Steven Shannon Morsell, J., Dechant, C., Gall, G., Trosan, D., Lietz, A. M., Stapelmann, K., & Shannon, S. (2024). Estimation of mean electron energy in helium surface ionization waves on dielectric substrates. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 57(39). https://doi.org/10.1088/1361-6463/ad5451 Graves, D. B., Labelle, C. B., Kushner, M. J., Aydil, E. S., Donnelly, V. M., Chang, J. P., … Ruzic, D. N. (2024). Science challenges and research opportunities for plasma applications in microelectronics. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 42(4). https://doi.org/10.1116/6.0003531 Icenhour, C. T., Lindsay, A. D., Permann, C. J., Martineau, R. C., Green, D. L., & Shannon, S. C. (2024). The MOOSE electromagnetics module. SOFTWAREX, 25. https://doi.org/10.1016/j.softx.2023.101621 Shutayfi, M., Raj, A., Eapen, J., & Shannon, S. (2023). Design, Modeling, and Analysis of a Compact-External Electromagnetic Pumping System for Pool-Type Liquid Metal-Cooled Fast Reactors. ANNALS OF NUCLEAR ENERGY, 193. https://doi.org/10.1016/j.anucene.2023.109997 Shutayfi, M., Raj, A., Eapen, J., & Shannon, S. (2023). Design, Modeling, and Analysis of a Compact-External Electromagnetic Pumping System for Pool-Type Liquid Metal-Cooled Fast Reactors. ANNALS OF NUCLEAR ENERGY, 193. https://doi.org/10.1016/j.anucene.2023.109997r Morsell, J., Bhatt, N., Dechant, C., & Shannon, S. (2023). Effect of dielectric target properties on plasma surface ionization wave propagation. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 56(14). https://doi.org/10.1088/1361-6463/acbfc9 Xiao, Y., Brandon, J., Morsell, J., Nam, S. K., Bae, K. H., Lee, J.-Y., & Shannon, S. (2023). Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 41(3). https://doi.org/10.1116/6.0002496 Morsell, J., Trosan, D., Stapelmann, K., & Shannon, S. (2023). Plasma surface ionization wave interactions with single channels. PLASMA SOURCES SCIENCE & TECHNOLOGY, 32(9). https://doi.org/10.1088/1361-6595/acf9c9 DeChant, C., Icenhour, C., Keniley, S., Gall, G., Lindsay, A., Curreli, D., & Shannon, S. (2023). Verification and validation of the open-source plasma fluid code: Zapdos*,**. COMPUTER PHYSICS COMMUNICATIONS, 291. https://doi.org/10.1016/j.cpc.2023.108837 DeChant, C., Icenhour, C., Keniley, S., Lindsay, A., Gall, G., Hizon, K. C., … Shannon, S. (2023). Verification methods for drift-diffusion reaction models for plasma simulations. PLASMA SOURCES SCIENCE & TECHNOLOGY, 32(4). https://doi.org/10.1088/1361-6595/acce65 Du, Y., Kruger, F., Nam, S. K., Lee, H., Yoo, S., Eapen, J., … Shannon, S. (2022). Comparison of glancing-angle scatterings on different materials in a high aspect ratio plasma etching process using molecular dynamics simulation. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 40(5). https://doi.org/10.1116/6.0002008 Peterson, D., Xiao, Y., Ford, K., Kraus, P., & Shannon, S. (2021). Electron temperature measurements with a hairpin resonator probe in a pulsed low pressure capacitively coupled plasma. Plasma Sources Science and Technology, 5. https://doi.org/10.1088/1361-6595/ac02b2 Xiao, Y., Du, Y., Smith, C., Nam, S. K., Lee, H., Lee, J.-Y., & Shannon, S. (2021). Focus ring geometry influence on wafer edge voltage distribution for plasma processes. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. https://doi.org/10.1116/6.0000981 Smith, C. L., Nam, S. K., Bae, K., Lee, J.-Y., & Shannon, S. (2021). Modulating power delivery in a pulsed ICP discharge via the incorporation of negative feedback mechanisms. JOURNAL OF APPLIED PHYSICS, 130(16). https://doi.org/10.1063/5.0060240 Qu, C., Lanham, S. J., Shannon, S. C., Nam, S. K., & Kushner, M. J. (2020). Erratum: Power Matching to Pulsed Inductively Coupled Plasmas [J. Appl. Phys. 127, 133302 (2020)]. Journal of Applied Physics. https://doi.org/10.1063/5.0023888 Qu, C., Lanham, S. J., Shannon, S. C., Nam, S. K., & Kushner, M. J. (2020). Power matching to pulsed inductively coupled plasmas. Journal of Applied Physics. https://doi.org/10.1063/5.0002522 Peterson, D. J., Ford, K., Brandon, J., Shannon, S. C., Koh, T., Chua, T. C., … Kraus, P. A. (2020). Radiofrequency phase resolved electron density measurements with the hairpin resonator probe. