Is this your profile?
Claim your Citation Index profile in order to display more information about you and gain access to Libraries services. Just create or connect your ORCID iD.
2020 journal article
Effect of reactant dosing on selectivity during area-selective deposition of TiO2 via integrated atomic layer deposition and atomic layer etching
JOURNAL OF APPLIED PHYSICS, 128(10).
2019 journal article
Integrated Isothermal Atomic Layer Deposition/Atomic Layer Etching Supercycles for Area-Selective Deposition of TiO2
CHEMISTRY OF MATERIALS, 31(13), 4793–4804.