2022 journal article

Comparison of glancing-angle scatterings on different materials in a high aspect ratio plasma etching process using molecular dynamics simulation

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 40(5).

By: Y. Du, F. Kruger *, S. Nam *, H. Lee*, S. Yoo*, J. Eapen, M. Kushner *, S. Shannon 

Source: Web Of Science
Added: October 11, 2022