@misc{parsons_atanasov_dandley_devine_gong_jur_lee_oldham_peng_spagnola_et al._2013, title={Mechanisms and reactions during atomic layer deposition on polymers}, volume={257}, ISSN={["1873-3840"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000327915000012&KeyUID=WOS:000327915000012}, DOI={10.1016/j.ccr.2013.07.001}, abstractNote={There is significant growing interest in atomic layer deposition onto polymers for barrier coatings, nanoscale templates, surface modification layers and other applications. The ability to control the reaction between ALD precursors and polymers opens new opportunities in ALD materials processing. It is well recognized that ALD on many polymers involves subsurface precursor diffusion and reaction which are not encountered during ALD on solid surfaces. This article reviews recent insights into chemical reactions that proceed during ALD on polymers, with particular focus on the common Al2O3 reaction sequence using trimethyl aluminum (TMA) and water. We highlight the role of different polymer reactive groups in film growth, and how the balance between precursor diffusion and reaction can change as deposition proceeds. As a strong Lewis acid, TMA forms adducts with Lewis base sites within the polymer, and the reactions that proceed are determined by the neighboring bond structure. Moreover, the Lewis base sites can be saturated by TMA, producing a self-limiting half-reaction within a three-dimensional polymer, analogous to a self-limiting half-reaction commonly observed during ALD on a solid planar surface.}, number={23-24}, journal={COORDINATION CHEMISTRY REVIEWS}, author={Parsons, Gregory N. and Atanasov, Sarah E. and Dandley, Erinn C. and Devine, Christina K. and Gong, Bo and Jur, Jesse S. and Lee, Kyoungmi and Oldham, Christopher J. and Peng, Qing and Spagnola, Joseph C. and et al.}, year={2013}, month={Dec}, pages={3323–3331} }
 @misc{peng_lewis_hoertz_glass_parsons_2012, title={Atomic layer deposition for electrochemical energy generation and storage systems}, volume={30}, ISSN={["0734-2101"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000298992800067&KeyUID=WOS:000298992800067}, DOI={10.1116/1.3672027}, abstractNote={Clean renewable energy sources (e.g., solar, wind, and hydro) offers the most promising solution to energy and environmental sustainability. On the other hand, owing to the spatial and temporal variations of renewable energy sources, and transportation and mobility needs, high density energy storage and efficient energy distribution to points of use is also critical. Moreover, it is challenging to scale up those processes in a cost-effective way. Electrochemical processes, including photoelectrochemical devices, batteries, fuel cells, super capacitors, and others, have shown promise for addressing many of the abovementioned challenges. Materials with designer properties, especially the interfacial properties, play critical role for the performance of those devices. Atomic layer deposition is capable of precise engineering material properties on atomic scale. In this review, we focus on the current state of knowledge of the applications, perspective and challenges of atomic layer deposition process on the electrochemical energy generation and storage devices and processes.}, number={1}, journal={JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A}, author={Peng, Qing and Lewis, Jay S. and Hoertz, Paul G. and Glass, Jeffrey T. and Parsons, Gregory N.}, year={2012}, month={Jan} }
 @article{peng_efimenko_genzer_parsons_2012, title={Oligomer Orientation in Vapor-Molecular-Layer-Deposited Alkyl-Aromatic Polyamide Films}, volume={28}, ISSN={["0743-7463"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000306441100019&KeyUID=WOS:000306441100019}, DOI={10.1021/la3017936}, abstractNote={The surface-limited molecular-layer deposition of alkyl-aromatic polyamide films using sequential doses of 1,4-butane diamine (BDA) and terephthaloyl dichloride (TDC) is characterized using in situ quartz crystal microbalance and ex situ spectroscopy analysis. For the first time, near-edge X-ray absorption fine structure (NEXAFS) spectroscopy is used to offer insight into molecular orientation in films deposited via molecular-layer deposition (MLD). The results show that the oligomer units are lying nearly parallel to the surface, which differs from the linear vertical growth mode often used to illustrate film growth.}, number={28}, journal={LANGMUIR}, author={Peng, Qing and Efimenko, Kirill and Genzer, Jan and Parsons, Gregory N.}, year={2012}, month={Jul}, pages={10464–10470} }
