Patricia A. O'Neil

Works (9)

Updated: July 5th, 2023 16:04

2001 article

Arsenic Redistribution during Rapid Thermal Chemical Vapor Deposition of TiSi[sub 2] on Si

Fang, H., Öztürk Mehmet C., O’Neil, P. A., & Seebauer, E. G. (2001, January 1). Journal of The Electrochemical Society.

By: H. Fang n, M. Öztürk n, P. O’Neil n & E. Seebauer *

topics (OpenAlex): Semiconductor materials and interfaces; Silicon and Solar Cell Technologies; Semiconductor materials and devices
Source: Web Of Science
Added: August 6, 2018

1999 article

Effects of Oxygen during Selective Silicon Epitaxial Growth Using Disilane and Chlorine

O'Neil, P. A., Öztürk, M. C., Batchelor, A. D., Xu, M., & Maher, D. M. (1999, June 1). Journal of The Electrochemical Society.

By: P. O'Neil*, M. Öztürk*, A. Batchelor*, M. Xu & D. Maher*

topics (OpenAlex): Semiconductor materials and devices; Silicon and Solar Cell Technologies; Semiconductor materials and interfaces
Source: Web Of Science
Added: August 6, 2018

1999 article

Effects of oxygen on selective silicon deposition using disilane

O'Neil, P. A., Öztürk, M. C., Batchelor, A. D., & Maher, D. M. (1999, March 1). Materials Letters.

By: P. O'Neil n, M. Öztürk n, A. Batchelor n & D. Maher n

author keywords: silicon; CVD; disilane; selective silicon deposition
topics (OpenAlex): Silicon and Solar Cell Technologies; Semiconductor materials and devices; Silicon Nanostructures and Photoluminescence
Source: Web Of Science
Added: August 6, 2018

1999 article

Growth of Selective Silicon Epitaxy Using Disilane and Chlorine on Heavily Implanted Substrates: I. Role of Implanted  BF 2

O'Neil, P. A., Öztürk, M. C., Batchelor, A. D., Venables, D., Xu, M., & Maher, D. M. (1999, August 1). Journal of The Electrochemical Society.

By: P. O'Neil*, M. Öztürk*, A. Batchelor n, D. Venables n, M. Xu n & D. Maher n

topics (OpenAlex): Silicon and Solar Cell Technologies; Semiconductor materials and devices; Semiconductor materials and interfaces
Source: Web Of Science
Added: August 6, 2018

1999 article

Growth of Selective Silicon Epitaxy Using Disilane and Chlorine on Heavily Implanted Substrates: II. Role of Implanted Arsenic

O'Neil, P. A., Öztürk, M. C., Batchelor, A. D., Venables, D., & Maher, D. M. (1999, August 1). Journal of The Electrochemical Society.

By: P. O'Neil*, M. Öztürk*, A. Batchelor n, D. Venables n & D. Maher n

topics (OpenAlex): Silicon and Solar Cell Technologies; Silicon Nanostructures and Photoluminescence; Semiconductor materials and interfaces
Source: Web Of Science
Added: August 6, 2018

1999 article

Quality of Selective Silicon Epitaxial Films Deposited Using Disilane and Chlorine

O'Neil, P. A., Öztürk, M. C., Batchelor, A. D., Xu, M., & Maher, D. M. (1999, June 1). Journal of The Electrochemical Society.

By: P. O'Neil*, M. Öztürk*, A. Batchelor*, M. Xu* & D. Maher*

topics (OpenAlex): Semiconductor materials and devices; Silicon Nanostructures and Photoluminescence; Semiconductor materials and interfaces
Source: Web Of Science
Added: August 6, 2018

1997 conference paper

A 0.18 ?m CMOS technology for elevated source/drain MOSFETs using selective silicon epitaxy

ULSI science and technology/1997: Proceedings of the Sixth International Symposium on UltraLarge Scale Integration Science and Technology (Proceedings (Electrochemical Society); v. 97-3), 571–585. Pennington, NJ: Electrochemical Society.

By: A. Srivastava, J. Sun, K. Bellur, R. Bartholomew, P. O'Neil, S. Celik, C. Osburn, N. Masnari ...

Ed(s):

Source: NC State University Libraries
Added: August 6, 2018

1997 article

Optimization of Process Conditions for Selective Silicon Epitaxy Using Disilane, Hydrogen, and Chlorine

O'Neil, P. A., Öztürk, M. C., Violette, K. E., Batchelor, D., Christensen, K., & Maher, D. M. (1997, September 1). Journal of The Electrochemical Society.

By: P. O'Neil n, M. Öztürk n, K. Violette n, D. Batchelor n, K. Christensen n & D. Maher n

topics (OpenAlex): Silicon and Solar Cell Technologies; Thin-Film Transistor Technologies; Semiconductor materials and devices
Source: Web Of Science
Added: August 6, 2018

1996 article

Sub-Half Micron Elevated SourceDrain NMOSFETS by Low Temperature Selective Epitaxial Deposition

Sun, J., Bartholomew, R. F., Bellur, K., O'Neil, P. A., Srivastava, A., Violette, K. E., … Masnari, N. A. (1996, January 1). MRS Proceedings.

By: J. Sun n, R. Bartholomew n, K. Bellur n, P. O'Neil n, A. Srivastava n, K. Violette n, M. Oztiirk n, C. Osburn n, N. Masnari n

Ed(s):

topics (OpenAlex): Semiconductor materials and devices; Advancements in Semiconductor Devices and Circuit Design; Thin-Film Transistor Technologies
Source: Web Of Science
Added: August 6, 2018

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