2006 journal article
Charge generation during oxidation of thin Hf metal films on silicon
THIN SOLID FILMS, 513(1-2), 201–205.
2006 journal article
Supercritical-carbon dioxide-assisted cyclic deposition of metal oxide and metal thin films
APPLIED PHYSICS LETTERS, 88(9).
2005 journal article
Microcontact patterning of ruthenium gate electrodes by selective area atomic layer deposition
APPLIED PHYSICS LETTERS, 86(5).
2004 journal article
Postdeposition reactivity of sputter-deposited high-dielectric-constant films with ambient H2O and carbon-containing species
JOURNAL OF APPLIED PHYSICS, 95(3), 1391–1396.
2003 journal article
Carbonate formation during post-deposition ambient exposure of high-k dielectrics
APPLIED PHYSICS LETTERS, 83(17), 3543–3545.
2003 journal article
Properties of La-silicate high-K dielectric films formed by oxidation of La on silicon
JOURNAL OF APPLIED PHYSICS, 93(3), 1691–1696.
2002 journal article
The role of the OH species in high-k/polycrystalline silicon gate electrode interface reactions
APPLIED PHYSICS LETTERS, 80(23), 4419–4421.