Rachel Nye

Nye, R. A., Carroll, N. M., Morgan, S. E., & Parsons, G. N. (2024). Vapor-phase zeolitic imidazolate framework-8 growth on fibrous polymer substrates. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 42(1). https://doi.org/10.1116/6.0003183

Kaneda, Y., Nye, R. A., Marques, E. A., Armini, S., Delabie, A., Setten, M. J., & Pourtois, G. (2023, May 22). A First-Principles Investigation of the Driving Forces Defining the Selectivity of TiO2 Atomic Layer Deposition. JOURNAL OF PHYSICAL CHEMISTRY C. https://doi.org/10.1021/acs.jpcc.3c00965

Van Dongen, K., Nye, R. A. A., Clerix, J.-W. J., Sixt, C., De Simone, D., & Delabie, A. (2023). Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 41(3). https://doi.org/10.1116/6.0002347

Nye, R. A., Van Dongen, K., De Simone, D., Oka, H., Parsons, G. N., & Delabie, A. (2023, February 23). Enhancing Performance and Function of Polymethacrylate Extreme Ultraviolet Resists Using Area-Selective Deposition. CHEMISTRY OF MATERIALS, Vol. 2. https://doi.org/10.1021/acs.chemmater.2c03404

Nye, R. A. A., Van Dongen, K., Marneffe, J.-F., Parsons, G. N. N., & Delabie, A. (2023, June 17). Quantified Uniformity and Selectivity of TiO2 Films in 45-nm Half Pitch Patterns Using Area-Selective Deposition Supercycles. ADVANCED MATERIALS INTERFACES, Vol. 6. https://doi.org/10.1002/admi.202300163

Nye, R. A. A., Van Dongen, K., Oka, H., De Simone, D., Parsons, G. N. N., & Delabie, A. (2022). Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO(2 )area-selective deposition. JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, 21(4). https://doi.org/10.1117/1.JMM.21.4.041407

Nye, R. A., Van Dongen, K., Oka, H., Furutani, H., Parsons, G., De Simone, D., & Delabie, A. (2022). Improving polymethacrylate EUV resists with TiO2 area-selective deposition. ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIX, Vol. 12055. https://doi.org/10.1117/12.2613815

Nye, R. A., Song, S. K., Van Dongen, K., Delabie, A., & Parsons, G. N. (2022). Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition. APPLIED PHYSICS LETTERS, 121(8). https://doi.org/10.1063/5.0106132

Nye, R. A., Wang, S., Uhlenbrock, S., Smythe, J. A., III, & Parsons, G. N. (2021, December 27). In situ analysis of growth rate evolution during molecular layer deposition of ultra-thin polyurea films using aliphatic and aromatic precursors. DALTON TRANSACTIONS, Vol. 51. https://doi.org/10.1039/d1dt03689k

Matveev, S. M., Dlott, D. D., Hanusova, P., Maria, J.-P., Nye, R., & Parsons, G. (2020). Shock Initiation of Reactive Nanolaminates. SHOCK COMPRESSION OF CONDENSED MATTER - 2019, Vol. 2272. https://doi.org/10.1063/12.0000877

Nye, R. A., Kelliher, A. P., Gaskins, J. T., Hopkins, P. E., & Parsons, G. N. (2020). Understanding Molecular Layer Deposition Growth Mechanisms in Polyurea via Picosecond Acoustics Analysis. CHEMISTRY OF MATERIALS, 32(4), 1553–1563. https://doi.org/10.1021/acs.chemmater.9b04702