Paul Charles Lemaire

Thermal selective vapor etching of TiO2: Chemical vapor etching via WF6 and self-limiting atomic layer etching using WF6 and BCl3

Chemistry of Materials, 29(16), 6653–6665.

Understanding inherent substrate selectivity during atomic layer deposition: Effect of surface preparation, hydroxyl density, and metal oxide composition on nucleation mechanisms during tungsten ALD

Journal of Chemical Physics, 146(5).

Copper benzenetricarboxylate metal-organic framework nucleation mechanisms on metal oxide powders and thin films formed by atomic layer deposition

ACS Applied Materials & Interfaces, 8(14), 9514–9522.

Rapid visible color change and physical swelling during water exposure in triethanolamine-metalcone films formed by molecular layer deposition

Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films, 34(1).

Using hydrogen to expand the inherent substrate selectivity window during tungsten atomic layer deposition

Chemistry of Materials, 28(1), 117–126.

Wafer-scale selective-area deposition of nanoscale metal oxide features using vapor saturation into patterned poly(methyl methacrylate) templates

Advanced Materials Interfaces, 3(2).

Conformal and highly adsorptive metal-organic framework thin films via layer-by-layer growth on ALD-coated fiber mats

Journal of Materials Chemistry A, 3(4), 1458–1464.

Facile conversion of hydroxy double salts to metal-organic frameworks using metal oxide particles and atomic layer deposition thin-film templates

Journal of the American Chemical Society, 137(43), 13756–13759.

Platinum-free cathode for dye-sensitized solar cells using poly(3,4-ethylenedioxythiophene) (PEDOT) formed via oxidative molecular layer deposition

ACS Applied Materials & Interfaces, 7(7), 3866–3870.

Highly adsorptive, MOF-functionalized nonwoven fiber mats for hazardous gas capture enabled by atomic layer deposition

Advanced Materials Interfaces, 1(4).