Holger Saare

Saare, H., Xie, W., & Parsons, G. N. (2023). Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 41(4). https://doi.org/10.1116/6.0002708

Saare, H., Dianat, G., & Parsons, G. N. (2022). Comparative In Situ Study of the Initial Growth Trends of Atomic Layer-Deposited Al(2)O(3 )Films br. JOURNAL OF PHYSICAL CHEMISTRY C, 126(16), 7036–7046. https://doi.org/10.1021/acs.jpcc.2c01033

Saare, H., Song, S. K., Kim, J.-S., & Parsons, G. N. (2020). Effect of reactant dosing on selectivity during area-selective deposition of TiO2 via integrated atomic layer deposition and atomic layer etching. JOURNAL OF APPLIED PHYSICS, 128(10). https://doi.org/10.1063/5.0013552

Song, S. K., Saare, H., & Parsons, G. N. (2019). Integrated Isothermal Atomic Layer Deposition/Atomic Layer Etching Supercycles for Area-Selective Deposition of TiO2. CHEMISTRY OF MATERIALS, 31(13), 4793–4804. https://doi.org/10.1021/acs.chemmater.9b01143