penetration for all these polymers. The ALD treatment tends to increase the Young's modulus during the first ~ 200 ALD cycles, especially for the nylon 6 and elastomer, consistent with the expected polymer/precursor reactivity. However, the ALD coating generally embrittles the polymers, causing them to rupture under smaller applied strain. The embrittlement, however, is minimal for the viscoelastic polymer, so that the improved modulus during ALD treatment could improve its overall mechanical strength and performance. Chemical mechanisms for the mechanical changes are discussed. Overall, the results suggest that further analysis of ALD processes could lead to new means to improve mechanical function of synthetic polymers.}, journal={Surface & Coatings Technology}, author={McClure, Christina D. and Oldham, Christopher J. and Parsons, Gregory}, year={2015}, pages={411–417} }
 @article{zhao_nunn_lemaire_lin_dickey_oldham_walls_peterson_losego_parsons_et al._2015, title={Facile Conversion of Hydroxy Double Salts to Metal-Organic Frameworks Using Metal Oxide Particles and Atomic Layer Deposition Thin-Film Templates}, volume={137}, ISSN={["1520-5126"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000364355900009&KeyUID=WOS:000364355900009}, DOI={10.1021/jacs.5b08752}, abstractNote={Rapid room-temperature synthesis of metal-organic frameworks (MOFs) is highly desired for industrial implementation and commercialization. Here we find that a (Zn,Cu) hydroxy double salt (HDS) intermediate formed in situ from ZnO particles or thin films enables rapid growth (<1 min) of HKUST-1 (Cu3(BTC)2) at room temperature. The space-time-yield reaches >3 × 10(4) kg·m(-3)·d(-1), at least 1 order of magnitude greater than any prior report. The high anion exchange rate of (Zn,Cu) hydroxy nitrate HDS drives the ultrafast MOF formation. Similarly, we obtained Cu-BDC, ZIF-8, and IRMOF-3 structures from HDSs, demonstrating synthetic generality. Using ZnO thin films deposited via atomic layer deposition, MOF patterns are obtained on pre-patterned surfaces, and dense HKUST-1 coatings are grown onto various form factors, including polymer spheres, silicon wafers, and fibers. Breakthrough tests show that the MOF-functionalized fibers have high adsorption capacity for toxic gases. This rapid synthesis route is also promising for new MOF-based composite materials and applications.}, number={43}, journal={JOURNAL OF THE AMERICAN CHEMICAL SOCIETY}, publisher={American Chemical Society (ACS)}, author={Zhao, Junjie and Nunn, William T. and Lemaire, Paul C. and Lin, Yiliang and Dickey, Michael and Oldham, Christopher J. and Walls, Howard J. and Peterson, Gregory W. and Losego, Mark D. and Parsons, Gregory N. and et al.}, year={2015}, month={Nov}, pages={13756–13759} }
 @article{bagal_dandley_zhao_zhang_oldham_parsons_chang_2015, title={Multifunctional nano-accordion structures for stretchable transparent conductors}, volume={2}, ISSN={["2051-6355"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000359586600003&KeyUID=WOS:000359586600003}, DOI={10.1039/c5mh00070j}, abstractNote={Nano-accordion structures allow brittle materials to stretch, enabling transparent conductors that are stretchable and flexible.}, number={5}, journal={MATERIALS HORIZONS}, author={Bagal, Abhijeet and Dandley, Erinn C. and Zhao, Junjie and Zhang, Xu A. and Oldham, Christopher J. and Parsons, Gregory N. and Chang, Chih-Hao}, year={2015}, month={Sep}, pages={486–494} }
 @article{zhang_bagal_dandley_zhao_oldham_wu_parsons_chang_2015, title={Ordered 3D Thin-Shell Nanolattice Materials with Near-Unity Refractive Indices}, volume={25}, ISSN={["1616-3028"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000365532100009&KeyUID=WOS:000365532100009}, DOI={10.1002/adfm.201502854}, abstractNote={The refractive indices of naturally occurring materials are limited, and there exists an index gap between indices of air and available solid materials. With many photonics and electronics applications, there has been considerable effort in creating artificial materials with optical and dielectric properties similar to air while simultaneously being mechanically stable to bear load. Here, a class of ordered nanolattice materials consisting of periodic thin‐shell structures with near‐unity refractive index and