A. H. Somasekhar

Works (1)

Updated: July 5th, 2023 16:02

1999 article

Hydrogen Plasma Removal of Post‐RIE Residue for Backend Processing

Somashekhar, A., Ying, H., Smith, P. B., Aldrich, D. B., & Nemanich, R. J. (1999, June 1). Journal of The Electrochemical Society.

By: A. Somashekhar n, H. Ying  n, P. Smith*, D. Aldrich* & R. Nemanich n

topics (OpenAlex): Semiconductor materials and devices; Integrated Circuits and Semiconductor Failure Analysis; Advancements in Semiconductor Devices and Circuit Design
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