 @article{gong_peng_parsons_2011, title={Conformal Organic - Inorganic Hybrid Network Polymer Thin Films by Molecular Layer Deposition using Trimethylaluminum and Glycidol}, volume={115}, ISSN={["1520-6106"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000290427100026&KeyUID=WOS:000290427100026}, DOI={10.1021/jp201186k}, abstractNote={Growing interest in nanoscale organic-inorganic hybrid network polymer materials is driving exploration of new bulk and thin film synthesis reaction mechanisms. Molecular layer deposition (MLD) is a vapor-phase deposition process, based on atomic layer deposition (ALD) which proceeds by exposing a surface to an alternating sequence of two or more reactant species, where each surface half-reaction goes to completion before the next reactant exposure. This work describes film growth using trimethyl aluminum and heterobifunctional glycidol at moderate temperatures (90-150 °C), producing a relatively stable organic-inorganic network polymer of the form (-Al-O-(C(4)H(8))-O-)(n). Film growth rate and in situ reaction analysis indicate that film growth does not initially follow a steady-state rate, but increases rapidly during early film growth. The mechanism is consistent with subsurface species transport and trapping, previously documented during MLD and ALD on polymers. A water exposure step after the TMA produces a more linear growth rate, likely by blocking TMA subsurface diffusion. Uniform and conformal films are formed on complex nonplanar substrates. Upon postdeposition annealing, films transform into microporous metal oxides with ∼5 Å pore size and surface area as high as ∼327 m(2)/g, and the resulting structures duplicate the shape of the original substrate. These hybrid films and porous materials could find uses in several research fields including gas separations and diffusion barriers, biomedical scaffolds, high surface area coatings, and others.}, number={19}, journal={JOURNAL OF PHYSICAL CHEMISTRY B}, author={Gong, Bo and Peng, Qing and Parsons, Gregory N.}, year={2011}, month={May}, pages={5930–5938} }
 @article{gong_peng_na_parsons_2011, title={Highly active photocatalytic ZnO nanocrystalline rods supported on polymer fiber mats: Synthesis using atomic layer deposition and hydrothermal crystal growth}, volume={407}, ISSN={["0926-860X"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000297234400025&KeyUID=WOS:000297234400025}, DOI={10.1016/j.apcata.2011.08.041}, abstractNote={Photocatalytically active zinc oxide nanocrystalline rods are grown on high surface area polybutylene terephthalate (PBT) polymer fiber mats using low temperature solution based methods, where the oxide crystal nucleation is facilitated using conformal thin films formed by low temperature vapor phase atomic layer deposition (ALD). Scanning electron microscopy (SEM) confirms that highly oriented single crystal ZnO nanorod crystals are directed normal to the starting fiber substrate surface, and the extent of nanocrystal growth within the fiber mat bulk is affected by the overall thickness of the ZnO nucleation layer. The high surface area of the nanocrystal-coated fibers is confirmed by nitrogen adsorption/desorption analysis. An organic dye in aqueous solution in contact with the coated fiber degraded rapidly upon ultraviolet light exposure, allowing quantitative analysis of the photocatalytic properties of fibers with and without nanorod crystals present. The dye degrades nearly twice as fast in contact with the ZnO nanorod crystals compared with samples with only an ALD ZnO layer. Additionally, the catalyst on the polymer fiber mat could be reused without need for a particle recovery step. This combination of ALD and hydrothermal processes could produce high surface area finishes on complex polymer substrates for reusable photocatalytic and other surface-reaction applications.}, number={1-2}, journal={APPLIED CATALYSIS A-GENERAL}, author={Gong, Bo and Peng, Qing and Na, Jeong-Seok and Parsons, Gregory N.}, year={2011}, month={Nov}, pages={211–216} }
