Works (7)
1998 article
Low parasitic resistance contacts for scaled ULSI devices
Osburn, C. M., & Bellur, K. R. (1998, November 1). Thin Solid Films.
1998 article
Parasitic Resistance Considerations of Using Elevated Source/Drain Technology for Deep Submicron Metal Oxide Semiconductor Field Effect Transistors
Sun, J., Bartholomew, R. F., Bellur, K., Srivastava, A., Osburn, C. M., Masnari, N. A., & Westhoff, R. (1998, June 1). Journal of The Electrochemical Society.
1997 conference paper
A 0.18 ?m CMOS technology for elevated source/drain MOSFETs using selective silicon epitaxy
ULSI science and technology/1997: Proceedings of the Sixth International Symposium on UltraLarge Scale Integration Science and Technology (Proceedings (Electrochemical Society); v. 97-3), 571–585. Pennington, NJ: Electrochemical Society.
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1997 article
A Comparative Study of n+/p Junction Formation for Deep Submicron Elevated Source/Drain Metal Oxide Semiconductor Field Effect Transistors
Sun, J., Bartholomew, R. F., Bellur, K., Srivastava, A., Osburn, C. M., Masnari, N. A., & Westhoff, R. (1997, October 1). Journal of The Electrochemical Society.
1997 conference paper
Parasitic resistance considerations of using elevated source/drain for deep submicron MOSFET technology
ULSI science and technology/1997: Proceedings of the Sixth International Symposium on UltraLarge Scale Integration Science and Technology (Proceedings (Electrochemical Society); v. 97-3), 587–597. Pennington, NJ: Electrochemical Society.
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1997 article
The effect of the elevated source/drain doping profile on performance and reliability of deep submicron MOSFETs
Sun, J. J., Bartholomew, R. F., Bellur, K., Srivastava, A., Osburn, C. M., & Masnari, N. A. (1997, January 1). IEEE Transactions on Electron Devices.
1996 article
Sub-Half Micron Elevated SourceDrain NMOSFETS by Low Temperature Selective Epitaxial Deposition
Sun, J., Bartholomew, R. F., Bellur, K., O'Neil, P. A., Srivastava, A., Violette, K. E., … Masnari, N. A. (1996, January 1). MRS Proceedings.
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