high stiffness is demonstrated. Using a combination of 3D nanolithography and atomic layer deposition, these ordered nanostructured materials have reduced optical scattering and improved mechanical stability compared to existing randomly porous materials. Using ZnO and Al2O3 as the building materials, refractive indices from 1.3 down to 1.025 are achieved. The experimental data can be accurately described by Maxwell Garnett effective media theory, which can provide a guide for index design. The demonstrated low‐index, low‐scattering, and high‐stiffness materials can serve as high‐quality optical films in multilayer photonic structures, waveguides, resonators, and ultra‐low‐k dielectrics.}, number={42}, journal={ADVANCED FUNCTIONAL MATERIALS}, author={Zhang, Xu A. and Bagal, Abhijeet and Dandley, Erinn C. and Zhao, Junjie and Oldham, Christopher J. and Wu, Bae-Ian and Parsons, Gregory N. and Chang, Chih-Hao}, year={2015}, month={Nov}, pages={6644–6649} }
 @article{mousa_oldham_parsons_2015, title={Precise Nanoscale Surface Modification and Coating of Macroscale Objects: Open-Environment in Loco Atomic Layer Deposition on an Automobile}, volume={7}, ISSN={["1944-8252"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000361252400001&KeyUID=WOS:000361252400001}, DOI={10.1021/acsami.5b05262}, abstractNote={The fundamental chemical reaction conditions that define atomic layer deposition (ALD) can be achieved in an open environment on a macroscale surface too large and complex for typical laboratory reactor-based ALD. We describe the concept of in loco ALD using conventional modulated reactant flow through a surface-mounted "ALD delivery head" to form a precise nanoscale Al2O3 film on the window of a parked automobile. Analysis confirms that the processes eliminated ambient water contamination and met other conditions that define ALD growth. Using this tool, we demonstrate open-ambient patterned deposition, metal corrosion protection, and polymer surface modification.}, number={35}, journal={ACS APPLIED MATERIALS & INTERFACES}, author={Mousa, Moataz Bellah M. and Oldham, Christopher J. and Parsons, Gregory N.}, year={2015}, month={Sep}, pages={19523–19529} }
 @article{mousa_oldham_parsons_2014, title={Atmospheric Pressure Atomic Layer Deposition of Al2O3 Using Trimethyl Aluminum and Ozone}, volume={30}, ISSN={["0743-7463"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000334572100012&KeyUID=WOS:000334572100012}, DOI={10.1021/la500796r}, abstractNote={High throughput spatial atomic layer deposition (ALD) often uses higher reactor pressure than typical batch processes, but the specific effects of pressure on species transport and reaction rates are not fully understood. For aluminum oxide (Al2O3) ALD, water or ozone can be used as oxygen sources, but how reaction pressure influences deposition using ozone has not previously been reported. This work describes the effect of deposition pressure, between ∼2 and 760 Torr, on ALD Al2O3 using TMA and ozone. Similar to reports for pressure dependence during TMA/water ALD, surface reaction saturation studies show self-limiting growth at low and high pressure across a reasonable temperature range. Higher pressure tends to increase the growth per cycle, especially at lower gas velocities and temperatures. However, growth saturation at high pressure requires longer O3 dose times per cycle. Results are consistent with a model of ozone decomposition kinetics versus pressure and temperature. Quartz crystal microbalance (QCM) results confirm the trends in growth rate and indicate that the surface reaction mechanisms for Al2O3 growth using ozone are similar under low and high total pressure, including expected trends in the reaction mechanism at different temperatures.}, number={13}, journal={LANGMUIR}, author={Mousa, Moataz Bellah M. and Oldham, Christopher J. and Parsons, Gregory N.}, year={2014}, month={Apr}, pages={3741–3748} }