 @article{peng_gong_parsons_2011, title={Making inert polypropylene fibers chemically responsive by combining atomic layer deposition and vapor phase chemical grafting}, volume={22}, ISSN={["1361-6528"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000288209700007&KeyUID=WOS:000288209700007}, DOI={10.1088/0957-4484/22/15/155601}, abstractNote={Uniformly grafting organic reactive molecular species, e.g. –NH2, onto substrates that have three-dimensional complex structures and are chemically inert is challenging. The vapor phase chemical grafting of organic molecules enabled by low temperature metal oxide atomic layer deposition (ALD) is presented as a general and promising solution to functionalize inert matrices with complex morphology, such as nonwoven polypropylene mats, through the controllable self-limited molecular assembly mechanism in a combined ALD and vapor phase chemical grafting process.}, number={15}, journal={NANOTECHNOLOGY}, author={Peng, Qing and Gong, Bo and Parsons, Gregory N.}, year={2011}, month={Apr} }
 @article{gong_peng_jur_devine_lee_parsons_2011, title={Sequential Vapor Infiltration of Metal Oxides into Sacrificial Polyester Fibers: Shape Replication and Controlled Porosity of Microporous/Mesoporous Oxide Monoliths}, volume={23}, ISSN={0897-4756 1520-5002}, url={http://dx.doi.org/10.1021/cm200694w}, DOI={10.1021/cm200694w}, abstractNote={The preparation of microporous and mesoporous metal oxide materials continues to attract considerable attention, because of their possible use in chemical separations, catalyst support, chemical sensors, optical and electronic devices, energy storage, and solar cells. While many methods are known for the synthesis of porous materials, researchers continue to seek new methods to control pore size distribution and macroscale morphology. In this work, we show that sequential vapor infiltration (SVI) can yield shape-controlled micro/mesoporous materials with tunable pore size, using polyesters as a sacrificial template. The reaction proceeds by exposing polymer fiber templates to a controlled sequence of metal organic and co-reactant vapor exposure cycles in an atomic layer deposition (ALD) reactor. The precursors infuse sequentially and thereby distribute and react uniformly within the polymer, to yield an organic–inorganic hybrid material that retains the physical dimensions of the original polymer template...}, number={15}, journal={Chemistry of Materials}, publisher={American Chemical Society (ACS)}, author={Gong, Bo and Peng, Qing and Jur, Jesse S. and Devine, Christina K. and Lee, Kyoungmi and Parsons, Gregory N.}, year={2011}, month={Aug}, pages={3476–3485} }
 @article{hyde_scarel_spagnola_peng_lee_gong_roberts_roth_hanson_devine_et al._2010, title={Atomic Layer Deposition and Abrupt Wetting Transitions on Nonwoven Polypropylene and Woven Cotton Fabrics}, volume={26}, ISSN={["0743-7463"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000274342200056&KeyUID=WOS:000274342200056}, DOI={10.1021/la902830d}, abstractNote={Atomic layer deposition (ALD) of aluminum oxide on nonwoven polypropylene and woven cotton fabric materials can be used to transform and control fiber surface wetting properties. Infrared analysis shows that ALD can produce a uniform coating throughout the nonwoven polypropylene fiber matrix, and the amount of coating can be controlled by the number of ALD cycles. Upon coating by ALD aluminum oxide, nonwetting hydrophobic polypropylene fibers transition to either a metastable hydrophobic or a fully wetting hydrophilic state, consistent with well-known Cassie-Baxter and Wenzel models of surface wetting of roughened surfaces. The observed nonwetting/wetting transition depends on ALD process variables such as the number of ALD coating cycles and deposition temperature. Cotton fabrics coated with ALD aluminum oxide at moderate temperatures were also observed to transition from a natural wetting state to a metastable hydrophobic state and back to wetting depending on the number of ALD cycles. The transitions on cotton appear to be less sensitive to deposition temperature. The results provide insight into the effect of ALD film growth mechanisms on hydrophobic and hydrophilic polymers and fibrous structures. The ability to adjust and control surface energy, surface reactivity, and wettability of polymer and natural fiber systems using atomic layer deposition may enable a wide range of new applications for functional fiber-based systems.}, number={4}, journal={LANGMUIR}, author={Hyde, G. Kevin and Scarel, Giovanna and Spagnola, Joseph C. and Peng, Qing and Lee, Kyoungmi and Gong, Bo and Roberts, Kim G. and Roth, Kelly M. and Hanson, Christopher A. and Devine, Christina K. and et al.}, year={2010}, month={Feb}, pages={2550–2558} }
