@article{hill_lee_williams_needham_dandley_oldham_parsons_2019, title={Insight on the Sequential Vapor Infiltration Mechanisms of Trimethylaluminum with Poly(methyl methacrylate), Poly(vinylpyrrolidone), and Poly(acrylic acid)}, volume={123}, ISSN={["1932-7447"]}, url={https://doi.org/10.1021/acs.jpcc.9b02153}, DOI={10.1021/acs.jpcc.9b02153}, abstractNote={The sequential vapor infiltration (SVI) method, based on atomic layer deposition chemistry, allows the creation of a polymer–inorganic hybrid material through the diffusion of metal–organic vapor reagents into a polymer substrate. This study investigates the reactivity of the ester, amide, and carboxylic acid functional groups of poly(methyl methacrylate) (PMMA), poly(vinylpyrrolidone) (PVP), and poly(acrylic acid) (PAA), respectively, in the presence of trimethylaluminum (TMA) vapor. This work explores the possible reaction mechanisms of these functional groups through in situ Fourier transform infrared spectroscopy and ab initio quantum chemical analysis. At temperatures of ≤100 °C, TMA physisorbs to the carbonyl groups of PMMA. As the temperature is increased, TMA forms a covalent bond with PMMA. TMA physisorbs to PVP and then partially desorbs in the presence of water for all studied temperatures of ≤150 °C. PAA readily reacts with TMA to form a covalent bond with the carbonyl group at 60 °C. This inc...}, number={26}, journal={JOURNAL OF PHYSICAL CHEMISTRY C}, publisher={American Chemical Society (ACS)}, author={Hill, Grant T. and Lee, Dennis T. and Williams, Philip S. and Needham, Craig D. and Dandley, Erinn C. and Oldham, Christopher J. and Parsons, Gregory N.}, year={2019}, month={Jul}, pages={16146–16152} }
 @article{daubert_hill_gotsch_gremaud_ovental_williams_oldham_parsons_2017, title={Corrosion Protection of Copper Using Al2O3, TiO2, ZnO, HfO2, and ZrO2 Atomic Layer Deposition}, volume={9}, ISSN={["1944-8244"]}, DOI={10.1021/acsami.6b13571}, abstractNote={Atomic layer deposition (ALD) is a viable means to add corrosion protection to copper metal. Ultrathin films of Al2O3, TiO2, ZnO, HfO2, and ZrO2 were deposited on copper metal using ALD, and their corrosion protection properties were measured using electrochemical impedance spectroscopy (EIS) and linear sweep voltammetry (LSV). Analysis of ∼50 nm thick films of each metal oxide demonstrated low electrochemical porosity and provided enhanced corrosion protection from aqueous NaCl solution. The surface pretreatment and roughness was found to affect the extent of the corrosion protection. Films of Al2O3 or HfO2 provided the highest level of initial corrosion protection, but films of HfO2 exhibited the best coating quality after extended exposure. This is the first reported instance of using ultrathin films of HfO2 or ZrO2 produced with ALD for corrosion protection, and both are promising materials for corrosion protection.}, number={4}, journal={ACS APPLIED MATERIALS & INTERFACES}, author={Daubert, James S. and Hill, Grant T. and Gotsch, Hannah N. and Gremaud, Antoine P. and Ovental, Jennifer S. and Williams, Philip S. and Oldham, Christopher J. and Parsons, Gregory N.}, year={2017}, month={Feb}, pages={4192–4201} }
 @article{lemaire_zhao_williams_walls_shepherd_losego_peterson_parsons_2016, title={Copper Benzenetricarboxylate Metal-Organic Framework Nucleation Mechanisms on Metal Oxide Powders and Thin Films formed by Atomic Layer Deposition}, volume={8}, ISSN={["1944-8244"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000374274900078&KeyUID=WOS:000374274900078}, DOI={10.1021/acsami.6b01195}, abstractNote={Chemically functional microporous metal-organic framework (MOF) crystals are attractive for filtration and gas storage applications, and recent results show that they can be immobilized on high surface area substrates, such as fiber mats. However, fundamental knowledge is still lacking regarding initial key reaction steps in thin film MOF nucleation and growth. We find that thin inorganic nucleation