 @article{sweet_oldham_parsons_2014, title={Atomic Layer Deposition of Metal Oxide Patterns on Nonwoven Fiber Mats using Localized Physical Compression}, volume={6}, ISSN={["1944-8252"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000338184500045&KeyUID=WOS:000338184500045}, DOI={10.1021/am501582p}, abstractNote={Patterning is an essential part of many industrial processes from printing to semiconductor manufacturing. In this work, we demonstrate a new method to pattern and selectively coat nonwoven textiles by atomic layer deposition (ALD) using compressive mask patterning. A physical mask combined with mechanical compression allows lateral definition and fidelity of the ALD coating to be controlled. We produce features of several sizes on different nonwoven fiber materials and demonstrate the ability to limit diffusion effects to within <200 μm of the pattern edge. Lateral and vertical penetration of reactive growth species into nonwoven mats is investigated by plan-view and cross-sectional imaging. Vertical growth is also analyzed by imaging coating depth into fiber mat stacks. We develop a fully quantitative transport model that describes well the effect of fiber structure and mechanical compression on the extent of coating under the physical mask. This method could be implemented for high-volume patterning for applications including flexible electronics.}, number={12}, journal={ACS APPLIED MATERIALS & INTERFACES}, author={Sweet, William J., III and Oldham, Christopher J. and Parsons, Gregory N.}, year={2014}, month={Jun}, pages={9280–9289} }
 @article{zhao_losego_lemaire_williams_gong_atanasov_blevins_oldham_walls_shepherd_et al._2014, title={Highly adsorptive, MOF-functionalized nonwoven fiber mats for hazardous gas capture enabled by atomic layer deposition}, volume={1}, number={4}, journal={Advanced Materials Interfaces}, author={Zhao, J. J. and Losego, M. D. and Lemaire, P. C. and Williams, P. S. and Gong, B. and Atanasov, S. E. and Blevins, T. M. and Oldham, C. J. and Walls, H. J. and Shepherd, S. D. and et al.}, year={2014} }
 @article{atanasov_oldham_slusarski_taggart-scarff_sherman_senecal_filocamo_mcallister_wetzel_parsons_2014, title={Improved cut-resistance of Kevlar (R) using controlled interface reactions during atomic layer deposition of ultrathin (< 50 angstrom) inorganic coatings}, volume={2}, ISSN={["2050-7496"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000342763300022&KeyUID=WOS:000342763300022}, DOI={10.1039/c4ta03662j}, abstractNote={Conformal atomic layer deposition (ALD) of Al2O3 and TiO2 thin films on Kevlar®, poly(p-phenylene terephthalamide) (PPTA) fibers at 50 and 100 °C affects the fiber cut resistance. Systematic studies of ALD coatings between 10 to 400 A thick formed at 50 and 100 °C revealed excellent conformality, and trends in cutting performance depended on materials and process details. A 50 A/50 A TiO2/Al2O3 bilayer formed at 50 °C increased cut resistance of PPTA by 30% compared to untreated fiber materials. In situ infrared analysis shows that trimethylaluminum (TMA) Al2O3 precursor reacts sub-surface with PPTA and tends to degraded mechanical performance. The TiCl4 TiO2 precursor reacts to form a barrier that limits TMA/PPTA interactions, allowing a harder Al2O3 layer to form on top of TiO2. The thin ALD coatings do not substantially affect durability, flexibility, or weight of the PPTA, making ALD a potentially viable means to enhance the protective properties of Kevlar and other polymer fiber systems.}, number={41}, journal={JOURNAL OF MATERIALS CHEMISTRY A}, author={Atanasov, Sarah E. and Oldham, Christopher J. and Slusarski, Kyle A. and Taggart-Scarff, Joshua and Sherman, Shalli A. and Senecal, Kris J. and Filocamo, Shaun F. and McAllister, Quinn P. and Wetzel, Eric D. and Parsons, Gregory N.}, year={2014}, month={Nov}, pages={17371–17379} }
 @article{dandley_needham_williams_brozena_oldham_parsons_2014, title={Temperature-dependent reaction between trimethylaluminum and poly(methyl methacrylate) during sequential vapor infiltration: experimental and ab initio analysis}, volume={2}, ISSN={["2050-7534"]}, DOI={10.1039/c4tc01293c}, abstractNote={We propose a temperature dependent reaction scheme between trimethylaluminum and poly(methyl methacrylate) for enhanced control of vapor phase polymer modification.}, number={44}, journal={JOURNAL OF MATERIALS CHEMISTRY C}, author={Dandley, Erinn C. and Needham, Craig D. and Williams, Philip S. and Brozena, Alexandra H. and Oldham, Christopher J. and Parsons, Gregory N.}, year={2014}, month={Nov}, pages={9416–9424} }
