2005 article

Impact of Ge on integration of HfO2 and metal gate electrodes on strained Si channels

Lin, Y., Öztürk, M. C., Chen, B., Rhee, S. J., Lee, J. C., & Misra, V. (2005, August 5). Applied Physics Letters, Vol. 87.

By: Y. Lin n, M. Öztürk n, B. Chen n, S. Rhee*, J. Lee* & V. Misra n

topics (OpenAlex): Semiconductor materials and devices; Semiconductor materials and interfaces; Advancements in Semiconductor Devices and Circuit Design
Sources: Web Of Science, NC State University Libraries
Added: August 6, 2018

Citation Index includes data from a number of different sources. If you have questions about the sources of data in the Citation Index or need a set of data which is free to re-distribute, please contact us.

Certain data included herein are derived from the Web of Science© and InCites© (2026) of Clarivate Analytics. All rights reserved. You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.