 @article{jur_spagnola_lee_gong_peng_parsons_2010, title={Temperature-Dependent Subsurface Growth during Atomic Layer Deposition on Polypropylene and Cellulose Fibers}, volume={26}, ISSN={["0743-7463"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000277928100078&KeyUID=WOS:000277928100078}, DOI={10.1021/la904604z}, abstractNote={Nucleation and subsequent growth of aluminum oxide by atomic layer deposition (ALD) on polypropylene fiber substrates is strongly dependent on processing temperature and polymer backbone structure. Deposition on cellulose cotton, which contains ample hydroxyl sites for ALD nucleation and growth on the polymer backbone, readily produces a uniform and conformal coating. However, similar ALD processing on polypropylene, which contains no readily available active sites for growth initiation, results in a graded and intermixed polymer/inorganic interface layer. The structure of the polymer/inorganic layer depends strongly on the process temperature, where lower temperature (60 degrees C) produced a more abrupt transition. Cross-sectional transmission electron microscopy images of polypropylene fibers coated at higher temperature (90 degrees C) show that non-coalesced particles form in the near-surface region of the polymer, and the particles grow in size and coalesce into a film as the number of ALD cycles increases. Quartz crystal microbalance analysis on polypropylene films confirms enhanced mass uptake at higher processing temperatures, and X-ray photoelectron spectroscopy data also confirm heterogeneous mixing between the aluminum oxide and the polypropylene during deposition at higher temperatures. The strong temperature dependence of film nucleation and subsurface growth is ascribed to a relatively large increase in bulk species diffusivity that occurs upon the temperature-driven free volume expansion of the polypropylene. These results provide helpful insight into mechanisms for controlled organic/inorganic thin film and fiber materials integration.}, number={11}, journal={LANGMUIR}, author={Jur, Jesse S. and Spagnola, Joseph C. and Lee, Kyoungmi and Gong, Bo and Peng, Qing and Parsons, Gregory N.}, year={2010}, month={Jun}, pages={8239–8244} }
 @article{peng_gong_vangundy_parsons_2009, title={"Zincone" Zinc Oxide-Organic Hybrid Polymer Thin Films Formed by Molecular Layer Deposition}, volume={21}, ISSN={["1520-5002"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000263891700009&KeyUID=WOS:000263891700009}, DOI={10.1021/cm8020403}, abstractNote={Hybrid organic−inorganic polymer thin films of the form (−O−Zn−O−C2H4−)n have been deposited from diethyl zinc and ethylene glycol using molecular layer deposition (MLD) over a range of substrate temperatures between 100 and 170 °C. Infrared transmission confirms that the films consist of Zn−O and ethylene-oxide units. In analogy with known alucone polymers of the form (−O−Al−O−R−)n, the zinc-based hybrid material is an example of a “zincone” polymer. In situ quartz crystal microbalance analysis indicated that the sequential surface reactions of diethyl zinc and ethylene glycol are sufficiently self-limiting and saturating to enable well-controlled MLD growth. Quantitative analysis of in situ quartz crystal microbalance and film thickness results indicate that ethylene glycol molecules can undergo a “double reaction” where the OH groups on both ends of the diol react with available Zn−C2H5 surface sites to produce a relatively inert bridging alkane. The mass uptake per MLD cycle during Zn−hybrid film depo...}, number={5}, journal={CHEMISTRY OF MATERIALS}, author={Peng, Qing and Gong, Bo and VanGundy, Ryan M. and Parsons, Gregory N.}, year={2009}, month={Mar}, pages={820–830} }
