Eric Joseph Adles

Gokce, B., Gundogdu, K., Adles, E. J., & Aspnes, D. E. (2011, May). Back-reflection Second-harmonic Generation of (111)Si: Theory and Experiment. JOURNAL OF THE KOREAN PHYSICAL SOCIETY, Vol. 58, pp. 1237–1243. https://doi.org/10.3938/jkps.58.1237

Adles, E. J. (2011, February 28). Developing an epitaxial growth process for ZnO by MOCVD using real-time spectroscopic ellipsometry. THIN SOLID FILMS, Vol. 519, pp. 2674–2677. https://doi.org/10.1016/j.tsf.2010.12.071

Gokce, B., Adles, E. J., Aspnes, D. E., & Gundogdu, K. (2011). Measurement and Control of In-Plane Surface Chemistry During Oxidation of H-Terminated (111)Si. PHYSICS OF SEMICONDUCTORS: 30TH INTERNATIONAL CONFERENCE ON THE PHYSICS OF SEMICONDUCTORS, Vol. 1399. https://doi.org/10.1063/1.3666321

Adles, E. J., & Aspnes, D. E. (2010). Chemical-etch-assisted growth of epitaxial zinc oxide. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, Vol. 28, pp. 689–692. https://doi.org/10.1116/1.3305814

Adles, E. J., & Aspnes, D. E. (2008). Application of the anisotropic bond model to second-harmonic generation from amorphous media. PHYSICAL REVIEW B, 77(16). https://doi.org/10.1103/physrevb.77.165102

Adles, E. J., & Aspnes, D. E. (2008). The anisotropic bond model of nonlinear optics. Physica Status Solidi (a), 205(4), 728–731. https://doi.org/10.1002/pssa.200777846

Simunovic, J., Swartzel, K. R., & Adles, E. (2007). Method and system for conservative evaluation, validation and monitoring of thermal processing. Washington, DC: U.S. Patent and Trademark Office.

Simunovic, J., Swartzel, K. R., & Adles, E. (2006). Method and system for conservative evaluation, validation and monitoring of thermal processing. Washington, DC: U.S. Patent and Trademark Office.

Peng, H. J., Adles, E. J., Wang, J. F. T., & Aspnes, D. E. (2005). Relative bulk and interface contributions to optical second-harmonic generation in silicon. PHYSICAL REVIEW B, 72(20). https://doi.org/10.1103/physrevb.72.205203

Simunovic, J., Swartzel, K. R., & Adles, E. (2004). Method and system for conservative evaluation, validation and monitoring of thermal processing. Washington, DC: U.S. Patent and Trademark Office.