2001 journal article

Arsenic redistribution during rapid thermal chemical vapor deposition of TiSi2 on Si

Journal of the Electrochemical Society, 148(2), G43–49.

By: H. Fang, M. Ozturk, P. O'Neil & E. Seebauer

Source: NC State University Libraries
Added: August 6, 2018

1999 journal article

Effects of oxygen during selective silicon Epitaxial growth using disilane and chlorine

Journal of the Electrochemical Society, 146(6), 2344–2352.

By: P. O'Neil, M. Ozturk, A. Batchelor, M. Xu & D. Maher

Source: NC State University Libraries
Added: August 6, 2018

1999 journal article

Effects of oxygen on selective silicon deposition using disilane

Materials Letters, 38(6), 418–422.

By: P. O'Neil, M. Ozturk, A. Batchelor & D. Maher

Source: NC State University Libraries
Added: August 6, 2018

1999 journal article

Growth of selective silicon epitaxy using disilane and chlorine on heavily implanted substrates - I. Role of implanted BF2

Journal of the Electrochemical Society, 146(8), 3070–3078.

By: P. O'Neil, M. Ozturk, A. Batchelor, D. Venables, M. Xu & D. Maher

Source: NC State University Libraries
Added: August 6, 2018

1999 journal article

Growth of selective silicon epitaxy using disilane and chlorine on heavily implanted substrates - II. Role of implanted arsenic

Journal of the Electrochemical Society, 146(8), 3079–3086.

Source: NC State University Libraries
Added: August 6, 2018

1999 journal article

Quality of selective silicon Epitaxial films deposited using disilane and chlorine

Journal of the Electrochemical Society, 146(6), 2337–2343.

By: P. O'Neil, M. Ozturk, A. Batchelor, M. Xu & D. Maher

Source: NC State University Libraries
Added: August 6, 2018

1997 conference paper

A 0.18 ?m CMOS technology for elevated source/drain MOSFETs using selective silicon epitaxy

ULSI science and technology/1997: Proceedings of the Sixth International Symposium on UltraLarge Scale Integration Science and Technology (Proceedings (Electrochemical Society); v. 97-3), 571–585. Pennington, NJ: Electrochemical Society.

By: A. Srivastava, J. Sun, K. Bellur, R. Bartholomew, P. O'Neil, S. Celik, C. Osburn, N. Masnari ...

Source: NC State University Libraries
Added: August 6, 2018

1997 journal article

Optimization of process conditions for selective silicon epitaxy using disilane, hydrogen, and chlorine

Journal of the Electrochemical Society, 144(9), 3309–3315.

By: P. O'Neil, M. Ozturk, K. Violette, D. Batchelor, K. Christensen & D. Maher

Source: NC State University Libraries
Added: August 6, 2018

1996 conference paper

Sub-half micron elevated source/drain NMOSFETs by low temperature selective epitaxial deposition

Rapid thermal and integrated processing V: Symposium held April 8-12, 1996, San Francisco, California, U.S.A. (Materials Research Society symposium; 429), 343–347.

Source: NC State University Libraries
Added: August 6, 2018