Paul Charles Lemaire

Thermal Selective Vapor Etching of TiO2: Chemical Vapor Etching via WF6 and Self-Limiting Atomic Layer Etching Using WF6 and BCl3

CHEMISTRY OF MATERIALS, 29(16), 6653–6665.

Understanding inherent substrate selectivity during atomic layer deposition: Effect of surface preparation, hydroxyl density, and metal oxide composition on nucleation mechanisms during tungsten ALD

JOURNAL OF CHEMICAL PHYSICS, 146(5).

Copper Benzenetricarboxylate Metal-Organic Framework Nucleation Mechanisms on Metal Oxide Powders and Thin Films formed by Atomic Layer Deposition

ACS APPLIED MATERIALS & INTERFACES, 8(14), 9514–9522.

Rapid visible color change and physical swelling during water exposure in triethanolamine-metalcone films formed by molecular layer deposition

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 34(1).

Using Hydrogen To Expand the Inherent Substrate Selectivity Window During Tungsten Atomic Layer Deposition

CHEMISTRY OF MATERIALS, 28(1), 117–126.

Wafer-Scale Selective-Area Deposition of Nanoscale Metal Oxide Features Using Vapor Saturation into Patterned Poly(methyl methacrylate) Templates

ADVANCED MATERIALS INTERFACES, 3(2).

Conformal and highly adsorptive metal-organic framework thin films via layer-by-layer growth on ALD-coated fiber mats

JOURNAL OF MATERIALS CHEMISTRY A, 3(4), 1458–1464.

Facile Conversion of Hydroxy Double Salts to Metal-Organic Frameworks Using Metal Oxide Particles and Atomic Layer Deposition Thin-Film Templates

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 137(43), 13756–13759.

Platinum-Free Cathode for Dye-Sensitized Solar Cells Using Poly(3,4-ethylenedioxythiophene) (PEDOT) Formed via Oxidative Molecular Layer Deposition

ACS APPLIED MATERIALS & INTERFACES, 7(7), 3866–3870.

Highly adsorptive, MOF-functionalized nonwoven fiber mats for hazardous gas capture enabled by atomic layer deposition

Advanced Materials Interfaces, 1(4).