2006 journal article

Alicyclic photoresists for CO2-based next-generation microlithography: A tribute to James E. McGrath

POLYMER, 47(11), 4012–4017.

By: M. Boggiano*, D. Vellenga n, R. Carbonell n, V. Ashby* & J. DeSimone n

author keywords: condensed CO2; addition polymerization; photoresist synthesis
UN Sustainable Development Goal Categories
Source: Web Of Science
Added: August 6, 2018

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