Works (1)
Updated: July 5th, 2023 15:56
2005 article
Impact of Ge on integration of HfO2 and metal gate electrodes on strained Si channels
Lin, Y., Öztürk, M. C., Chen, B., Rhee, S. J., Lee, J. C., & Misra, V. (2005, August 5). Applied Physics Letters, Vol. 87.
topics (OpenAlex): Semiconductor materials and devices; Semiconductor materials and interfaces; Advancements in Semiconductor Devices and Circuit Design
Sources: Web Of Science, NC State University Libraries
Added: August 6, 2018