Works (1)

2006 | journal article

Alicyclic photoresists for CO2-based next-generation microlithography: A tribute to James E. McGrath

Polymer, 47(11), 4012–4017.

By: M. Boggiano, D. Vellenga, R. Carbonell, V. Ashby & J. Desimone

Source: NC State University Libraries
Added: August 6, 2018