Works (10)

2015 journal article

Reliable antifuse one-time-programmable scheme with charge pump for postpackage repair of DRAM

IEEE Transactions on Very Large Scale Integration (VLSI) Systems, 23(9), 1956–1960.

By: X. Li, H. Zhong, Z. Tang & C. Jia

Source: NC State University Libraries
Added: August 6, 2018

2005 patent

High/low work function metal alloys for integrated circuit electrodes

Washington, DC: U.S. Patent and Trademark Office.

By: V. Misra, H. Zhong & S. Hong

Source: NC State University Libraries
Added: August 6, 2018

2005 journal article

Properties of Ta-Mo alloy gate electrode for n-MOSFET

Journal of Materials Science, 40(10-Sep), 2693–2695.

By: C. Lee, J. Kim, S. Hong, H. Zhong, B. Chen & V. Misra

Source: NC State University Libraries
Added: August 6, 2018

2004 patent

Method for forming a field effect transistor having a high-k gate dielectric and related structure

Washington, DC: U.S. Patent and Trademark Office.

By: J. Jeon & H. Zhong

Source: NC State University Libraries
Added: August 6, 2018

2002 journal article

Electrical properties of Ru-based alloy gate electrodes for dual metal gate Si-CMOS

IEEE Electron Device Letters, 23(6), 354–356.

By: V. Misra, H. Zhong & H. Lazar

Source: NC State University Libraries
Added: August 6, 2018

2001 journal article

Characterization of RuO2 electrodes on Zr silicate and ZrO2 dielectrics

Applied Physics Letters, 78(8), 1134–1136.

By: H. Zhong, G. Heuss, V. Misra, H. Luan, C. Lee & D. Kwong

Source: NC State University Libraries
Added: August 6, 2018

2001 journal article

Electrical properties of Ru and RuO2 gate electrodes for Si- PMOSFET with ZrO2 and Zr-silicate dielectrics

Journal of Electronic Materials, 30(12), 1493–1498.

By: H. Zhong, G. Heuss, Y. Suh, V. Misra & S. Hong

Source: NC State University Libraries
Added: August 6, 2018

2001 journal article

N and P metal oxide semiconductor field effect transistor characteristics of hafnium-doped SiO2 gate dielectrics

Journal of Electronic Materials, 30(12), 1499–1505.

By: V. Misra, M. Kulkarni & H. Zhong

Source: NC State University Libraries
Added: August 6, 2018

2001 journal article

Use of metal-oxide-semiconductor capacitors to detect interactions of Hf and Zr gate electrodes with SiO2 and ZrO2

Applied Physics Letters, 78(26), 4166–4168.

By: V. Misra, G. Heuss & H. Zhong

Source: NC State University Libraries
Added: August 6, 2018

2000 journal article

Electrical properties of RuO2 gate electrodes for dual metal gate Si-CMOS

IEEE Electron Device Letters, 21(12), 593–595.

By: H. Zhong, G. Heuss & V. Misra

Source: NC State University Libraries
Added: August 6, 2018