1998 journal article

Scaling trends for device performance and reliability in channel-engineered n-MOSFETs

IEEE Transactions on Electron Devices, 45(1), 254–260.

By: S. Williams n, R. Hulfachor, K. Kim, M. Littlejohn & W. Holton

Sources: Web Of Science, Crossref
Added: August 6, 2018

1997 journal article

Effects of silicon layer properties on device reliability for 0.1-μm SOI n-MOSFET design strategies

IEEE Transactions on Electron Devices, 44(5), 815–821.

By: R. Hulfachor, K. Kim, M. Littlejohn & C. Osburn

Sources: Web Of Science, Crossref
Added: August 6, 2018

1994 journal article

An evaluation of super-steep-retrograde channel doping for deep-submicron MOSFET applications

IEEE Transactions on Electron Devices, 41(10), 1880–1882.

By: H. Tian n, R. Hulfachor, J. Ellis-Monaghan, K. Kim, M. Littlejohn, J. Hauser, N. Masnari

Sources: Web Of Science, Crossref
Added: August 6, 2018