Nivedita Biswas

Works (10)

Updated: July 5th, 2023 15:57

2012 journal article

Work function extraction of metal gates with alternate channel materials

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 30(2).

By: M. Coan*, D. Johnson*, J. Woo*, N. Biswas n, V. Misra n , P. Majhi, H. Harris*

Sources: Web Of Science, ORCID
Added: August 6, 2018

2011 conference paper

Spatially diffuse pathsets for robust routing in ad hoc networks

2011 ieee global telecommunications conference (globecom 2011).

By: T. Biswas n & R. Dutta n 

TL;DR: This work considers a network of nodes addressed by their locations, and proposes a novel routing technique that is called Petal Routing, which maximizes reliability by using pathsets, made of diverse multiple paths, in place of a single path. (via Semantic Scholar)
Sources: NC State University Libraries, ORCID
Added: August 6, 2018

2009 journal article

Atomic Layer Deposition of Hafnium Dioxide on TiN and Self-Assembled Monolayer Molecular Film

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 156(7), H561–H566.

By: Z. Chen n, S. Sarkar n, N. Biswas n & V. Misra n 

Sources: Web Of Science, ORCID
Added: August 6, 2018

2008 journal article

Electrical characteristics of metal-oxide-semiconductor capacitors on p-GaAs using atomic layer deposition of ultrathin HfAlO gate dielectric

APPLIED PHYSICS LETTERS, 93(19).

By: R. Suri n, B. Lee n, D. Lichtenwalner  n, N. Biswas n & V. Misra n 

author keywords: annealing; atomic layer deposition; capacitance; dielectric thin films; gallium arsenide; hafnium compounds; III-V semiconductors; MOS capacitors; passivation; semiconductor-insulator boundaries; X-ray photoelectron spectra
Sources: Web Of Science, ORCID
Added: August 6, 2018

2007 journal article

Characteristics of Ni/Gd FUSI for NMOS gate electrode applications

IEEE ELECTRON DEVICE LETTERS, 28(7), 555–557.

By: B. Lee n, N. Biswas n, S. Novak n & V. Misra n 

author keywords: band edge work function; fully silicided (FUSI) gate; metal gate electrodes; n-MOSFET; nickel/gadolinium (Ni/Gd); Ni-FUSI; work function extraction
Sources: Web Of Science, ORCID
Added: August 6, 2018

2006 journal article

Electrical and physical analysis of MoTa alloy for gate electrode applications

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 153(5), G417–G419.

By: B. Chen n, N. Biswas n & V. Misra n 

Sources: Web Of Science, ORCID
Added: August 6, 2018

2006 journal article

Influence of oxygen diffusion through capping layers of low work function metal gate electrodes

IEEE ELECTRON DEVICE LETTERS, 27(4), 228–230.

By: B. Chen n, R. Jha n, H. Lazar n, N. Biswas n, J. Lee n, B. Lee n, L. Wielunski*, E. Garfunkel*, V. Misra n 

author keywords: alloy; capping; effective work function; metal gate; MoTa; oxygen diffusion
Sources: Web Of Science, ORCID
Added: August 6, 2018

2006 journal article

Permittivity enhancement of aluminum oxide thin films with the addition of silver nanoparticles

Applied Physics Letters, 89(26).

By: R. Ravindran, K. Gangopadhyay, S. Gangopadhyay, N. Mehta & N. Biswas

Source: NC State University Libraries
Added: August 6, 2018

2005 journal article

Evaluation of nickel and molybdenum silicides for dual gate complementary metal-oxide semiconductor application

APPLIED PHYSICS LETTERS, 86(2).

By: N. Biswas n, J. Gurganus n, V. Misra n , Y. Yang * & S. Stemmer *

Sources: Web Of Science, ORCID
Added: August 6, 2018

2005 journal article

Work function tuning of nickel silicide by co-sputtering nickel and silicon

APPLIED PHYSICS LETTERS, 87(17).

By: N. Biswas n, J. Gurganus n & V. Misra n 

Sources: Web Of Science, ORCID
Added: August 6, 2018

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