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 53(14). https://doi.org/10.1088/1361-6463/ab6944 List, T., Ma, T., Arora, P., Donnelly, V. M., & Shannon, S. (2019). Complex transients in power modulated inductively-coupled chlorine plasmas. Plasma Sources Science and Technology, 28(2), 025005. https://doi.org/10.1088/1361-6595/ab000c Zafar, A., Martin, E., & Shannon, S. (2019). Doppler-free, Stark broadened profiles at low plasma densities in helium. Journal of Quantitative Spectroscopy and Radiative Transfer, 230, 48–55. https://doi.org/10.1016/j.jqsrt.2019.03.020 Icenhour, C. T., Lindsay, A. D., Martineau, R. C., & Shannon, S. (2019). Electromagnetics Simulations with Vector-valued Finite Elements in MOOSE. In Idaho National Laboratory Report (No. INL/CON-18-52320-Rev000). Ford, K., Peterson, D. J., Brandon, J., Nam, S. K., Walker, D., & Shannon, S. C. (2019). Measurement of localized plasma perturbation with hairpin resonator probes. Physics of Plasmas, 26(1), 013510. https://doi.org/10.1063/1.5065509 Coumou, D. J., Smith, S. T., Peterson, D. J., & Shannon, S. C. (2019). Time-Resolved Electron Density Measurement Characterization of E–H-Modes for Inductively Coupled Plasma Instabilities. IEEE Transactions on Plasma Science, 47(5), 2102–2109. https://doi.org/10.1109/TPS.2019.2909476 Zafar, A., Martin, E., & Shannon, S. (2018). High resolution magnetic field measurements in hydrogen and helium plasmas using active laser spectroscopy. Review of Scientific Instruments, 89(10), 10D126. https://doi.org/10.1063/1.5039334 Poulose, J., Goeckner, M., Shannon, S., Coumou, D., & Overzet, L. (2017). Driving frequency fluctuations in pulsed capacitively coupled plasmas. The European Physical Journal D, 71(9). https://doi.org/10.1140/epjd/e2017-80096-7 Peterson, D. J., Kraus, P., Chua, T. C., Larson, L., & Shannon, S. C. (2017). Electron neutral collision frequency measurement with the hairpin resonator probe. Plasma Sources Science and Technology, 26(9), 095002. https://doi.org/10.1088/1361-6595/aa80fa Talley, M. L., Shannon, S., Chen, L., & Verboncoeur, J. P. (2017). IEDF distortion and resolution considerations for RFEA operation at high voltages. Plasma Sources Science and Technology, 26(12), 125001. https://doi.org/10.1088/1361-6595/aa9465 Mededovic Thagard, S., Sankaran, M., Kushner, M. J., & Shannon, S. (2017). Science challenges in low-temperature plasma science and engineering: Enabling a future based on electricity through non-equalibrium plasma chemistry [NSF Workshop Report]. National Science Foundation. Zafar, A., Martin, E. H., Shannon, S. C., Isler, R. C., & Caughman, J. B. O. (2016). A temporally and spatially resolved electron density diagnostic method for the edge plasma based on Stark broadening. Review of Scientific Instruments, 87(11), 11E505. https://doi.org/10.1063/1.4955484 Li, G., Zhang, D., Qiao, Q., Yu, Y., Peterson, D., Zafar, A., … Cao, L. (2016). All The Catalytic Active Sites of MoS2 for Hydrogen Evolution. Journal of the American Chemical Society, 138(51), 16632–16638. https://doi.org/10.1021/jacs.6b05940 Imada, K., Ishimaru, M., Xue, H., Zhang, Y., Shannon, S. C., & Weber, W. J. (2016). Amorphization resistance of nano-engineered SiC under heavy ion irradiation. Journal of Nuclear Materials, 478, 310–314. https://doi.org/10.1016/j.jnucmat.2016.06.031 Chen, C.