 @article{peng_sun_spagnola_saquing_khan_spontak_parsons_2009, title={Bi-directional Kirkendall Effect in Coaxial Microtuble Nanolaminate Assemblies Fabricated by Atomic Layer Deposition}, volume={3}, ISSN={["1936-086X"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000264535200010&KeyUID=WOS:000264535200010}, DOI={10.1021/nn8006543}, abstractNote={The solid-state reaction within a coaxial Al2O3/ZnO/Al2O3 multilayered microtubular structure can be used to prepare discrete microtube-in-microtube ZnAl2O4 spinel assemblies through a Kirkendall void production mechanism at 700 degrees C. In contrast with previous studies of the nanoscale Kirkendall effect, the reaction observed here proceeds through a bi-directional vacancy diffusion mechanism wherein ZnO species diffuse into inner- and outer-Al2O3 concentric layers, thereby resulting in vacancy supersaturation and void production between two isolated spinel microtubes. Low-temperature atomic layer deposition (ALD) of Al2O3 and ZnO enables the fabrication of complex coaxial multilayered microtubes with precise control of the starting film thicknesses and relative composition. When a molar excess of ZnO is present between two Al2O3 layers, electron microscopy images reveal incomplete ZnO consumption after annealing at 700 degrees C. At higher initial Al2O3 concentrations, however, complete reaction with ZnO is observed, and the size of the Kirkendall gap between isolated spinel microtubes appears to be directly influenced by the thickness of the intermediate ZnO layer.}, number={3}, journal={ACS NANO}, author={Peng, Qing and Sun, Xiao-Yu and Spagnola, Joseph C. and Saquing, Carl and Khan, Saad A. and Spontak, Richard J. and Parsons, Gregory N.}, year={2009}, month={Mar}, pages={546–554} }
 @article{na_peng_scarel_parsons_2009, title={Role of Gas Doping Sequence in Surface Reactions and Dopant Incorporation during Atomic Layer Deposition of Al-Doped ZnO}, volume={21}, ISSN={["1520-5002"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000272084500009&KeyUID=WOS:000272084500009}, DOI={10.1021/cm901404p}, abstractNote={Aluminum incorporation into ZnO films during atomic layer deposition (ALD) is investigated using in situ quartz crystal microbalance and electrical conductance analysis. Chemical interactions between Zn and Al species during ZnO:Al ALD depend on the order of metal precursor exposure. Exposing the growing ZnO surface to trimethyl aluminum (TMA) impedes the subsequent ∼4 monolayers of ZnO growth. However, the extent of interaction can be reduced by performing the TMA exposure immediately following a diethyl zinc step, without an intermediate water exposure step, consistent with increased surface mixing of Zn and Al species. Infrared spectroscopy analysis of heavily aluminum doped ZnO shows features consistent with the presence of amorphous ZnAl2O4 bonding units. For more lightly doped films, mass spectroscopic depth profiling confirms nonuniform aluminum distribution, even after annealing at 500 °C. Film conductance measured during growth shows complex trends that are highly repeatable over multiple doping ...}, number={23}, journal={CHEMISTRY OF MATERIALS}, author={Na, Jeong-Seok and Peng, Qing and Scarel, Giovanna and Parsons, Gregory N.}, year={2009}, month={Dec}, pages={5585–5593} }
 @article{peng_spagnola_daisuke_park_parsons_2008, title={Conformal metal oxide coatings on nanotubes by direct low temperature metal-organic pyrolysis in supercritical carbon dioxide}, volume={26}, ISSN={["2166-2746"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000256304600016&KeyUID=WOS:000256304600016}, DOI={10.1116/1.2917072}, abstractNote={The authors demonstrate that low temperature (<200 °C) thermal decomposition of metal-organic precursors dissolved in supercritical carbon dioxide (scCO2) is an effective method to penetrate into dense three-dimensional networks and deposit conformal metal oxide films with tunable thickness. The results specifically show that thermal decomposition of gallium acetylacetonate in scCO2, leads to conformal coatings of gallium oxide on multiwalled carbon nanotube forests with a fast deposition rate (∼3–4 nm/min), without the need for any cosolvent. Moreover, as-formed metal oxide/nanotube structures can be further conformally coated by metal atomic layer deposition to produce nanotube/oxide/metal nanocomposites.}, number={3}, journal={JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B}, author={Peng, Qing and Spagnola, Joseph C. and Daisuke, Hojo and Park, Kie Jin and Parsons, Gregory N.}, year={2008}, month={May}, pages={978–982} }
