David Garrett Vellenga

Works (1)

Updated: July 5th, 2023 15:56

2006 journal article

Alicyclic photoresists for CO2-based next-generation microlithography: A tribute to James E. McGrath

POLYMER, 47(11), 4012–4017.

By: M. Boggiano*, D. Vellenga n, R. Carbonell n, V. Ashby* & J. DeSimone n

author keywords: condensed CO2; addition polymerization; photoresist synthesis
UN Sustainable Development Goals Color Wheel
UN Sustainable Development Goal Categories
Source: Web Of Science
Added: August 6, 2018

Citation Index includes data from a number of different sources. If you have questions about the sources of data in the Citation Index or need a set of data which is free to re-distribute, please contact us.

Certain data included herein are derived from the Web of Science© and InCites© (2025) of Clarivate Analytics. All rights reserved. You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.