Holger Saare

Saare, H., Xie, W., & Parsons, G. N. (2023, June 20). Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Vol. 41. https://doi.org/10.1116/6.0002708

Saare, H., Dianat, G., & Parsons, G. N. (2022, April 18). Comparative <i>In Situ</i> Study of the Initial Growth Trends of Atomic Layer-Deposited Al<sub>2</sub>O<sub>3</sub> Films. The Journal of Physical Chemistry C, Vol. 4, pp. 7036–7046. https://doi.org/10.1021/acs.jpcc.2c01033

Saare, H., Song, S. K., Kim, J.-S., & Parsons, G. N. (2020, September 8). Effect of reactant dosing on selectivity during area-selective deposition of TiO2 via integrated atomic layer deposition and atomic layer etching. Journal of Applied Physics, Vol. 128. https://doi.org/10.1063/5.0013552

Song, S. K., Saare, H., & Parsons, G. N. (2019, June 12). Integrated Isothermal Atomic Layer Deposition/Atomic Layer Etching Supercycles for Area-Selective Deposition of TiO<sub>2</sub>. Chemistry of Materials, Vol. 31, pp. 4793–4804. https://doi.org/10.1021/acs.chemmater.9b01143