layers formed by atomic layer deposition (ALD) can promote solvothermal growth of copper benzenetricarboxylate MOF (Cu-BTC) on various substrate surfaces. The nature of the ALD material affects the MOF nucleation time, crystal size and morphology, and the resulting MOF surface area per unit mass. To understand MOF nucleation mechanisms, we investigate detailed Cu-BTC MOF nucleation behavior on metal oxide powders and Al2O3, ZnO, and TiO2 layers formed by ALD on polypropylene substrates. Studying both combined and sequential MOF reactant exposure conditions, we find that during solvothermal synthesis ALD metal oxides can react with the MOF metal precursor to form double hydroxy salts that can further convert to Cu-BTC MOF. The acidic organic linker can also etch or react with the surface to form MOF from an oxide metal source, which can also function as a nucleation agent for Cu-BTC in the mixed solvothermal solution. We discuss the implications of these results for better controlled thin film MOF nucleation and growth.}, number={14}, journal={ACS APPLIED MATERIALS & INTERFACES}, author={Lemaire, Paul C. and Zhao, Junjie and Williams, Philip S. and Walls, Howard J. and Shepherd, Sarah D. and Losego, Mark D. and Peterson, Gregory W. and Parsons, Gregory N.}, year={2016}, month={Apr}, pages={9514–9522} }
 @inproceedings{ives_collins_oldham_stevens_williams_mantini_parsons_2016, title={Corrosion mitigation coatings for RF sources and components}, DOI={10.1109/ivec.2016.7561851}, abstractNote={Most all high power RF sources and components require liquid cooling, usually high purity water. Copper and associated braze alloys are susceptible to corrosion if the water contains impurities or modest levels of oxygen. Unfortunately, high purity water is not readily available in many locations, including developing countries, remote sites, and naval vessels. The U.S. Navy is funding development of protective coatings to reduce or eliminate corrosion in copper coolant channels in RF sources and solenoids. This presentation will describe procedures for applying corrosion mitigation coatings in RF sources and associated components and equipment.}, booktitle={2016 ieee international vacuum electronics conference (ivec)}, author={Ives, R. L. and Collins, G. and Oldham, C. J. and Stevens, E. C. and Williams, P. S. and Mantini, M. J. and Parsons, G. N.}, year={2016} }
 @article{zhao_gong_nunn_lemaire_stevens_sidi_williams_oldham_walls_shepherd_et al._2015, title={Conformal and highly adsorptive metal-organic framework thin films via layer-by-layer growth on ALD-coated fiber mats}, volume={3}, ISSN={["2050-7496"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000346906100014&KeyUID=WOS:000346906100014}, DOI={10.1039/c4ta05501b}, abstractNote={Fiber@ALD@MOF structures fabricated via ALD and layer-by-layer MOF synthesis show good conformality and high adsorption capacity.}, number={4}, journal={JOURNAL OF MATERIALS CHEMISTRY A}, author={Zhao, Junjie and Gong, Bo and Nunn, William T. and Lemaire, Paul C. and Stevens, Eric C. and Sidi, Fahim I. and Williams, Philip S. and Oldham, Christopher J. and Walls, Howard J. and Shepherd, Sarah D. and et al.}, year={2015}, pages={1458–1464} }
 @article{atanasov_losego_gong_sachet_maria_williams_parsons_2014, title={Highly Conductive and Conformal Poly(3,4-ethylenedioxythiophene) (PEDOT) Thin Films via Oxidative Molecular Layer Deposition}, volume={26}, ISSN={["1520-5002"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000337199400019&KeyUID=WOS:000337199400019}, DOI={10.1021/cm500825b}, abstractNote={This work introduces oxidative molecular layer deposition (oMLD) as a chemical route to synthesize highly conductive and conformal poly(3,4-ethylenedioxythiophene) (PEDOT) thin films via sequential vapor exposures of molybdenum(V) chloride (MoCl5, oxidant) and ethylene dioxythiophene (EDOT, monomer) precursors. The growth temperature strongly affects PEDOT’s crystalline structure and electronic