-H., Zhang, Y., Wang, Y., Crespillo, M. L., Fontana, C. L., Graham, J. T., … Weber, W. J. (2016). Dose dependence of helium bubble formation in nano-engineered SiC at 700 °C. Journal of Nuclear Materials, 472, 153–160. https://doi.org/10.1016/j.jnucmat.2016.01.029 Lindsay, A. D., Graves, D. B., & Shannon, S. C. (2016). Fully coupled simulation of the plasma liquid interface and interfacial coefficient effects. Journal of Physics D: Applied Physics, 49(23), 235204. https://doi.org/10.1088/0022-3727/49/23/235204 Shannon, S., Eapen, J., Maria, J.-P., & Weber, W. (2016). Novel Engineered Refractory Materials for Advanced Reactor Applications. https://doi.org/10.2172/1246903 Tangpatjaroen, C., Grierson, D., Shannon, S., Jakes, J. E., & Szlufarska, I. (2017). Size Dependence of Nanoscale Wear of Silicon Carbide. ACS Applied Materials & Interfaces, 9(2), 1929–1940. https://doi.org/10.1021/acsami.6b13283 Imada, K., Ishimaru, M., Sato, K., Xue, H., Zhang, Y., Shannon, S., & Weber, W. J. (2015). Atomistic structures of nano-engineered SiC and radiation-induced amorphization resistance. Journal of Nuclear Materials, 465, 433–437. https://doi.org/10.1016/j.jnucmat.2015.06.036 Zhang, Y., Zafar, A., Coumou, D. J., Shannon, S. C., & Kushner, M. J. (2015). Control of ion energy distributions using phase shifting in multi-frequency capacitively coupled plasmas. Journal of Applied Physics, 117(23), 233302. https://doi.org/10.1063/1.4922631 Martin, E. H., Goniche, M., Klepper, C. C., Hillairet, J., Isler, R. C., Bottereau, C., … Litaudon, X. (2015). Electric field determination in the plasma-antenna boundary of a lower-hybrid wave launcher in Tore Supra through dynamic Stark-effect spectroscopy. Plasma Physics and Controlled Fusion, 57(6), 065011. https://doi.org/10.1088/0741-3335/57/6/065011 Lindsay, A., Anderson, C., Slikboer, E., Shannon, S., & Graves, D. (2015). Momentum, heat, and neutral mass transport in convective atmospheric pressure plasma-liquid systems and implications for aqueous targets. Journal of Physics D: Applied Physics, 48(42), 424007. https://doi.org/10.1088/0022-3727/48/42/424007 Kushner, M. J., Adamovich, I., Aydil, E., Baalrud, S. D., Barnat, E., Graves, D. B., … Wolden, C. (2014). A low temperature plasma science program: Discovery science for societal benefit. In FESAC Strategic Planning Panel [White paper]. Zhang, Y., Varga, T., Ishimaru, M., Edmondson, P. D., Xue, H., Liu, P., … Weber, W. J. (2014). Competing effects of electronic and nuclear energy loss on microstructural evolution in ionic-covalent materials. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 327, 33–43. https://doi.org/10.1016/j.nimb.2013.10.095 Lindsay, A., Byrns, B., King, W., Andhvarapou, A., Fields, J., Knappe, D., … Shannon, S. (2014). Fertilization of Radishes, Tomatoes, and Marigolds Using a Large-Volume Atmospheric Glow Discharge. Plasma Chemistry and Plasma Processing, 34(6), 1271–1290. https://doi.org/10.1007/s11090-014-9573-x Coumou, D. J., Clark, D. H., Kummerer, T., Hopkins, M., Sullivan, D., & Shannon, S. (2014). Ion Energy Distribution Skew Control Using Phase-Locked Harmonic RF Bias Drive. IEEE Transactions on Plasma Science, 42(7), 1880–1893. https://doi.org/10.1109/tps.2014.2326600 Chen, C. H., Zhang, Y., Fu, E., Wang, Y., Crespillo, M. L., Liu, C., … Weber, W. J. (2014). Irradiation-induced microstructural change in helium-implanted single crystal and nano-engineered SiC. Journal of Nuclear Materials, 453(1-3), 280–286. https://doi.org/10.1016/j.jnucmat.2014.07.020 Klepper, C. C., Martin, E. H., Isler, R. C., Colas, L., Goniche, M., Hillairet, J., … Litaudon, X. (2014). Probing the plasma near high power wave launchers in fusion devices for static and dynamic electric fields (invited). Review of Scientific Instruments, 85(11), 11E301. https://doi.org/10.1063/1.4890247 Jamison, L., Sridharan, K., Shannon, S., & Szlufarska, I. (2014). Temperature and irradiation species dependence of radiation response of nanocrystalline silicon carbide. Journal of Materials Research, 29(23), 2871–2880. https://doi.org/10.1557/jmr.2014.340 Jamison, L., Zheng, M.