Works (5)
2006 journal article
High-temperature stability of lanthanum silicate gate dielectric MIS devices with Ta and TaN electrodes
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 153(9), F210–F214.
2006 journal article
Influence of oxygen diffusion through capping layers of low work function metal gate electrodes
IEEE ELECTRON DEVICE LETTERS, 27(4), 228–230.
2006 journal article
Work function tuning via interface dipole by ultrathin reaction layers using AlTa and AlTaN alloys
IEEE ELECTRON DEVICE LETTERS, 27(9), 731–733.
2005 journal article
Investigation of work function tuning using multiple layer metal gate electrodes stacks for complementary metal-oxide-semiconductor applications
APPLIED PHYSICS LETTERS, 87(22).
2004 article
Reliability of high-k dielectrics and its dependence on gate electrode and interfacial high-k bi-layer structure
MICROELECTRONICS RELIABILITY, Vol. 44, pp. 1513–1518.