conductivity. Films deposited at ∼150 °C exhibit a highly textured crystalline structure, with {010} planes aligned parallel with the substrate. Electrical conductivity of these textured films is routinely above 1000 S cm–1, with the most conductive films exceeding 3000 S cm–1. At lower temperatures (∼100 °C) the films exhibit a random polycrystalline structure and display smaller conductivities. Compared with typical electrochemical, solution-based, and chemical vapor deposition techniques, oMLD PEDOT films achieve high conductivity without the need for additives or postdeposition treatments. Moreover, the sequent...}, number={11}, journal={CHEMISTRY OF MATERIALS}, author={Atanasov, Sarah E. and Losego, Mark D. and Gong, Bo and Sachet, Edward and Maria, Jon-Paul and Williams, Philip S. and Parsons, Gregory N.}, year={2014}, month={Jun}, pages={3471–3478} }
 @article{zhao_losego_lemaire_williams_gong_atanasov_blevins_oldham_walls_shepherd_et al._2014, title={Highly adsorptive, MOF-functionalized nonwoven fiber mats for hazardous gas capture enabled by atomic layer deposition}, volume={1}, number={4}, journal={Advanced Materials Interfaces}, author={Zhao, J. J. and Losego, M. D. and Lemaire, P. C. and Williams, P. S. and Gong, B. and Atanasov, S. E. and Blevins, T. M. and Oldham, C. J. and Walls, H. J. and Shepherd, S. D. and et al.}, year={2014} }
 @article{dandley_needham_williams_brozena_oldham_parsons_2014, title={Temperature-dependent reaction between trimethylaluminum and poly(methyl methacrylate) during sequential vapor infiltration: experimental and ab initio analysis}, volume={2}, ISSN={["2050-7534"]}, DOI={10.1039/c4tc01293c}, abstractNote={We propose a temperature dependent reaction scheme between trimethylaluminum and poly(methyl methacrylate) for enhanced control of vapor phase polymer modification.}, number={44}, journal={JOURNAL OF MATERIALS CHEMISTRY C}, author={Dandley, Erinn C. and Needham, Craig D. and Williams, Philip S. and Brozena, Alexandra H. and Oldham, Christopher J. and Parsons, Gregory N.}, year={2014}, month={Nov}, pages={9416–9424} }
 @misc{parsons_atanasov_dandley_devine_gong_jur_lee_oldham_peng_spagnola_et al._2013, title={Mechanisms and reactions during atomic layer deposition on polymers}, volume={257}, ISSN={["1873-3840"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000327915000012&KeyUID=WOS:000327915000012}, DOI={10.1016/j.ccr.2013.07.001}, abstractNote={There is significant growing interest in atomic layer deposition onto polymers for barrier coatings, nanoscale templates, surface modification layers and other applications. The ability to control the reaction between ALD precursors and polymers opens new opportunities in ALD materials processing. It is well recognized that ALD on many polymers involves subsurface precursor diffusion and reaction which are not encountered during ALD on solid surfaces. This article reviews recent insights into chemical reactions that proceed during ALD on polymers, with particular focus on the common Al2O3 reaction sequence using trimethyl aluminum (TMA) and water. We highlight the role of different polymer reactive groups in film growth, and how the balance between precursor diffusion and reaction can change as deposition proceeds. As a strong Lewis acid, TMA forms adducts with Lewis base sites within the polymer, and the reactions that proceed are determined by the neighboring bond structure. Moreover, the Lewis base sites can be saturated by TMA, producing a self-limiting half-reaction within a three-dimensional polymer, analogous to a self-limiting half-reaction commonly observed during ALD on a solid planar surface.}, number={23-24}, journal={COORDINATION CHEMISTRY REVIEWS}, author={Parsons, Gregory N. and Atanasov, Sarah E. and Dandley, Erinn C. and Devine, Christina K. and Gong, Bo and Jur, Jesse S. and Lee, Kyoungmi and Oldham, Christopher J. and Peng, Qing and Spagnola, Joseph C. and et al.}, year={2013}, month={Dec}, pages={3323–3331} }