-J., Shannon, S., Allen, T., Morgan, D., & Szlufarska, I. (2014). Experimental and ab initio study of enhanced resistance to amorphization of nanocrystalline silicon carbide under electron irradiation. Journal of Nuclear Materials, 445(1-3), 181–189. https://doi.org/10.1016/j.jnucmat.2013.11.010 Ishimaru, M., Zhang, Y., Shannon, S., & Weber, W. J. (2013). Origin of radiation tolerance in 3C-SiC with nanolayered planar defects. Applied Physics Letters, 103(3), 033104. https://doi.org/10.1063/1.4813593 Vineet, M., Karl, B., A, P. J., J, H. D., C, S. S., A, M. K., & D, P. V. (2013). Substrate Cleaning Chamber And Cleaning And Conditioning Methods. Retrieved from https://www.lens.org/184-581-960-252-75X Byrns, B., Wooten, D., Lindsay, A., & Shannon, S. (2012). A VHF driven coaxial atmospheric air plasma: electrical and optical characterization. Journal of Physics D: Applied Physics, 45(19), 195204. https://doi.org/10.1088/0022-3727/45/19/195204 Zhang, Y., Ishimaru, M., Varga, T., Oda, T., Hardiman, C., Xue, H., … Weber, W. J. (2012). Nanoscale engineering of radiation tolerant silicon carbide. Physical Chemistry Chemical Physics, 14(38), 13429. https://doi.org/10.1039/c2cp42342a Shannon, S. (2012). Plasma-Assisted Pattern Transfer at the Nanoscale. In S. Cabrini & S. Kawata (Eds.), Nanofabrication Handbook (pp. 111–126). Boca Raton FL: CRC Press Taylor and Francis Group. Saghir, A. E., & Shannon, S. (2012). The impact of Langmuir probe geometries on electron current collection and the integral relation for obtaining electron energy distribution functions. Plasma Sources Science and Technology, 21(2), 025003. https://doi.org/10.1088/0963-0252/21/2/025003 Improving Plasma Process Uniformity Across A Wafer By Apportioning Power Among Plural Vhf Sources. (2011). Retrieved from https://www.lens.org/035-374-849-498-503 El Saghir, A., & Shannon, S. (2011). Limitations of Regularization Methods for the Reconstruction of Electron Velocity Distribution Function. IEEE Transactions on Plasma Science, 39(4), 1034–1037. https://doi.org/10.1109/tps.2011.2125970 Method Of Processing A Workpiece In A Plasma Reactor With Variable Height Ground Return Path To Control Plasma Ion Density Uniformity. (2011). Retrieved from https://www.lens.org/082-874-457-200-865 Plasma Process Uniformity Across A Wafer By Apportioning Ground Return Path Impedances Among Plural Vhf Sources. (2011). Retrieved from https://www.lens.org/004-808-299-268-13X Plasma Process Uniformity Across A Wafer By Controlling A Variable Frequency Coupled To A Harmonic Resonator. (2011). Retrieved from https://www.lens.org/145-961-377-173-552 Plasma Process Uniformity Across A Wafer By Controlling Rf Phase Between Opposing Electrodes. (2011). Retrieved from https://www.lens.org/003-021-090-469-410 El Saghir, A., & Shannon, S. (2011). Reduction of EEDF Measurement Distortion in Regularized Solutions of the Druyvesteyn Relation. IEEE Transactions on Plasma Science, 39(1), 596–602. https://doi.org/10.1109/tps.2010.2090906 C, S. S. (2010). Method For Testing Plasma Reactor Multi-frequency Impedance Match Networks. Retrieved from https://www.lens.org/078-180-755-189-413 C, S. S., S, G. D., Theodoros, P., J, H. D., G, C. M., S, D. T., … Y, P. B. (2010). Plasma Control Using Dual Cathode Frequency Mixing. Retrieved from https://www.lens.org/089-103-194-978-761 El Saghir, A., Kennedy, C., & Shannon, S. (2010). Electron Energy Distribution Function Extraction Using Integrated Step Function Response and Regularization Methods. IEEE Transactions on Plasma Science, 38(2), 156–162. https://doi.org/10.1109/tps.2009.2036013 Shannon, S., Kinder, R., Paterson, A., Rauf, S., & Ventzek, P. L. G. (2009). Guest Editorial Special Issue on Advances on Plasma Processing