Works (17)

Updated: July 5th, 2023 16:00

2016 journal article

Magnetoelectric oxide films for spin manipulation in graphene

PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, 10(3), 242–247.

By: S. Stuart n, B. Gray n, D. Nevola n, L. Su n, E. Sachet n, M. Ulrich n, D. Dougherty n

co-author countries: United States of America 🇺🇸
author keywords: magnetoelectrics; spintronics; Cr2O3; films; graphene; spin field effect transistors; scanned probe microscopy
Source: Web Of Science
Added: August 6, 2018

2013 journal article

Smooth MgO films grown on graphite and graphene by pulsed laser deposition

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 31(5).

By: S. Stuart n, E. Satchet n, A. Sandin n, J. Maria n, J. Rowe n, D. Dougherty n, M. Ulrich n

co-author countries: United States of America 🇺🇸
Source: Web Of Science
Added: August 6, 2018

2010 journal article

Surface reconstruction of hexagonal Y-doped HoMnO3 and LuMnO3 studied using low-energy electron diffraction

Physical Review. B, Condensed Matter and Materials Physics, 81(16).

By: R. Vasic, J. Sadowski, Y. Choi, H. Zhou, C. Wiebe, S. Cheong, J. Rowe, M. Ulrich

Source: NC State University Libraries
Added: August 6, 2018

2009 conference paper

Predeposition plasma nitridation process applied to Ge substrates to passivate interfaces between crystalline-Ge substrates and Hf-based high-K dielectrics

Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 27(1), 294–299.

By: G. Lucovsky, J. Long, K. Chung, H. Seo, B. Watts, R. Vasic, M. Ulrich

Source: NC State University Libraries
Added: August 6, 2018

2008 journal article

Bulk defects in nano-crystalline and in non-crystalline HfO2-based thin film dielectrics

THIN SOLID FILMS, 517(1), 437–440.

By: S. Lee n, H. Seo n, G. Lucovsky n, L. Fleming n, M. Ulrich n & J. Luening

co-author countries: United States of America 🇺🇸
author keywords: Thin film high-k dielectrics; Non-crystalline transition metal oxides; Nano-crystalline transition metal oxides; Bulk defects; Intrinsic bonding defects; Divacancies
Source: Web Of Science
Added: August 6, 2018

2007 article

Defect reduction by suppression of pi-bonding coupling in nano- and non-crystalline high-(medium)-kappa gate dielectrics

MICROELECTRONIC ENGINEERING, Vol. 84, pp. 2350–2353.

co-author countries: United States of America 🇺🇸
author keywords: high-/medium-kappa dielectrics; spectroscopic studies; fundamental electronic states; band edge defects
Source: Web Of Science
Added: August 6, 2018

2007 article

Intrinsic electronically active defects in transition metal elemental oxides

Lucovsky, G., Seo, H., Lee, S., Fleming, L. B., Ulrich, M. D., Luning, J., … Bersuker, G. (2007, April). JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, Vol. 46, pp. 1899–1909.

By: G. Lucovsky n, H. Seo n, S. Lee n, L. Fleming n, M. Ulrich n, J. Luning*, P. Lysaght, G. Bersuker

co-author countries: United States of America 🇺🇸
author keywords: transition metal oxides; crystal field and Jahn-Teller d-state splittings; ab initio molecular orbital theory; valence and conduction band states; intrinsic defect states; coherent pi-bonding interactions; nanocrystalline length scales of order
Source: Web Of Science
Added: August 6, 2018

2007 article

Length scales for coherent pi-bonding interactions in complex high-k oxide dielectrics and their interfaces

MICROELECTRONIC ENGINEERING, Vol. 84, pp. 2298–2301.

By: H. Seo n, G. Lucovsky n, L. Fleming n, M. Ulrich n, J. Luning*, G. Koster*, T. Geballe*

co-author countries: United States of America 🇺🇸
author keywords: length scales of order; spectroscopic studies; nanocrystalline complex oxides and complex oxide alloys
Source: Web Of Science
Added: August 6, 2018

2007 article

Spectroscopic studies of O-vacancy defects in transition metal oxides

Lucovsky, G., Luening, J., Fleming, L. B., Ulrich, M. D., Rowe, J. E., Seo, H., … Bersuker, G. (2007, October). JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, Vol. 18, pp. S263–S266.

By: G. Lucovsky n, J. Luening, L. Fleming n, M. Ulrich n, J. Rowe*, H. Seo n, S. Lee n, P. Lysaght, G. Bersuker

co-author countries: United States of America 🇺🇸
Source: Web Of Science
Added: August 6, 2018

2006 article

Intrinsic bonding defects in transition metal elemental oxides

MICROELECTRONICS RELIABILITY, Vol. 46, pp. 1623–1628.

By: G. Lucovsky n, H. Seo n, L. Fleming n, M. Ulrich n, J. Luning*, P. Lysaght, G. Bersuker

co-author countries: United States of America 🇺🇸
Source: Web Of Science
Added: August 6, 2018

2005 journal article

Surface atom core-level shifts of clean and oxygen-covered Re(1231)

Physical Review. B, Condensed Matter and Materials Physics, 72(3).

By: A. Chan, G. Wertheim, H. Wang, M. Ulrich, J. Rowe & T. Madey

Source: NC State University Libraries
Added: August 6, 2018

2004 journal article

Influence of substrate temperature on epitaxial copper phthalocyanines studied by photoemission spectroscopy

JOURNAL OF APPLIED PHYSICS, 95(3), 982–988.

By: T. Ellis*, K. Park*, S. Hulbert*, M. Ulrich n & J. Rowe n

co-author countries: United States of America 🇺🇸
Source: Web Of Science
Added: August 6, 2018

2004 article

Near-edge absorption fine structure and UV photoemission spectroscopy studies of aligned single-walled carbon nanotubes on Si(100) substrates

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, Vol. 22, pp. 2000–2004.

By: L. Fleming n, M. Ulrich*, K. Efimenko n, J. Genzer n, A. Chan*, T. Madey*, S. Oh, O. Zhou, J. Rowe*

co-author countries: United States of America 🇺🇸
Sources: Web Of Science, ORCID
Added: August 6, 2018

2003 article

Bonding and structure of ultrathin yttrium oxide films for Si field effect transistor gate dielectric applications

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, Vol. 21, pp. 1792–1797.

By: M. Ulrich n, J. Rowe n, D. Niu n & G. Parsons n

co-author countries: United States of America 🇺🇸

Contributors: M. Ulrich n, J. Rowe n, D. Niu n & G. Parsons n

Sources: Web Of Science, ORCID
Added: August 6, 2018

2003 journal article

Soft x-ray photoelectron spectroscopy of (HfO2)(x)(SiO2)(1-x) high-k gate-dielectric structures

Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 21(4), 1777–1782.

By: M. Ulrich, J. Hong, J. Rowe, G. Lucovsky, A. Chan & T. Madey

Source: NC State University Libraries
Added: August 6, 2018

2002 journal article

Effect of contact resistance in solid-state thermionic refrigeration

JOURNAL OF APPLIED PHYSICS, 92(1), 245–247.

By: M. Ulrich n, P. Barnes* & C. Vining

co-author countries: United States of America 🇺🇸
Source: Web Of Science
Added: August 6, 2018

2002 journal article

Interface electronic structure of Ta2O5-Al2O3 alloys for Si- field-effect transistor gate dielectric applications

Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 20(4), 1732–1738.

By: M. Ulrich, R. Johnson, J. Hong, J. Rowe, G. Lucovsky, J. Quinton, T. Madey

Source: NC State University Libraries
Added: August 6, 2018

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