2006 journal article

Charge generation during oxidation of thin Hf metal films on silicon

Thin Solid Films, 513(1-2), 201–205.

By: T. Gougousi, D. Terry & G. Parsons

Source: NC State University Libraries
Added: August 6, 2018

2006 journal article

Supercritical-carbon dioxide-assisted cyclic deposition of metal oxide and metal thin films

Applied Physics Letters, 88(9).

By: D. Barua, T. Gougousi, E. Young & G. Parsons

Source: NC State University Libraries
Added: August 6, 2018

2005 journal article

Microcontact patterning of ruthenium gate electrodes by selective area atomic layer deposition

Applied Physics Letters, 86(5).

By: K. Park, J. Doub, T. Gougousi & G. Parsons

Source: NC State University Libraries
Added: August 6, 2018

2004 journal article

Postdeposition reactivity of sputter-deposited high-dielectric-constant films with ambient H2O and carbon-containing species

Journal of Applied Physics, 95(3), 1391–1396.

By: T. Gougousi & G. Parsons

Source: NC State University Libraries
Added: August 6, 2018

2003 journal article

Carbonate formation during post-deposition ambient exposure of high-k dielectrics

Applied Physics Letters, 83(17), 3543–3545.

By: T. Gougousi, D. Niu, R. Ashcraft & G. Parsons

Source: NC State University Libraries
Added: August 6, 2018

2003 journal article

Properties of La-silicate high-K dielectric films formed by oxidation of La on silicon

Journal of Applied Physics, 93(3), 1691–1696.

By: T. Gougousi, M. Kelly, D. Terry & G. Parsons

Source: NC State University Libraries
Added: August 6, 2018

2002 journal article

The role of the OH species in high-k/polycrystalline silicon gate electrode interface reactions

Applied Physics Letters, 80(23), 4419–4421.

By: T. Gougousi, M. Kelly & G. Parsons

Source: NC State University Libraries
Added: August 6, 2018