for Semiconductor Manufacturing. IEEE Transactions on Plasma Science, 37(9), 1662–1664. https://doi.org/10.1109/TPS.2009.2027934 C, S. S., Alexander, P., Theodoros, P., P, H. J., S, G. D., & J, H. D. (2009). Plasma Generation And Control Using Dual Frequency Rf Signals. Retrieved from https://www.lens.org/092-968-410-882-459 Gyoo, Y. J., J, H. D., C, S. S., H, B. D., Wonseok, L., & Kwang-soo, K. (2008). Dual Bias Frequency Plasma Reactor With Feedback Control Of E.s.c. Voltage Using Wafer Voltage Measurement At The Bias Supply Output. Retrieved from https://www.lens.org/062-461-753-606-236 Gyoo, Y. J., J, H. D., C, S. S., H, B. D., Wonseok, L., & Kwang-soo, K. (2008). Method Of Feedback Control Of Esc Voltage Using Wafer Voltage Measurement At The Bias Supply Output. Retrieved from https://www.lens.org/061-721-158-934-878 C, S. S., Alex, P., Theodoros, P., P, H. J., Dennis, G., & Yashushi, T. (2008). Plasma Generation And Control Using A Dual Frequency Rf Source. Retrieved from https://www.lens.org/073-265-216-590-516 Carter, M. D., Hoffman, D., Shannon, S., Ryan, P. M., & Buchberger, D. (2007). Global Modeling of Magnetized Capacitive Discharges. IEEE Transactions on Plasma Science, 35(5), 1413–1419. https://doi.org/10.1109/TPS.2007.906124 C, S. S., S, G. D., Theodoros, P., J, H. D., G, C. M., S, D. T., … Y, P. B. (2007). Plasma Control Using Dual Cathode Frequency Mixing. Retrieved from https://www.lens.org/198-151-282-809-229 C, S. S., Alex, P., Theodoros, P., P, H. J., Dennis, G., & Yashushi, T. (2007). Plasma Generation And Control Using A Dual Frequency Rf Source. Retrieved from https://www.lens.org/001-723-961-714-703 C, S. S., Alexander, P., Theodoros, P., P, H. J., S, G. D., & J, H. D. (2006). Plasma Generation And Control Using Dual Frequency Rf Signals. Retrieved from https://www.lens.org/093-426-771-044-119 Bera, K., Hoffman, D., Shannon, S., Delgadino, G., & Ye, Y. (2005). Frequency optimization for capacitively coupled plasma source. IEEE Transactions on Plasma Science, 33(2), 382–383. https://doi.org/10.1109/TPS.2005.845934 C, S. S., S, G. D., Theodoros, P., J, H. D., G, C. M., S, D. T., … Y, P. B. (2005). Plasma Control Using Dual Cathode Frequency Mixing. Retrieved from https://www.lens.org/145-542-565-144-947 C, S. S., Alex, P., Theodoros, P., P, H. J., Dennis, G., & Yashushi, T. (2005). Plasma Generation And Control Using A Dual Frequency Rf Source. Retrieved from https://www.lens.org/118-952-420-673-621 Shannon, S., Hoffman, D., Yang, J.-G., Paterson, A., & Holland, J. (2005). The impact of frequency mixing on sheath properties: Ion energy distribution and Vdc∕Vrf interaction. Journal of Applied Physics, 97(10), 103304. https://doi.org/10.1063/1.1905798 Holloway, J. P., Shannon, S., Sepke, S. M., & Brake, M. L. (2001). A reconstruction algorithm for a spatially resolved plasma optical emission spectroscopy sensor. Journal of Quantitative Spectroscopy and Radiative Transfer, 68(1), 101–115. https://doi.org/10.1016/S0022-4073(00)00017-0 Collard, C., Shannon, S., Holloway, J. P., & Brake, M. L. (2000). Optical emission reference data for the GEC reference cell. IEEE Transactions on Plasma Science, 28(6), 2187–2193. https://doi.org/10.1109/27.902246 Shannon, S., Holloway, J. P., & Brake, M. L. (1999). Spatially resolved fluorine actinometry. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 17(5), 2703–2708. https://doi.org/10.1116/1.581933 Shannon, S., Holloway, J. P., Flippo, K., & Brake, M. L. (1997). A spatially resolved optical emission sensor for plasma etch monitoring. Applied Physics Letters, 71(11), 1467–1468. https://doi.org/10.1063/1.119938 Shannon, S. A Glow Discharge Tomography Sensor for Monitoring Etch Uniformity (Masters Thesis). Shannon, S. Spatially resolved analysis of plasma etch discharges using a novel optical emission spectroscopy sensor (Ph.D. Thesis).