 @article{peng_hojo_park_parsons_2008, title={Low temperature metal oxide film deposition and reaction kinetics in supercritical carbon dioxide}, volume={516}, ISSN={["0040-6090"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000256509100054&KeyUID=WOS:000256509100054}, DOI={10.1016/j.tsf.2007.10.057}, abstractNote={An effective method is developed for low temperature metal oxide deposition through thermal decomposition of metal diketonates in supercritical carbon dioxide (scCO2) solvent. The rates of Al(acac)3 (Aluminum acetyl acetonate) and Ga(acac)3 (Gallium acetyl acetonate) thermal decomposition in scCO2 to form conformal Al2O3 and Ga2O3 thin films on planar surfaces were investigated. The thermal decomposition reaction of Al(acac)3 and Ga(acac)3 was found to be initialized at ∼ 150 °C and 160 °C respectively in scCO2 solvent, compared to ∼ 250 °C and 360 °C in analogous vacuum-based processes. By measuring the temperature dependence of the growth rates of metal oxide thin films, the apparent activation energy for the thermal decomposition of Al(acac)3 in scCO2 is found to be 68 ± 6 kJ/mol, in comparison with 80–100 kJ/mol observed for the corresponding vacuum-based thermal decomposition reaction. The enhanced thermal decomposition rate in scCO2 is ascribed to the high density solvent which effectively reduces the energy of the polar transition states in the reaction pathway. Preliminary results of thin film deposition of other metal oxides including ZrOx, FeOx, Co2O3, Cr2O3, HfOx from thermal decomposition of metal diketonates or fluorinated diketonates in scCO2 are also presented.}, number={15}, journal={THIN SOLID FILMS}, author={Peng, Qing and Hojo, Daisuke and Park, Kie Jin and Parsons, Gregory N.}, year={2008}, month={Jun}, pages={4997–5003} }
 @article{peng_spagnola_parsons_2008, title={Self-catalyzed hydrogenolysis of nickelocene: Functional metal coating of three-dimensional nanosystems at low temperature}, volume={155}, ISSN={["0013-4651"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000258038800037&KeyUID=WOS:000258038800037}, DOI={10.1149/1.2946723}, abstractNote={In this paper we demonstrate the hydrogenolysis of nickelocene can take place through a self-catalyzed process at low temperature (<70°C) in supercritical carbon dioxide to generate relatively uniform dispersed Ni (nickel) metal particles onto carbon nanotubes forests and Ni films on flat surfaces. The ability to form metal particles or films without a local catalyst at this low temperature is significant because it provides further insight into mechanisms for Ni deposition reactions, and it enables a new route for low-temperature metal coating on a range of nonmetal substrate materials with complex topographies and nanostructures, for example, to form Ni/polymer magnetic nanocomposites.}, number={9}, journal={JOURNAL OF THE ELECTROCHEMICAL SOCIETY}, author={Peng, Qing and Spagnola, Joseph C. and Parsons, Gregory N.}, year={2008}, pages={D580–D582} }
 @article{peng_sun_spagnola_hyde_spontak_parsons_2007, title={Atomic layer deposition on electrospun polymer fibers as a direct route to Al2O3 microtubes with precise wall thickness control}, volume={7}, ISSN={["1530-6984"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000244867400032&KeyUID=WOS:000244867400032}, DOI={10.1021/nl062948i}, abstractNote={Atomic layer deposition (ALD) of Al2O3 on electrospun poly(vinyl alcohol) microfiber templates is demonstrated as an effective and robust strategy by which to fabricate long and uniform metal-oxide microtubes. The wall thickness is shown to be precisely controlled within a molecular layer or so by adjusting the number of ALD cycles utilized. By judicious selection of the electrospinning and ALD parameters, designer tubes of various sizes and inorganic materials can be synthesized.}, number={3}, journal={NANO LETTERS}, author={Peng, Qing and Sun, Xiao-Yu and Spagnola, Joseph C. and Hyde, G. Kevin and Spontak, Richard J. and Parsons, Gregory N.}, year={2007}, month={Mar}, pages={719–722} }