 @article{kalanyan_oldham_sweet_parsons_2013, title={Highly Conductive and Flexible Nylon-6 Nonwoven Fiber Mats Formed using Tungsten Atomic Layer Deposition}, volume={5}, ISSN={1944-8244 1944-8252}, url={http://dx.doi.org/10.1021/AM401095R}, DOI={10.1021/am401095r}, abstractNote={Low-temperature vapor-phase tungsten atomic layer deposition (ALD) using WF6 and dilute silane (SiH4, 2% in Ar) can yield highly conductive coatings on nylon-6 microfiber mats, producing flexible and supple nonwovens with conductivity of ∼1000 S/cm. We find that an alumina nucleation layer, reactant exposure, and deposition temperature all influence the rate of W mass uptake on 3D fibers, and film growth rate is calibrated using high surface area anodic aluminum oxide. Transmission electron microscopy (TEM) reveals highly conformal tungsten coatings on nylon fibers with complex "winged" cross-section. Using reactant gas "hold" sequences during the ALD process, we conclude that reactant species can transport readily to reactive sites throughout the fiber mat, consistent with conformal uniform coverage observed by TEM. The conductivity of 1000 S/cm for the W-coated nylon is much larger than found in other conductive nonwovens. We also find that the nylon mats maintain 90% of their conductivity after being flexed around cylinders with radii as small as 0.3 cm. Metal ALD coatings on nonwovens make possible the solvent-free functionalization of textiles for electronic applications.}, number={11}, journal={ACS Applied Materials & Interfaces}, publisher={American Chemical Society (ACS)}, author={Kalanyan, Berç and Oldham, Christopher J. and Sweet, William J., III and Parsons, Gregory N.}, year={2013}, month={May}, pages={5253–5259} }
 @article{mcclure_oldham_walls_parsons_2013, title={Large effect of titanium precursor on surface reactivity and mechanical strength of electrospun nanofibers coated with TiO2 by atomic layer deposition}, volume={31}, ISSN={["0734-2101"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000327253900031&KeyUID=WOS:000327253900031}, DOI={10.1116/1.4817718}, abstractNote={Encapsulating and functionalizing polymer nanofibers can improve the polymers chemical resistance and surface reactivity, enabling new applications including biosensing, flexible electronics, gas filtration, and chemical separations. Polymer fiber functionalization typically involves energy intensive wet chemical treatments and/or plasma exposure. Recent results show low temperature atomic layer deposition (ALD) to be a viable means to coat nanofibers with uniform and conformal inorganic and hybrid organic–inorganic layers. For this article, the authors describe how the mechanical properties of nylon-6 nanofibers are affected by ALD coatings of TiO2 and other metal oxides. They find that the stress–strain behavior of nylon-6 nanofibers depends strongly on the specific precursor chemistry used in the coating process. For ALD TiO2 coatings, titanium tetrachloride tended to embrittle the fibers, whereas titanium isopropoxide had a more subtle effect. Physical characterization shows that the TiCl4 diffused into the nylon-6 and reacted subsurface, whereas the titanium isopropoxide tended to react on the surface producing a more abrupt organic/inorganic interface. Results show that precursor choice is an important factor when designing thin film coating processes on polymeric substrates.}, number={6}, journal={JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A}, author={McClure, Christina D. and Oldham, Christopher J. and Walls, Howard J. and Parsons, Gregory N.}, year={2013} }
 @article{kalanyan_losego_oldham_parsons_2013, title={Low-Temperature Atomic Layer Deposition of Tungsten using Tungsten Hexafluoride and Highly-diluted Silane in Argon}, volume={19}, ISSN={["0948-1907"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000320470300013&KeyUID=WOS:000320470300013}, DOI={10.1002/cvde.201307053}, abstractNote={Abstract}, number={4-6}, journal={CHEMICAL VAPOR DEPOSITION}, author={Kalanyan, Berc and Losego, Mark D. and Oldham, Christopher J. and Parsons, Gregory N.}, year={2013}, month={Jun}, pages={161–166} }
