Jung-Sik Kim

Oh, H., Kim, J.-S., Margavio, H. R. M., & Parsons, G. N. (2023). Self-Aligned Nanopatterning and Controlled Lateral Growth by Dual-Material Orthogonal Area-Selective Deposition of Poly(3,4-ethylenedioxythiophene) and Tungsten. CHEMISTRY OF MATERIALS, 35(11), 4375–4384. https://doi.org/10.1021/acs.chemmater.3c00530

Kim, J.-S., Oh, H., & Parsons, G. N. (2022). Growth behavior and substrate selective deposition of polypyrrole, polythiophene, and polyaniline by oxidative chemical vapor deposition and molecular layer deposition. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 40(6). https://doi.org/10.1116/6.0002036

Gu, H., Lee, D. T., Corkery, P., Miao, Y., Kim, J.-S., Yuan, Y., … Tsapatsis, M. (2022, September 7). Modeling of deposit formation in mesoporous substrates via atomic layer deposition: Insights from pore-scale simulation. AICHE JOURNAL, Vol. 9. https://doi.org/10.1002/aic.17889

Song, S. K., Kim, J.-S., Margavio, H. R. M., & Parsons, G. N. (2021). Multimaterial Self-Aligned Nanopatterning by Simultaneous Adjacent Thin Film Deposition and Etching. ACS NANO, 15(7), 12276–12285. https://doi.org/10.1021/acsnano.1c04086

Kim, J.-S., & Parsons, G. N. (2021). Nanopatterned Area-Selective Vapor Deposition of PEDOT on SiO2 vs Si-H: Improved Selectivity Using Chemical Vapor Deposition vs Molecular Layer Deposition. CHEMISTRY OF MATERIALS, 33(23), 9221–9230. https://doi.org/10.1021/acs.chemmater.1c02842

Volk, A. A., Kim, J.-S., Jamir, J., Dickey, E. C., & Parsons, G. N. (2021). Oxidative molecular layer deposition of PEDOT using volatile antimony(V) chloride oxidant. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 39(3). https://doi.org/10.1116/6.0000791

Saare, H., Song, S. K., Kim, J.-S., & Parsons, G. N. (2020). Effect of reactant dosing on selectivity during area-selective deposition of TiO2 via integrated atomic layer deposition and atomic layer etching. JOURNAL OF APPLIED PHYSICS, 128(10). https://doi.org/10.1063/5.0013552