Works (5)

2006 journal article

High-temperature stability of lanthanum silicate gate dielectric MIS devices with Ta and TaN electrodes

Journal of the Electrochemical Society, 153(9), F210–214.

Source: NC State University Libraries
Added: August 6, 2018

2006 journal article

Influence of oxygen diffusion through capping layers of low work function metal gate electrodes

IEEE Electron Device Letters, 27(4), 228–230.

By: B. Chen, R. Jha, H. Lazar, N. Biswas, J. Lee, B. Lee, L. Wielunski, E. Garfunkel, V. Misra

Source: NC State University Libraries
Added: August 6, 2018

2006 journal article

Work function tuning via interface dipole by ultrathin reaction layers using AlTa and AlTaN alloys

IEEE Electron Device Letters, 27(9), 731–733.

By: B. Chen, R. Jha & V. Misra

Source: NC State University Libraries
Added: August 6, 2018

2005 journal article

Investigation of work function tuning using multiple layer metal gate electrodes stacks for complementary metal-oxide-semiconductor applications

Applied Physics Letters, 87(22).

By: R. Jha, J. Lee, P. Majhi & V. Misra

Source: NC State University Libraries
Added: August 6, 2018

2004 journal article

Reliability of high-k dielectrics and its dependence on gate electrode and interfacial high-k bi-layer structure

Microelectronics Reliability, 44(11-Sep), 1513–1518.

By: Y. Kim, R. Choi, R. Jha, J. Lee, V. Misra & J. Lee

Source: NC State University Libraries
Added: August 6, 2018