 @misc{parsons_atanasov_dandley_devine_gong_jur_lee_oldham_peng_spagnola_et al._2013, title={Mechanisms and reactions during atomic layer deposition on polymers}, volume={257}, ISSN={["1873-3840"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000327915000012&KeyUID=WOS:000327915000012}, DOI={10.1016/j.ccr.2013.07.001}, abstractNote={There is significant growing interest in atomic layer deposition onto polymers for barrier coatings, nanoscale templates, surface modification layers and other applications. The ability to control the reaction between ALD precursors and polymers opens new opportunities in ALD materials processing. It is well recognized that ALD on many polymers involves subsurface precursor diffusion and reaction which are not encountered during ALD on solid surfaces. This article reviews recent insights into chemical reactions that proceed during ALD on polymers, with particular focus on the common Al2O3 reaction sequence using trimethyl aluminum (TMA) and water. We highlight the role of different polymer reactive groups in film growth, and how the balance between precursor diffusion and reaction can change as deposition proceeds. As a strong Lewis acid, TMA forms adducts with Lewis base sites within the polymer, and the reactions that proceed are determined by the neighboring bond structure. Moreover, the Lewis base sites can be saturated by TMA, producing a self-limiting half-reaction within a three-dimensional polymer, analogous to a self-limiting half-reaction commonly observed during ALD on a solid planar surface.}, number={23-24}, journal={COORDINATION CHEMISTRY REVIEWS}, author={Parsons, Gregory N. and Atanasov, Sarah E. and Dandley, Erinn C. and Devine, Christina K. and Gong, Bo and Jur, Jesse S. and Lee, Kyoungmi and Oldham, Christopher J. and Peng, Qing and Spagnola, Joseph C. and et al.}, year={2013}, month={Dec}, pages={3323–3331} }
 @article{loebl_oldham_devine_gong_atanasov_parsons_fedkiw_2013, title={Solid Electrolyte Interphase on Lithium-Ion Carbon Nanofiber Electrodes by Atomic and Molecular Layer Deposition}, volume={160}, ISSN={["1945-7111"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000326905000006&KeyUID=WOS:000326905000006}, DOI={10.1149/2.020311jes}, abstractNote={Carbon nanofibers were coated with Al2O3 by atomic layer deposition (ALD) or with an alumina-organic hybrid thin film layer by molecular layer deposition (MLD) to produce an artificial solid electrolyte interphase (SEI) prior to use as a lithium-ion battery electrode. The elemental composition of the materials was investigated using energy dispersive X-ray spectroscopy (EDX) and inductively coupled plasma mass spectrometry (ICP-MS). A coating of ten Al2O3 layers reduced the lithium lost to the SEI formation from 359 to 291 mAh/g (24%) during the first charge. These same cells possessed 370 mAh/g of stable reversible capacity when tested at low current density (25 mA/g), similar to uncoated material. At increased currents, Al2O3 films of either ten or twenty layers lowered the capacity retention when compared with uncoated materials. When compared to the ALD material, films deposited by MLD resulted in less improvement to reversible capacity and a greater loss of reversible capacity. These results indicate the use of ALD to create a new electrode surface and mitigate the Li losses to SEI formation may be a viable method of addressing the challenges associated with high-surface area electrode materials.}, number={11}, journal={JOURNAL OF THE ELECTROCHEMICAL SOCIETY}, author={Loebl, Andrew J. and Oldham, Christopher J. and Devine, Christina K. and Gong, Bo and Atanasov, Sarah E. and Parsons, Gregory N. and Fedkiw, Peter S.}, year={2013}, pages={A1971–A1978} }
 @article{mousa_oldham_jur_parsons_2012, title={Effect of temperature and gas velocity on growth per cycle during Al2O3 and ZnO atomic layer deposition at atmospheric pressure}, volume={30}, ISSN={["1520-8559"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000298992800055&KeyUID=WOS:000298992800055}, DOI={10.1116/1.3670961}, abstractNote={The growth per cycle as a function of temperature during atomic layer deposition (ALD) of Al2O3 and ZnO at atmospheric pressure follows very closely the trend measured at typical (∼2 Torr) process pressure. However, the overall growth rate is found to be nearly 2 × larger at higher pressure and the magnitude of the growth increase can be adjusted by controlling the gas velocity near the growth surface. The growth increase at high pressure is approximately independent of process temperature at T   150 °C, especially for Al2O3. The relatively high growth/cycle measured at 760 Torr and T < 150 °C suggests that excess physisorbed water remains on the alumina or zinc oxide surface after the water purge step. Increasing the gas velocity in the growth zone reduces the growth rate, consistent with more efficient removal of excess water. To better understand the observed trends, we present analytical expressions for the boundary layer...