2006 journal article
Charge generation during oxidation of thin Hf metal films on silicon
THIN SOLID FILMS, 513(1-2), 201–205.
Contributors: D. Terry n & G. Parsons n n,
2006 journal article
Supercritical-carbon dioxide-assisted cyclic deposition of metal oxide and metal thin films
APPLIED PHYSICS LETTERS, 88(9).
Contributors: D. Barua n, n, E. Young n & G. Parsons n
2005 journal article
Microcontact patterning of ruthenium gate electrodes by selective area atomic layer deposition
APPLIED PHYSICS LETTERS, 86(5).
Contributors: K. Park n, J. Doub n, n & G. Parsons n
2004 journal article
Postdeposition reactivity of sputter-deposited high-dielectric-constant films with ambient H2O and carbon-containing species
JOURNAL OF APPLIED PHYSICS, 95(3), 1391–1396.
Contributors: G. Parsons n n &
2003 journal article
Carbonate formation during post-deposition ambient exposure of high-k dielectrics
APPLIED PHYSICS LETTERS, 83(17), 3543–3545.
Contributors: D. Niu n, R. Ashcraft n & G. Parsons n n,
2003 journal article
Properties of La-silicate high-K dielectric films formed by oxidation of La on silicon
JOURNAL OF APPLIED PHYSICS, 93(3), 1691–1696.
Contributors: M. Kelly n, D. Terry n & G. Parsons n n,
2002 journal article
The role of the OH species in high-k/polycrystalline silicon gate electrode interface reactions
APPLIED PHYSICS LETTERS, 80(23), 4419–4421.
Contributors: M. Kelly n & G. Parsons n n,
Citation Index includes data from a number of different sources. If you have questions about the sources of data in the Citation Index or need a set of data which is free to re-distribute, please contact us.
Certain data included herein are derived from the Web of Science© and InCites© (2024) of Clarivate Analytics. All rights reserved. You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.