}, number={1}, journal={JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A}, author={Mousa, Moataz Bellah M. and Oldham, Christopher J. and Jur, Jesse S. and Parsons, Gregory N.}, year={2012}, month={Jan} }
 @article{hanson_oldham_parsons_2012, title={Paper deacidification and UV protection using ZnO atomic layer deposition}, volume={30}, ISSN={["1520-8559"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000298992800017&KeyUID=WOS:000298992800017}, DOI={10.1116/1.3656251}, abstractNote={Acid degradation of cellulosic paper in archival books, periodicals, and historic documents is a serious and widespread problem. Using acidic page samples from ∼40 year old books, we demonstrate that atomic layer deposition (ALD) ZnO can adjust and controllably neutralize the paper acid content. The paper samples were collected and analyzed in accordance with recognized Technical Association of the Pulp and Paper Industry (TAPPI) test standards. The average pH of the starting paper was 3.7 ± 0.4 and 4.4 ± 0.1 as determined using the TAPPI surface probe and cold water extraction methods, respectively. After 50 ALD ZnO cycles, the same tests on the coated paper produced an average pH of 7.39 ± 0.08 and 7.3 ± 0.4, respectively. Scanning electron microscopy confirmed that the cellulose structure remained intact during ALD. Additional tests of recently printed newspaper samples coated with ALD ZnO also show that ALD can effectively prevent paper discoloration and embrittlement caused by UV sunlight photoexposure. While there are many known methods for paper preservation, including others using diethyl zinc, the control afforded by ALD provides attractive advantages over other known approaches for preservation of archival paper and other natural fibrous materials.}, number={1}, journal={JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A}, author={Hanson, C. A. and Oldham, C. J. and Parsons, G. N.}, year={2012}, month={Jan} }
 @article{jur_sweet_oldham_parsons_2011, title={Atomic Layer Deposition of Conductive Coatings on Cotton, Paper, and Synthetic Fibers: Conductivity Analysis and Functional Chemical Sensing Using “All-Fiber” Capacitors}, volume={21}, ISSN={1616-301X}, url={http://dx.doi.org/10.1002/adfm.201001756}, DOI={10.1002/adfm.201001756}, abstractNote={Abstract}, number={11}, journal={Advanced Functional Materials}, publisher={Wiley}, author={Jur, Jesse. S. and Sweet, William J., III and Oldham, Christopher J. and Parsons, Gregory N.}, year={2011}, month={Mar}, pages={1993–2002} }
 @article{oldham_gong_spagnola_jur_senecal_godfrey_parsons_2011, title={Encapsulation and Chemical Resistance of Electrospun Nylon Nanofibers Coated Using Integrated Atomic and Molecular Layer Deposition}, volume={158}, ISSN={["1945-7111"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000293175600039&KeyUID=WOS:000293175600039}, DOI={10.1149/1.3609046}, abstractNote={Nanofibers formed by electrospinning provide very large surface areas which can enhance material performance in filtration and product separation. In this work, we explore atomic layer deposition (ALD) as a means to coat and protect electrospun nylon-6 nanofibers. Exposing nylon to trimethyl aluminum (TMA) during ALD of aluminum oxide results in significant fiber degradation. Protecting fibers with a bilayer of ALD ZnO and an organic-inorganic hybrid polymer by molecular layer deposition maintains the shape of the original nanofibers, but chemical modification is still detected. These coating processes may help enable nanofibers with stable physical properties under chemical exposure.}, number={9}, journal={JOURNAL OF THE ELECTROCHEMICAL SOCIETY}, author={Oldham, Christopher J. and Gong, Bo and Spagnola, Joseph C. and Jur, Jesse S. and Senecal, Kris J. and Godfrey, Thomas A. and Parsons, Gregory N.}, year={2011}, pages={D549–D556} }